Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Self-cleaning high anti-reflection coating solution and preparation method thereof, and self-cleaning high anti-reflection solar glass

A self-cleaning, solution-based technology, applied in glass tempering, glass manufacturing equipment, manufacturing tools, etc., can solve problems such as difficult to clean, solar glass adhesion, etc., achieve the effect of increasing light transmittance, improving self-cleaning effect, and reducing dosage

Active Publication Date: 2022-05-24
DONGGUAN CSG SOLAR GLASS
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The second purpose of the present invention is to provide a self-cleaning high-reflection solar glass suitable for the rainy areas in the south where industrial pollution is serious, so as to solve the problem that the existing solar glass is easily attached by industrial pollutants and difficult to cleaning problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-cleaning high anti-reflection coating solution and preparation method thereof, and self-cleaning high anti-reflection solar glass
  • Self-cleaning high anti-reflection coating solution and preparation method thereof, and self-cleaning high anti-reflection solar glass
  • Self-cleaning high anti-reflection coating solution and preparation method thereof, and self-cleaning high anti-reflection solar glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] First, the preparation of self-cleaning high-reflection coating solution:

[0039] Step a: Preparation of cationic polystyrene emulsion by soap-free emulsion polymerization:

[0040] According to the mass percentage, the 2% comonolymer acryloyloxyethyl trimethoxy ammonium chloride and 82.5% water were placed in the reaction vessel, 15% styrene was added for stirring, heated to 50 ° C under nitrogen protection, and then 0.5% potassium persulfate initiator aqueous solution was added dropwise, and the cationic polystyrene emulsion was obtained after the reaction.

[0041]Step b, the cationic polystyrene emulsion and solvent ethanol are mixed evenly, the amount of solvent is diluted to dilute the cationic polystyrene emulsion to a solid content of 1%, and then under the condition of stirring at 15 °C, the silicon source material tetramethoxysilane is added to react to obtain a silica coated polystyrene nano-core shell silica microglobule sol. In this step, the mass ratio of the...

Embodiment 2

[0048] The main technical solution of the present embodiment is the same as That of Example 1, the differences are:

[0049] First, the preparation of self-cleaning high-reflection coating solution:

[0050] Step a: Preparation of cationic polystyrene emulsion by soap-free emulsion polymerization:

[0051] According to the percentage of mass, the 2% methacryloyloxyethyltrimethyl ammonium chloride and 2% acryloylaminopropyltrimethyl ammonium chloride of the comonomer monomer, 75% water in the reaction vessel, add 20% styrene stirred, heated to 65 ° C under nitrogen protection, and then added 1% azo diisobutyl amamidamidine hydrochloric acid initiator aqueous solution dropwise, after the reaction to obtain a cationic polystyrene emulsion.

[0052]Step b: Mix the cationic polystyrene emulsion and solvent evenly, and then under the condition of stirring at 20 °C, add a silicon source substance to react to obtain a silica-coated nano-core shell silica microglobule sol coated with polys...

Embodiment 3

[0058] The main technical solution of the present embodiment is the same as That of Example 1, the differences are:

[0059] First, the preparation of self-cleaning high-reflection coating solution:

[0060] Step a: Preparation of cationic polystyrene emulsion by soap-free emulsion polymerization:

[0061] According to the mass percentage, the 0.2% dimethylaminoethyl acrylate and 0.3% diethylaminoethyl methacrylate of the comonomer monomer, 89.4% water in the reaction vessel, add 10% styrene stirred, heated to 73 ° C under nitrogen protection, and then add 0.1% ammonium persulfate and sodium persulfate according to the volume ratio of 1:2 mixed initiator aqueous solution, after the reaction to obtain a cationic polystyrene emulsion.

[0062]Step b, the cationic polystyrene emulsion and solvent mixed evenly, the amount of solvent is to dilute the cationic polystyrene emulsion to a solid content of 17%, and then under the condition of stirring at 28 °C, add a silicon source substanc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of anti-reflection and anti-reflection coating solution, in particular to a self-cleaning high anti-reflection coating solution and a preparation method thereof and a self-cleaning high anti-reflection solar glass. In the method, a nano-core-shell silica microsphere sol is prepared first, Then through a specific process, the surface of the core-shell structure silica microspheres is covered with a titanium dioxide layer nano-core-shell silica / titania microsphere sol, and finally diluted to a solid content of 3‑10% to obtain a self-cleaning high anti-reflection coating solution. While reducing the mass ratio of titanium dioxide / silicon dioxide, the present invention has the largest effective exposure area, solves the technical problem of increasing light transmittance and self-cleaning effect, and greatly improves the existing technology of solid silicon dioxide The problem of low porosity of the film layer as the main component.

Description

Technical field [0001] The present invention relates to the technical field of anti-reflection reduction coating fluid, specifically relates to a self-cleaning high-reflection coating solution and preparation method thereof and self-cleaning high-reflection solar glass. Background [0002] Solar photovoltaic is currently one of the most promising clean energy, in order to improve the photoelectric conversion efficiency, most of the photovoltaic glass manufacturers are in the effort to improve the transmittance of photovoltaic glass, that is, the use of light interference principle in the glass to add a layer of anti-reflection film, many of the anti-reflection coating fluids on the market mostly reach the effect of increasing the transmittance of about 3%, but the room for further improvement is very small. With the development of modern industry and urban construction, the air and water and other environmental pollution is serious, making it easy for pollution sources such as du...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/25C03B27/00
CPCC03B27/00C03C17/006C03C17/256C03C2217/71C03C2217/70C03C2217/40C03C2217/23C03C2218/32Y02P70/50
Inventor 周志文王科陈刚刘明刚陈海峰唐高山纪朋远贺志奇胡小娅陈诚
Owner DONGGUAN CSG SOLAR GLASS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com