Cleaning method and cleaning device of quartz wafers

Abstract

The invention relates to the field of processing of quartz wafers, and particularly discloses a cleaning method of quartz wafers and a cleaning device applicable to the method. The cleaning method specifically comprises the steps that the quartz wafers are mounted in coating fixtures through a wafer arrangement procedure; and the coating fixtures are put into a cleaning liquid to be cleaned. The cleaning device applicable to the cleaning method comprises a lifting basket with an upper opening, and the lifting basket is provided with a plurality of guide rail grooves used for inserting the coating fixtures. According to the cleaning method and the cleaning device provided by the invention, the purpose that the quartz wafers have independent cleaning spaces and can be cleaned comprehensivelyduring the cleaning process can be effectively guaranteed, impurities like particle impurities and adhesion dust on the surface of the quartz wafers are removed, the cleaning effect is excellent, andfollow-up coating quality is improved; and the cleaned quartz wafers do not need to be disassembled from the coating fixtures and can be directly subjected to treatment of follow-up steps, complexityof the follow-up steps is greatly simplified, and production efficiency is improved.

Description

technical field [0001] The invention relates to the field of quartz wafer processing, in particular to a method for cleaning a quartz wafer and a cleaning device suitable for the method. Background technique [0002] With the upgrading of electronic communication terminals, higher requirements are put forward for piezoelectric quartz devices, especially in terms of stability and miniaturization. The quartz wafer is one of the very important components in the piezoelectric quartz device. The cleaning process is involved in the processing of the quartz wafer. The cleaned wafer forms an electrode circuit through coating. If the cleaning effect of the quartz wafer is not good, it will directly affect Therefore, the cleaning process is one of the links that are decisive for the quality of the final product. [0003] Currently, quartz crystal manufacturers clean by placing a certain number of wafers in a basket such as figure 1 As shown, then a plurality of net baskets 12 are pu...

AI Technical Summary

Problems solved by technology

This solution can avoid bump damage during wafer stacking and cleaning, and at the same time ensure that wafers are cleaned thoroughly. However, the cleaning efficiency of this solution is too low, which is not conducive to the improvement of production efficiency.

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