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Evaporation structure, evaporation system and using method of evaporation structure

A technology of evaporation and evaporation source, which is applied in the direction of vacuum evaporation coating, sputtering coating, gaseous chemical plating, etc., can solve the problems of poor uniformity of the film layer, and achieve improved uniformity, reduced sloshing range, and reduced The effect of differential pressure

Active Publication Date: 2019-03-26
CHENGDU BOE OPTOELECTRONICS TECH CO LTD +1
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Problems solved by technology

[0005] The application provides an evaporation structure, an evaporation system, and a method for using the evaporation structure, which can solve the problem that the liquid evaporation source material in the related art has different liquid heights at different positions of the evaporation crucible, resulting in The problem of the poor uniformity of the film layer formed on the plated substrate, the technical scheme is as follows:

Method used

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  • Evaporation structure, evaporation system and using method of evaporation structure
  • Evaporation structure, evaporation system and using method of evaporation structure
  • Evaporation structure, evaporation system and using method of evaporation structure

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Embodiment Construction

[0047] In order to make the purpose, technical solution and advantages of the present application clearer, the implementation manners of the present application will be further described in detail below in conjunction with the accompanying drawings.

[0048] Usually, when the evaporation structure does not move, the liquid level of the evaporation source material in the evaporation crucible is the same at different positions; and when the evaporation structure moves, under the action of inertia, the evaporation source material in the liquid state The plating source material will slosh in the evaporation crucible, resulting in different liquid level heights of the liquid evaporation source material at different positions in the evaporation crucible.

[0049] For example, please refer to figure 1 , when the moving direction X of the evaporation structure is horizontal to the right, under the action of inertia, the liquid level h1 of the liquid evaporation source material L near ...

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Abstract

The invention discloses an evaporation structure, an evaporation system and a using method of the evaporation structure and belongs to the technical field of displaying. The evaporation structure comprises an evaporation crucible, a spray nozzle and a floating plate; the evaporation crucible is used for containing an evaporation source material; the evaporation source material is heated and then changed from the liquid state to the gas state; the spray nozzle is disposed at an outlet of the evaporation crucible; the spray nozzle is used for spraying the gas-state evaporation source material tothe surface of a to-be-evaporated substrate; the floating plate is configured in a mode that the floating plate floats on the surface of the liquid-state evaporation source material, and a gap is reserved between the floating plate and the inner wall of the evaporation crucible; and the floating plate is provided with a plurality of hollowed-out structures, and the plurality of hollowed-out structures are configured to allow the gas-state evaporation source material to pass through. By means of the evaporation structure, the evaporation system and the using method of the evaporation structure, the uniformity of the membrane layer formed on the to-be-evaporated substrate is improved. The method is used for the evaporation structure and the evaporation system.

Description

technical field [0001] The present application relates to the field of display technology, in particular to an evaporation structure, an evaporation system, and a method for using the evaporation structure. Background technique [0002] During the preparation process of the organic light-emitting diode (English: Organic Light-Emitting Diode; abbreviation: OLED) display panel, the evaporation method is often used to prepare the film layer. [0003] In the related art, the evaporation method mainly uses an evaporation structure to spray the evaporation source material to the substrate to be evaporated, so as to form a film layer on the substrate to be evaporated. The evaporation structure usually includes: an evaporation crucible, and a nozzle located at the outlet of the evaporation crucible. The principle of the evaporation method is: place the solid or liquid evaporation source material in the evaporation crucible, and heat the evaporation source material by means of resis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24
CPCC23C14/243C23C16/45563C23C16/4582
Inventor 饶勇李有亮刘金彪谭瑞岳小非罗楠胡斌仪修超沈萌加新星肖鹏李靖晋亚杰
Owner CHENGDU BOE OPTOELECTRONICS TECH CO LTD