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A kind of method for preparing silica sol and silica sol

A technology of silica sol and silicon source, which is applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of many metal impurities and strong basic catalysts, and achieve high purity, easy control of purity, and simple operation process convenient effect

Active Publication Date: 2021-01-22
新疆硅基新材料创新中心有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide a method for preparing silica sol and silica sol in view of the above-mentioned deficiencies in the prior art, which solves the problem of using too many strong basic catalysts in the preparation of silica sol in the prior art. Technical problems with excessive metal impurities

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The present embodiment provides a kind of method for preparing silica sol, comprises the following steps:

[0032] (1) Add the silicon slag produced in the polysilicon production process collected into ultrapure water, and carry out ultrasonic cleaning for 0.5 hour to remove the adhering impurities in the silicon slag, wherein the particle size of the silicon slag is 10 mesh; The silicon slag produced in the polysilicon production process is used as the silicon source for the preparation of silica sol, which can effectively utilize the silicon slag in the polysilicon production process, improve the economic benefits of the enterprise, and turn waste into treasure. It not only saves the post-processing cost of silicon slag, but also The cost of raw materials for preparing silica sol is saved.

[0033] (2) Soak the silicon slag that has been cleaned by ultrasonic waves in an acidic solution, and wash for 0.5 hour to remove the pollutants on the surface of the silicon slag...

Embodiment 2

[0043] The present embodiment provides a kind of method for preparing silica sol, comprises the following steps:

[0044] (1) Add the collected silicon slag produced in the polysilicon production process into ultrapure water, and perform ultrasonic cleaning for 1.5 hours to remove the adhered impurities in the silicon slag, wherein the particle size of the silicon slag is 100 mesh;

[0045] (2) Soak the silicon slag cleaned by ultrasonic waves in an acidic solution, wash for 1 hour, and remove the pollutants on the surface of the silicon slag, wherein the acidic solution is an aqueous solution of nitric acid and hydrofluoric acid, and the pH value is 3;

[0046] (3) Add the acid-washed silicon slag into ultrapure water, ultrasonically clean it for 1 hour, and then add it to ultrapure water for rinsing for 30 minutes to remove the residual acid on the surface of the silicon slag. The impurity content is less than or equal to 1ppm, and the purity of silicon is above 99.9999mas%; ...

Embodiment 3

[0054] The present embodiment provides a kind of method for preparing silica sol, comprises the following steps:

[0055] (1) Add the collected silicon slag produced in the production process of silicon source polysilicon into ultrapure water, and perform ultrasonic cleaning for 3 hours to remove the adhering impurities in the silicon slag, wherein the particle size of the silicon slag is 200 mesh ;

[0056] (2) Soak the silicon slag cleaned by ultrasonic waves in an acidic solution, wash for 2 hours, and remove the pollutants on the surface of the silicon slag, wherein the acidic solution is an aqueous solution of nitric acid and hydrofluoric acid, and the pH value is 1;

[0057] (3) Add the acid-washed silicon slag into ultrapure water, ultrasonically clean it for 1 hour, and then add it to ultrapure water for rinsing for 30 minutes to remove the residual acid on the surface of the silicon slag. The impurity content is less than or equal to 1ppm, and the purity of silicon i...

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Abstract

The invention discloses a method for preparing a silica sol, the method comprises the following steps: (1) adding an alkaline catalyst or an alkaline catalyst aqueous solution into a mixture of a silicon source containing elemental silicon and water; and (2) introducing a direct current in the reaction process to generate the silica sol. According to the method, hydroxyl ions are provided by adding the alkaline catalyst, and water ionization is promoted to generate the hydroxyl ions, so that the initial reaction speed of the elemental silicon and the hydroxyl ions is induced, the direct current is introduced in the reaction process of the silicon and water, so that the hydrolysis reaction speed of the silicon is accelerated, and the silica sol is generated. According to the preparation method disclosed by the invention, the hydrolysis reaction speed of the silicon is accelerated by introducing of the direct current, and the mass of the used alkaline catalyst used in the step (1) is very small relative to the mass of the silicon source, so that the content of cations in the finally prepared silica sol is small, and the amount of hydroxyls adsorbed by the cations of the alkaline catalyst on the silica sol shell is reduced.

Description

technical field [0001] The invention belongs to the technical field of silica sol preparation, and in particular relates to a method for preparing silica sol and the silica sol. Background technique [0002] During the production process of polysilicon, some fine silicon slags will be produced, and these silicon slags cannot meet the needs of customers in terms of size, so they cannot be sold normally and effectively utilized. At the same time, these fine silicon residues will not only pollute the working environment, but also pollute qualified products. In the actual production process, in order to prevent pollution to the quality of polysilicon and the working environment, these silicon slags are simply collected and not effectively utilized, resulting in a certain waste of resources. [0003] Silica sol is a colloidal solution in which amorphous silica particles are uniformly dispersed in water. The surface of silica particles in silica sol contains a large number of hy...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/141
CPCC01B33/1412
Inventor 仝少超银波范协诚王瑞聪闵中龙朱秀萍
Owner 新疆硅基新材料创新中心有限公司