A kind of method for preparing silica sol and silica sol
A technology of silica sol and silicon source, which is applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of many metal impurities and strong basic catalysts, and achieve high purity, easy control of purity, and simple operation process convenient effect
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Embodiment 1
[0031] The present embodiment provides a kind of method for preparing silica sol, comprises the following steps:
[0032] (1) Add the silicon slag produced in the polysilicon production process collected into ultrapure water, and carry out ultrasonic cleaning for 0.5 hour to remove the adhering impurities in the silicon slag, wherein the particle size of the silicon slag is 10 mesh; The silicon slag produced in the polysilicon production process is used as the silicon source for the preparation of silica sol, which can effectively utilize the silicon slag in the polysilicon production process, improve the economic benefits of the enterprise, and turn waste into treasure. It not only saves the post-processing cost of silicon slag, but also The cost of raw materials for preparing silica sol is saved.
[0033] (2) Soak the silicon slag that has been cleaned by ultrasonic waves in an acidic solution, and wash for 0.5 hour to remove the pollutants on the surface of the silicon slag...
Embodiment 2
[0043] The present embodiment provides a kind of method for preparing silica sol, comprises the following steps:
[0044] (1) Add the collected silicon slag produced in the polysilicon production process into ultrapure water, and perform ultrasonic cleaning for 1.5 hours to remove the adhered impurities in the silicon slag, wherein the particle size of the silicon slag is 100 mesh;
[0045] (2) Soak the silicon slag cleaned by ultrasonic waves in an acidic solution, wash for 1 hour, and remove the pollutants on the surface of the silicon slag, wherein the acidic solution is an aqueous solution of nitric acid and hydrofluoric acid, and the pH value is 3;
[0046] (3) Add the acid-washed silicon slag into ultrapure water, ultrasonically clean it for 1 hour, and then add it to ultrapure water for rinsing for 30 minutes to remove the residual acid on the surface of the silicon slag. The impurity content is less than or equal to 1ppm, and the purity of silicon is above 99.9999mas%; ...
Embodiment 3
[0054] The present embodiment provides a kind of method for preparing silica sol, comprises the following steps:
[0055] (1) Add the collected silicon slag produced in the production process of silicon source polysilicon into ultrapure water, and perform ultrasonic cleaning for 3 hours to remove the adhering impurities in the silicon slag, wherein the particle size of the silicon slag is 200 mesh ;
[0056] (2) Soak the silicon slag cleaned by ultrasonic waves in an acidic solution, wash for 2 hours, and remove the pollutants on the surface of the silicon slag, wherein the acidic solution is an aqueous solution of nitric acid and hydrofluoric acid, and the pH value is 1;
[0057] (3) Add the acid-washed silicon slag into ultrapure water, ultrasonically clean it for 1 hour, and then add it to ultrapure water for rinsing for 30 minutes to remove the residual acid on the surface of the silicon slag. The impurity content is less than or equal to 1ppm, and the purity of silicon i...
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Abstract
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