Novel photoresist developing device and developing method

Abstract

The invention discloses a novel photoresist developing device. The novel photoresist developing device comprises a base fixing rack, a photoresist plate fixing rack, a developing solution tank, an ultrapure water tank, a buffer groove and a liquid circulating port, wherein the developing solution tank and the ultrapure water tank are selectively communicated with the buffer groove, and a liquid inthe buffer groove is communicated with the outside through the liquid circulating port; the liquid circulating port is located above the photoresist plate fixing rack. According to a developing technology, a developing solution and a photoresist are subjected to a reaction to generate textured patterns, and the developing solution flows through the surface of the photoresist uniformly when the device performs developing, so that the problems of non-uniform developing and residual bubbles on the photoresist patterns are solved and product quality is improved.

Description

technical field [0001] The invention belongs to the technical field of developing devices, and in particular relates to a novel photoresist developing device and a developing method. Background technique [0002] Photolithography is an important part of modern micro-nano processing technology. As an important process after photolithography, how to present photolithographic patterns on the photoresist plate flawlessly is the goal of the development process. The traditional development process adopts the method of putting the photoresist plate into the development basin and developing it in a static or hand-cranked way. The static development has the problem that the development may not be complete, and the hand-cranked development has the problem of unstable hand speed, resulting in uneven development. And it is possible to generate bubbles in the pattern area during the developing process. [0003] In summary, in order to solve the problem of photoresist plate development, ...

AI Technical Summary

Problems solved by technology

The traditional development process adopts the method of putting the photoresist plate into the development basin and developing it in a static or hand-cranked way. The static development has the problem that the development may not be complete, and the hand-cranked development has the problem of unstable hand speed, resulting in uneven development.

And it is possible to generate bubbles in the pattern area during the development process

[0003] In summary, in order to solve the problem of photoresist plate development, the present invention relates to a simple photoresist plate development device and method, which makes the photoresist plate development convenient and easy to operate, and at the same time, due to the uniformity of the developer during development Contact the photoresist plate, avoiding the problem of uneven development and residual bubbles on the photolithographic pattern in the traditional developing method

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