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Crucible and point type evaporation source

A crucible and evaporation material technology, applied in vacuum evaporation plating, ion implantation plating, metal material coating process and other directions, can solve the problems of uneven evaporation, uneven formation, defective devices, etc.

Pending Publication Date: 2019-04-23
合肥欣奕华智能机器股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, due to reasons such as low purity of the substance to be evaporated, uneven distribution in the crucible, and a sharp rise in the temperature of the evaporation source, the heating temperature of the substance to be evaporated in the crucible is not uniform, resulting in uniform evaporation of the substance inside the crucible and uneven Evaporated substances will mix together to form massive splashes and accumulate at the opening of the crucible, resulting in reduced evaporation rate and uneven evaporation. As the accumulation of substances at the opening of the crucible increases, the opening of the crucible will be blocked, resulting in process stability. reduce
In addition, since the evaporating substance is ejected from the crucible in the form of a block, and evaporated on the substrate in the form of tiny particles, an uneven and unstable film is formed, resulting in defective devices.

Method used

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  • Crucible and point type evaporation source
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Embodiment Construction

[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0033] Such as figure 1 , figure 2 , image 3 , Figure 4 as well as Figure 9 As shown, a crucible includes a crucible body 1 with an opening formed at one end, the bottom of the crucible body 1 is used to accommodate evaporation materials 7, and at least one diffusion unit 2 is included, and the diffusion unit 2 is installed in the crucible body 1 Near one end of the opening, the diffusion unit 2 has a guide part and a barrier part, the barrier part is ...

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Abstract

The invention relates to the technical field of evaporation, and discloses a crucible and a point type evaporation source. The crucible comprises a crucible body with an opening in one end, the bottomof the crucible body is used for containing an evaporation material, at least one diffusion unit is included, and is arranged at the end, close to the opening, in the crucible body, the diffusion unit is provided with a flow guide part and a blocking part, the blocking part is used for blocking a blocky splashing object formed through uneven evaporation of the evaporation material from being sprayed out of the opening, the flow guide part is used for guiding the gas formed through evaporation of the evaporation material out of the opening, when the evaporation material is heated to be evaporated, the steam and the blocky splashing object are jointly moved to the diffusion unit, part of the blocky splashing object is bonded on the side, away from the opening, of the blocking part, the blockage of the opening is reduced, the part of blocky splashing object falls in the crucible body to be continuously heated and evaporated, the uneven evaporation of the evaporation material is reduced,the steam is guided out of the opening through the flow guide part, the steam and the blocky splashing object are separated, and the spraying-out phenomenon of the evaporation material is reduced.

Description

technical field [0001] The invention relates to the field of evaporation technology, in particular to a crucible and a point-type evaporation source. Background technique [0002] At present, in the OLED display panel manufacturing process, the preparation of the evaporated film is the most important step. Vacuum evaporation equipment is often used to form the evaporated film on the substrate. Among them, the point-type evaporation source is easy to use and operate. properties have a wide range of applications. [0003] The existing point-type evaporation sources mainly include the evaporation source and the crucible on the evaporation source for carrying organic or metal materials. During the evaporation process, the substrate is placed above the evaporation source, and the evaporation source is heated, and the organic or metal is heated to form steam. The upwardly evaporated vapor forms an evaporated film on the substrate. At present, due to reasons such as low purity of...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/243C23C14/543
Inventor 裴泳鎭杨帆丁熙荣金甲锡
Owner 合肥欣奕华智能机器股份有限公司
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