Exposure machine pre-alignment device and exposure machine
A technology of alignment device and exposure machine, which is applied in the direction of photolithography exposure device, photomechanical equipment, microlithography exposure equipment, etc., can solve the problems affecting production efficiency and production cost, mask scratches, downtime, etc. Achieve the effect of improving work efficiency and reducing maintenance and downtime costs
Inactive Publication Date: 2019-04-09
TUNGHSU KUNSHAN DISPLAY MATERIAL CO LTD +1
View PDF6 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
like figure 1 As shown, in the PA (Pre-alignment) unit in the prior art, the substrate is directly placed on the alignment table for alignment. When the substrate fragments occur, they cannot be effectively identified, causing the fragments to flow into the next step, which is very easy to cause photomask damage. Scratches or downtime, seriously affecting production efficiency and production costs
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0022] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0023] An embodiment of the present invention discloses a pre-alignment device for an exposure machine, such as figure 2 As shown, it includes an alignment workbench 1 and a fragment sensing mechanism, wherein the fragment induction mechanism is arranged around the alignment workbench 1 to detect whether the substrate 2 is fragmented.
[0024] The exposure machine pre-alignment device disclosed in this embodiment realizes the detection of fragments during the pre-alignment process by setting a fragment sensing mechanism, and can detect the fragments of the substrate 2 in time, and block the fragme...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention relates to an exposure machine pre-alignment device and the exposure machine using the exposure machine pre-alignment device. The exposure machine pre-alignment device comprises an alignment workbench and a fragment sensing mechanism; the fragment sensing mechanism is arranged around the alignment workbench and used for detecting whether the substrate is fragmented. By arranging thefragment sensing mechanism, the fragment detection in the pre-alignment process is realized, the technical problem that the downtime is produced or the photomask is scraped since the fragment flows into the next procedure can be effectively avoided, the fragment can be timely processed when being detected, the working efficiency is effectively improved, and the maintenance and halt cost can be reduced.
Description
technical field [0001] The invention relates to the technical field of TFT-LCD production, and more specifically, to an exposure machine pre-alignment device and an exposure machine. Background technique [0002] The main processes in the TFT-LCD color film process include coating, exposure, development, baking, and inspection. The exposure mechanism is PCP→ROBOT→PA→Work stage exposure, and the exposure process is to use ultraviolet light (UV) to pass through the mask (Mask), the image on the mask is transferred to the photoresist surface coated on the glass substrate, so that the irradiated photoresist reacts chemically; in the subsequent development process, due to the use of negative photoresist in the CF process , the irradiated part will remain. Such as figure 1 As shown, in the PA (Pre-alignment) unit in the prior art, the substrate is directly placed on the alignment table for alignment. When the substrate fragments occur, they cannot be effectively identified, caus...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/7085G03F9/70G03F9/7088
Inventor 王鹏飞史朋超
Owner TUNGHSU KUNSHAN DISPLAY MATERIAL CO LTD