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Elevating device and chemical vapor deposition device and method

A chemical vapor deposition and lifting device technology, applied in the field of chemical vapor deposition devices and lifting devices

Pending Publication Date: 2019-03-05
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Although the existing chemical vapor deposition technology and equipment are sufficient to meet their needs, they are still not fully satisfied.

Method used

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  • Elevating device and chemical vapor deposition device and method
  • Elevating device and chemical vapor deposition device and method
  • Elevating device and chemical vapor deposition device and method

Examples

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Embodiment Construction

[0061] The following disclosure provides many different embodiments or examples to implement different features of the case. The following disclosure describes specific examples of various components and their arrangement in order to simplify the description. Of course, these specific examples are not meant to be limiting. For example, if the embodiment describes that a first feature is formed on or above a second feature, it means that it may include the case where the first feature is in direct contact with the second feature, or it may include additional features. It is formed between the first feature and the second feature so that the first feature and the second feature are not in direct contact.

[0062] The space-related terms used in the following, such as "below", "below", "lower", "above", "higher" and similar terms are used to facilitate the description of a The relationship between an element or feature and another element or feature(s). In addition to the orienta...

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Abstract

The invention provides an elevating device used for elevating a base plate in a chemical vapor deposition device. The elevating device comprises a driving mechanism, an elevating assembly, a couplingcomponent and a shielding component. The elevating assembly is configured to elevate the base plate under driving of the driving mechanism so that the base plate can be unloaded from a bearing platform. The coupling component is configured to couple the elevating assembly and the driving mechanism. The shielding component is configured to shield the coupling component and avoid that the coupling component is exposed in processing gas in the chemical vapor deposition device.

Description

Technical field [0001] The embodiments of the present disclosure relate to a semiconductor technology, in particular to a lifting device, a chemical vapor deposition (Chemical Vapor Deposition, CVP) device and method. Background technique [0002] Semiconductor devices are used in a variety of electronic applications, such as personal computers, mobile phones, digital cameras, and other electronic equipment. Semiconductor devices are usually manufactured by sequentially depositing insulating or dielectric layer materials, conductive layer materials, and semiconductor layer materials on a semiconductor substrate, and then patterning the formed layers of various materials using a photolithography process to form circuit components and parts On this semiconductor substrate. With the technological advancement of integrated circuit materials and design, multiple generations of integrated circuits have been developed. Compared to the previous generation, each generation has smaller a...

Claims

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Application Information

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IPC IPC(8): C23C16/458C23C16/455
CPCC23C16/455C23C16/4581
Inventor 曾银彬吕育颖王俊权
Owner TAIWAN SEMICON MFG CO LTD
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