650 results about "Vernier scale" patented technology

An electrostatic comb drive suitable for micro-electro-mechanical systems ("MEMS") application uses shaped fingers to achieve bi-directional actuation from a uni-polar actuation pulse. The finger shape also provides auto-braking of the movable member of the drive using a simple actuating pulse. In a further embodiment, an end stop inhibits overshoot and a back spring pushes the movable portion of the device back toward an operating position. In yet a further embodiment, a Vernier scale is provided on the movable portion of the drive relative to the fixed portion of the drive to indicate relative shift of these portions after the device is fabricated.

A grinding platform with an axis of rotation that is on the plane of the abrasive when used with belt grinders and on the plane that is vertical and tangent to the curvature of the abrasive when used with wheel grinders; such grinder having an angle gauge and possibly a vernier scale that allow for accurate determination of the angle of the tool rest in relation to the grinding surface. The grinding platform can also be continuously adjusted horizontally to compensate for wheel wear.

Position reference members are provided as part of an orthopaedic implant system. Both position reference members can be implanted on or in the same bone as the other parts of the implant. One of the position reference members is fixed to the bone and the other position reference member is movable with another part of the implant, such as a stem received in the intramedullary canal. The movable position reference member can move with respect to the fixed position reference member. At least one of the position reference members includes indicia such as a main scale or a vernier scale. Parts of the indicia and position reference members are radio-opaque and parts are radiolucent. Post-operative changes in the relative positions of the position reference members can be measured by radiography or fluoroscopy so that changes in the implant position can be monitored over time.

An orthopedic traction apparatus includes in coaxial arrangement, a first tubular member anchored to a operating table or other stationary structure supporting a patient, and a second tubular member telescopically moving within the first one. A hand-crank and jack-screw mechanism is used to vary the position of the second member in relation to the first member. A tensiometer is provided at the distal end of the second member proximate a fixture adapted for attachment to a part of a patient's body. The tensiometer is based on a compressible, calibrated coil spring and is provided with a vernier scale for convenient and precise adjustment of the traction force. Alternately, the tensiometer uses a load-cell driving a digital read-out.

The invention discloses a fatigue crack propagation rate testing method of a steel box girder. The fatigue crack propagation rate obtained by structure solid tests of the method is truer and more reliable than that obtained by the Paris equation obtained by present material tests for fatigue crack propagation. The Paris equation of the method is more instructive when being used for predicating residual life in a service period of a structure. When being used for measuring crack lengths, the method is different from conventional methods that shut down and measure with a vernier caliper. According to the method, a COD clip gauge is mounted to the front end of a mechanical gap of a steel box girder test piece, the linear relation between the COD clip gauge and the crack length a measured by the vernier caliper is calibrated through static load tests, the linear relation is applied to dynamic tests for the fatigue crack propagation rate and the real crack length a is measured directly through reading of the COD clip gauge, and therefore influences on accuracy of fatigue test results, which are caused by crack-tip plastic blunting caused by middle shutdown in dynamic fatigue tests, are avoided, time of shutting down tests and testing crack lengths is saved, and the test efficiency is increased.

This invention discloses a tunable semiconductor laser, in which, two Prague reflection secions limit borders of a gain section at both ends, reflection sections of the front and back ends can be designed to Prague grating suitable for generating comb reflection peaks with even peak values in form, two Prague reflection sections of a laser can be designed to the form of various traces, phase shift and chirp of Prague grating and the theory of vernier caliper is used to change the refraction rate of the two reflection sections of the laser to realize quasi-continuous tune of broad spectrum.

The invention provides a device and method for calibrating a non-contact type electrostatic voltmeter. The method includes the steps that a direct-current high-voltage power supply and metal plate electrodes are utilized to acquire a standard static filed at local space near the centers of the electrodes, the voltage of the non-contact type electrostatic voltmeter can be traced to the direct-current voltage standard, and an experimental method that the edge effect is increased is adopted to test the edge effect of the metal plate electrodes. The risks that people get an electric shock are reduced through a glass flat plate support which bears the metal plate electrodes and through a protective resistor, and a perpendicular moving mechanism can adjust the test distance of a calibrated meter. A detachable vernier caliper is adopted, and therefore tracing is convenient to conduct.

The invention relates to a vernier caliper cleaning device, in particular to a vernier caliper efficient cleaning device for detection equipment. The technical problem to be solved by the present invention is to provide a high-efficiency cleaning device for vernier calipers for detection equipment that can be cleaned comprehensively, saves time and effort, and has high work efficiency. In order to solve the above-mentioned technical problems, the present invention provides such a high-efficiency cleaning device for vernier calipers for testing equipment, including a base plate, etc.; the top of the base plate is vertically installed with brackets in a symmetrical way connected by bolts, and the top between the two brackets is connected by bolts The top plate is installed horizontally, and the top of the bottom plate and the bottom of the top plate are equipped with rotating devices. The present invention uses the first motor as the drive to make the vernier caliper rotate and the nozzle move up and down continuously, which is easy to operate and makes the vernier caliper have an excellent cleaning effect, achieving comprehensive cleaning, time-saving and labor-saving, and high work efficiency. Effect.

The invention provides a liquid crystal display having high reliability, which is excellent in terms of optical characteristics, heat resistance, and shock resistance, wherein a liquid crystal display consisting of a cholesteric liquid crystal, a chiral nematic liquid crystal or a liquid crystal 1 layer, being a combination thereof, which is roughly pillar-like and polygonal in section or has a roughly pillar-like form enclosed by a closed curve, and divided by said polymer network into areas whose minimum diameter measured by vernier calipers is 5 mum and whose maximum diameter measured by vernier calipers is 100 mum, is obtained by polymer networks 4 formed by polymerization of monomer, so that sufficient reflection can be obtained from the liquid crystal 1 without being optical scattering. Although the perpendicular array of the helical axes of liquid crystal 1 is slightly disordered by a polymer network 4 with respect to the plane of a pair of ITO 2a, 2b and substrates 3a,3b, wherein since almost all light entering from the substrata 3a side is reflected backwards (substrate 3a side) by Bragg's reflection, it is possible to decrease the visual angle dependency in comparison with a prior art liquid crystal display not containing any polymer constituents, and networks 4 which have been greatly established form intensive pillars (macromolcular resin walls), thereby improving the shock resistance properties.

The invention provides a flange multi-parameter integrated measuring device comprising an upper ruler, a lower ruler, a rotary device, a sliding device and a slider. Two sides of the upper ruler and the lower ruler are provided with scale values, the middle of the lower ruler is provided with an angle-measuring indexing plate, and the middle of the upper ruler is provided with a portion indexing plate corresponding to the angle-measuring indexing plate; the upper ruler and the lower ruler are arranged in a crossed manner, and the rotary device is arranged at the center of the cross point of the upper ruler and the lower ruler and is connected to the upper ruler and the lower ruler; the sliding device is flexibly connected to the ruler range of the upper ruler and the lower ruler whose two sides are provided with the scale values and is provided with vernier scales; the slider is connected with the sliding device and provided with scale values. The invention further provides a corresponding measuring method. The device has the advantages of simple structure, convenience for usage, high measuring efficiency and high measuring accuracy.

The invention relates to a simulative testing device and method of drilling tool thread dynamic fatigues in the technical field of petroleum and natural gas drilling engineering. The device comprises a base, a fine adjustment lifting device, a vibration exciter, a sliding bearing, a lower connection column, a vernier calliper, an upper connection column, a spring, a tensile nut, a compressive nut, a strain gauge and a measurement and control host. In the method, two parts including a static load module and a dynamic load module are adopted, wherein a static load is simulated by utilizing a spring mechanism; and a dynamic load is simulated by using a vibration excitation mechanism. By adopting the technical scheme, static tensile and compressive loads can be applied to a testing tubular column; dynamic excitation in different forms can also be applied; real-time monitoring and data recording of strain, exciting force and excitation frequency can be realized; and the device is simple in structure and convenient to use.

A fabrication method for a semiconductor device is provided, which is able to increase pattern-to pattern lithography overlay accuracy. After a first layer made of a first material is formed, first and second slits serving as a first alignment mark are formed in the first layer. The first and second slits are spaced with a specific distance and are approximately parallel to each other. Each of the first and second slits is filled with a second material. Then, a second layer made of a third material is formed on the first layer. Subsequently, a mask is formed on the second layer. The mask has a first pattern serving as a second alignment mark. The second alignment mark is overlapped with the first and second slits serving as the first alignment mark. Preferably, the first alignment mark provides the main scale of a caliper, and the second alignment mark provides the vernier scale of the caliper.

The invention discloses the function and the schematic diagram of a micrometer vernier caliper with the accuracy being 0.01 mm. The micrometer vernier caliper structurally comprises a main scale 7, an adding tape 11, a magnifying glass lens 10, a main scale outer diameter measuring end wall 8, an adding tape outer diameter measuring end wall 9, a main scale graduation 6, an adding tape graduation 12, a main scale inner diameter measuring end wall 1, an adding tape inner diameter measuring end wall 2, an adding tape anti-displacement fastening screw 3, an adding tape retaining screw 4, a chute 5, an adding tape propelling sheave 13 and a magnifying glass lens retaining screw 14. The invention has the advantages that the accuracy is very accurate; the use is convenient and durable; the popularization and the application are easy; and the market prospect is wide.

The invention discloses a heat contractibility rate measuring method for furniture thermoplastic plastic edge sealing stripes. The heat contractibility rate measuring method comprises the following steps of: preparing a circulating air oven, a test desk, a timer, a glass plate and talcum powder; preparing a sample and measuring the length L1; placing the test desk in the circulating air oven, and placing the glass plate on the test desk and uniformly spreading the talcum powder; adjusting the temperature of the circulating air oven to 60 to 70 DEG C, and placing the sample on the talcum powder; timing by utilizing the timer, taking out the sample after 4 hours, horizontally placing the sample for cooling at the room temperature, and measuring the length L2; and calculating the heat contractibility rate according to a formula. The invention adopts simple devices comprising the circulating air oven, the test desk, a slide calliper, the glass plate and the talcum powder. The temperature is controlled by the circulating air oven, i.e. the heat contractibility rate of edge sealing stripe products can be directly measured. The measuring method is simple and visual, the measuring result comes from practical per se, and the heat contractibility rate of the furniture edge sealing stripe products before and after edge sealing can be conveniently measured, thus the measuring result is more accurate.

The invention relates to a clinometer calibration stand. Adjustable landing legs are arranged at the bottom of a three-leg support frame, an upright column is arranged on the three-leg support frame, a mandrel is coaxially arranged in the axial center of the upright column, a rotary table is arranged above the mandrel, and a Y-axis vernier angle caliper is arranged at the periphery of the rotary table; a square supporting seat is connected to and positioned above the rotary table, a transmission shaft penetrates through the square supporting seat to be connected with a rotating disc large gear, a gear supporting seat of an adjusting small gear is arranged above the square supporting seat, the adjusting small gear is meshed with the rotating disc large gear, and an X-axis vernier angle caliper is arranged on the gear supporting seat; a U-shaped connecting frame is arranged at the other side of the transmission shaft, and a Z-axis vernier angle caliper is erected on the U-shaped connecting frame. The clinometer calibration stand disclosed by the invention can be used for accurately calibrating the angles of three coordinate axes by being provided with a three-circumference adjustable rotating mechanism and carries out micro-adjustment through the vernier scale of each coordinate axis, thereby enhancing the measurement accuracy, guaranteeing the convenience for adjustment and ensuring the measurement accuracy of a clinometer.

An encoder having a first array of n photodetectors and a code strip imaging system where n>2 is disclosed. Each photodetector is characterized by a width d. The code strip imaging system generates an image of a code strip on the first array. The image includes alternating dark and light stripes of width D. The dark stripes have a lower luminosity than the white stripes. The widths of the photodetectors and stripes in the image are chosen such that nd=(n−1)D, the code strip image moving in a first direction with respect to the first array, wherein the distances d and D are measured in a direction parallel to the first direction. Detector circuits convert the outputs from the photodetectors to logic signals that define a state for the encoder that repetitively cycles through 2n values when the code strip image moves a distance of 2D.

There are provided a semiconductor device having an overlay measurement mark, and a method of fabricating the same. The semiconductor device includes a scribe line region disposed on a semiconductor substrate. A first main scale layer having a first group of line and space patterns and a second group of line and space patterns is disposed on the scribe line region. Line-shaped second main scale patterns are disposed on space regions of the first group of the line and space patterns. Line-shaped vernier scale patterns are disposed on space regions of the second group of the line and space patterns. In the method, a first main scale layer having a first group of line and space patterns and a second group of line and space patterns is formed on a semiconductor substrate. Line-shaped second main scale patterns are formed on space regions of the first group of the line and space patterns. Line-shaped vernier scale patterns are formed on space regions of the second group of the line and space patterns.

The invention discloses a milling residual stress measuring method based on deflection changes and an inverse method. Corrosion delamination is carried out on a stress layer for multiple times, the thickness of a material layer removed through corrosion each time is measured by a vernier caliper, a part is scanned on a machine tool by using a laser displacement sensor to measure the change of the deflection of the part after the corrosion of each time, the change of the bending moment generated by the stress layer is obtained according to the change of the position of the neutral layer in the part, the residual stress value is calculated forwards in an inverse mode by combining the changes of measured deflection, and lastly the stress values of all the stress layers before the self-balance of the stress are obtained. The milling residual stress measuring method based on the deflection changes and the inverse method is simple in operation and reliable in result, and the used equipment is low in price.