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A preparation method for large-area deposition of silicon carbide film on graphite template

A technology of graphite template and silicon carbide, which is applied in the field of new materials, can solve the problems of lower qualified rate of curved glass, unqualified size of curved glass, damage to the surface of curved glass, etc., and achieve excellent oxidation resistance, strong bonding force and large area Effect

Active Publication Date: 2021-06-11
WUHAN INSTITUTE OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when graphite is heated at high temperature to form curved glass, its surface is easily oxidized to generate carbon monoxide and carbon dioxide, causing the size of the template to gradually decrease during use, which makes the size of the produced curved glass unqualified and the surface of the curved glass Damaged, reducing the qualified rate of curved glass
In recent years, the chemical vapor deposition method is often used to prepare silicon carbide films, and the film quality is good, but this method has certain limitations in depositing silicon carbide films on bulk graphite, and the deposition speed is slow

Method used

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  • A preparation method for large-area deposition of silicon carbide film on graphite template
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  • A preparation method for large-area deposition of silicon carbide film on graphite template

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Effect test

Embodiment 1

[0030] Take 6.3g of silicon nitride and 0.7g of silicon carbide, add an appropriate amount of absolute ethanol, grind them thoroughly in a mortar, then put the mixture into a blast dryer, dry at 100°C for 1 hour, and then put them into a graphite sagger. Cover with a graphite substrate, conduct vacuum evaporation in a silicon carbide sintering furnace, the evaporation temperature is 1950°C, and keep warm for 0.5h. A graphite substrate coated with a dense silicon carbide film is obtained.

Embodiment 2

[0032] Take 5.9g of silicon nitride and 1.1g of silicon carbide, add an appropriate amount of absolute ethanol, grind them thoroughly in a mortar, then put the mixture into a blower dryer, dry at 100°C for 1 hour, and then put them into a graphite sagger. Cover with a graphite substrate, conduct vacuum evaporation in a silicon carbide sintering furnace, the evaporation temperature is 2000°C, and keep the temperature for 1h. A graphite substrate coated with a dense silicon carbide film is obtained.

Embodiment 3

[0034] Take 5.6g of silicon nitride and 1.4g of silicon carbide, add an appropriate amount of ethanol, grind them thoroughly in a mortar, then put the mixture into a blower dryer, dry at 100°C for 1 hour, and then put them into a graphite sagger. Cover with a graphite substrate, conduct vacuum evaporation in a silicon carbide sintering furnace, the evaporation temperature is 2100°C, and keep warm for 1.5h. A graphite substrate coated with a dense silicon carbide film is obtained.

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Abstract

The invention discloses a preparation method for depositing a large-area silicon carbide film on a graphite template. Firstly, silicon nitride powder and silicon carbide powder are mixed according to an appropriate ratio, added with absolute ethanol and ground in a mortar, after cleaning and drying Put the powder into a sagger for vacuum sintering, the sintering temperature is above 1900°C, and the holding time is 1h. The method of the present invention involves controllable conditions, simple and convenient operation, and mild reaction conditions, and the obtained silicon carbide film has a large area and excellent stability, so that the service life of the graphite mold is greatly improved, and a new way is provided for the glass heating graphite template modification technology. It has important economic and engineering value.

Description

technical field [0001] The invention belongs to the technical field of new materials, and in particular relates to a preparation method for large-area deposition of a silicon carbide film on a graphite template. Background technique [0002] With the advent of the flexible AMOLED and 5G era, 3D curved surfaces and glass materials will become standard configurations for mobile phones. The 3D curved screen can improve the user's visual experience, make the viewing angle wider, have a certain three-dimensional effect, and the picture is more 3D. [0003] The production and processing process of mobile phone 3D glass mainly includes: engineering→material opening→fine carving→grinding→cleaning→hot bending→polishing→testing→tempering→mold opening→UV transfer→coating (PVD)→printing (screen printing / Spraying)→laser engraving→package inspection→laminating→packaging, etc., the process is long, the quality requirements are high, and the yield rate is low. 3D glass hot bending moldin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C04B41/87
CPCC04B41/009C04B41/5059C04B41/87C04B35/522C04B41/4545C04B41/4501
Inventor 陈常连梁欣周诗聪季家友黄志良徐慢
Owner WUHAN INSTITUTE OF TECHNOLOGY