A method for ammonia extraction and reuse in LED-MOCVD process tail gas membrane and adsorption coupling

A process and tail gas technology, applied in separation methods, chemical instruments and methods, combined devices, etc., can solve the problems of inability to recover ammonia for reuse, inability to recover and reuse ammonia, etc., to achieve stable process, reduce exhaust emissions, and high yield. rate effect

Active Publication Date: 2021-03-19
ZHEJIANG TIANCAIYUNJI TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] Other methods, such as the catalytic combustion method, use catalytic fuel to catalyze and oxidize combustible components such as ammonia, hydrogen, and methane in the tail gas at high temperature, and perform follow-up treatment to meet the emission standards, and cannot recover ammonia for reuse; catalytic ammonia decomposition method is The tail gas with high ammonia concentration is catalytically decomposed into H2 and N2 at high temperature, and the H2 or N2 is recovered after treatment, and the ammonia cannot be recovered and reused;
[0012] In a series of existing ultra-pure ammonia preparation methods, that is, using 99.95% industrial anhydrous ammonia as a raw material to prepare more than 99.999% of electronic ammonia gas, there are adsorption methods, rectification methods, adsorption + rectification methods, chemical catalysis method (dehydration), metal getter method and its coupling, but they cannot directly recycle and reuse ammonia-containing waste gas

Method used

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  • A method for ammonia extraction and reuse in LED-MOCVD process tail gas membrane and adsorption coupling
  • A method for ammonia extraction and reuse in LED-MOCVD process tail gas membrane and adsorption coupling

Examples

Experimental program
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Effect test

Embodiment 1

[0035] Such as figure 1 As shown, a LED-MOCVD process tail gas film and adsorption coupling method for ammonia extraction and reuse, the specific implementation steps include,

[0036] (1) Raw material gas, that is, the exhaust gas in the process of preparing light-emitting diode LEDs based on the growth of gallium nitride GaN epitaxial wafers by MOCVD metal oxide chemical vapor deposition at atmospheric pressure. Its main composition is nitrogen N2: 46% (v / v, below Similar), hydrogen H2: 34%, ammonia NH3: 19%, the remaining 1% is a small amount of metal ions, particles, arsine, methane CH4, water H2O, carbon monoxide CO, carbon dioxide CO2, oxygen O2 and other impurity components, Pressure is normal pressure, temperature is normal temperature;

[0037] (2) Pretreatment. The raw material gas is sent to the pretreatment unit composed of dust collector, particle filter and oil mist collector through the blower. Under the operating conditions of 0.2-0.3MPa pressure and normal te...

Embodiment 2

[0041] Such as figure 1 As shown, on the basis of Example 1, the raw material gas is pretreated and then pressurized to 1.2-1.4 MPa, the temperature remains unchanged, and enters the pervaporation membrane process. The ammonia concentration in the non-permeated gas produced is 5-8%. Enter the pressure swing adsorption process consisting of 6 towers, in which one adsorption tower is always in the adsorption state, and the other adsorption towers are in the desorption steps of forward discharge, reverse discharge, vacuuming, washing, forward pressure charging and final charging, etc., twice Pressure equalization; the ammonia concentration in the non-adsorbed phase gas flowing out from the pressure swing adsorption process is less than 0.5%, and it directly enters the temperature swing adsorption fine deamination process composed of two towers and the subsequent hydrogen / nitrogen extraction process. The ammonia concentration is 16-20%. After the raw material gas is pressurized to...

Embodiment 3

[0043] Such as figure 2 As shown, on the basis of Examples 1 and 2, the raw material gas is pretreated and then pressurized to 1.2-1.4 MPa, the temperature remains unchanged, and enters the pervaporation membrane process, and the ammonia concentration in the non-permeated gas produced is 5-8%. , directly enter the water washing ammonia removal process, the ammonia concentration in the non-permeable gas after deammonization by the water washing tower is less than 0.1-0.3%, and then enter the temperature swing adsorption fine deammoniation process composed of two towers and the subsequent hydrogen / nitrogen extraction process, Ammonia water with an ammonia concentration of 4-8% is formed at the bottom of the water washing tower, which is sent to the ammonia water concentration process to reach 20% to form an ammonia water by-product for output.

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Abstract

The invention discloses an LED (light emitting diode)-MOCVD (metal organic chemical vapor deposition) processing tail gas film and a method for recycling ammonia extracted by adsorption coupling. Rawgas is pretreated and then enters a pervaporation membrane process, the generated impermeable gas enters a pressure swing adsorption process, the obtained non-adsorbed phase gas is nitrogen-hydrogen mixed intermediate gas, is directly output, incinerated and discharged, or enters a fine deamination and pressure swing adsorption separating unit to further recycle hydrogen gas and / or nitrogen gas, whereas the obtained adsorbed phase gas is ammonia-containing condensed gas, which is subjected to blast or compression to be mixed with the raw gas to directly enter the pervaporation membrane processto further recycle ammonia, hydrogen gas and / or nitrogen gas. The technical problem that ammonia-containing exhaust gas recycled at normal pressure or low pressure in an LED-MOCVD process cannot go back to the LED-MOCVD process to be further used is solved, thereby filling the blank for the green and cyclic economy development of LED industry.

Description

technical field [0001] The present invention relates to the electronic environmental protection field of ammonia NH3 preparation in the manufacturing process of semiconductor light-emitting diode LED and recycling of NH3 in waste gas, and more specifically relates to a kind of LED-MOCVD metal oxide chemical vapor deposition tail gas film separation and transformation A method for recovering and reusing ammonia extracted by pressure adsorption. Background technique [0002] MOCVD metal oxide chemical vapor deposition process equipment is a modern method and means for the research and production of compound semiconductor materials, especially as a method and equipment for the industrial production of new light-emitting materials-light-emitting diodes. Its high quality, high stability, high Repeatability and large-scale are irreplaceable by other semiconductor material growth methods and equipment. It is the main method and means of producing optoelectronic devices and microwav...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/22B01D53/047B01D50/00C01C1/02
CPCB01D50/00B01D53/047B01D53/228C01C1/02Y02C20/20Y02P20/129
Inventor 钟娅玲钟雨明汪兰海陈运唐金财陈勇蔡跃明
Owner ZHEJIANG TIANCAIYUNJI TECH CO LTD
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