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Cutting method of chip

A cutting method and chip technology, applied in manufacturing tools, plasma welding equipment, laser welding equipment, etc., can solve problems such as chip failure, and achieve the effect of increased effective use area and good performance

Active Publication Date: 2019-06-21
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main purpose of this application is to provide a chip cutting method to solve the problem that the laser cutting method in the prior art easily leads to chip failure

Method used

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  • Cutting method of chip
  • Cutting method of chip
  • Cutting method of chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0042] The chip cutting process includes:

[0043] The chip 10 is turned over so that the back of the chip 10 faces up, that is, the substrate faces up, the substrate of the chip 10 is a single crystal silicon substrate, and a predetermined area on the front of the chip has a mark;

[0044] Laser is used to cut a predetermined area on the back of the chip to obtain a cutting groove, and the cutting groove is 2 / 3 of the thickness of the chip 10, and the obtained figure 2 shown in the structure, figure 2 The dotted lines in indicate where the cutting forms the cutting grooves;

[0045] Turn over the chip 10 again so that the chip is facing up;

[0046] Predetermined light is vertically incident on the above-mentioned chip 10 from the front of the above-mentioned chip, and the predetermined area on the front of the above-mentioned chip is covered with a light-blocking material. The transmittance of light is greater than 60%, and the above-mentioned predetermined light covers...

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PUM

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Abstract

The application provides a cutting method of a chip. The cutting method comprises the following steps: performing cutting at a predetermined region of a back of the chip by adopting laser to obtain acutting groove; performing etching at the predetermined region of a front of the chip by adopting a plasma etching method to obtain multiple chip units; wherein the projection of the predetermined region at the front of the chip on the back of the chip coincides with the predetermined region at the back of the chip. In the cutting method disclosed by the invention, the heat produced by laser cutting is less since the laser cutting is only performed on partial thickness of the chip from the back, the performance of the chip basically cannot be influenced, the partial thickness of the front of the chip is etched by adopting the plasma with smaller damage, so that the effective utilization area of the wafer is increased; the problem that the chip performance is changed even failed since the chip is cut into multiple units by adopting the laser can be avoided, the good performance of each chip unit formed by cutting is guaranteed.

Description

technical field [0001] The present application relates to the field of semiconductors, and in particular, relates to a chip cutting method. Background technique [0002] After the chip is processed on the wafer, it needs to be separated into units. Nowadays, mechanical cutting and laser cutting are mainly used to realize it. However, these two technologies have certain limitations, which will have a certain impact on the performance or yield of the product. For example, mechanical dicing will inevitably cause damage to the wafer structure, wasting the area of ​​the wafer, and if the damage area is too large, the chip function may fail. Although laser cutting has little damage, the heat generated by the laser may cause chip performance to change or even fail. [0003] The above information disclosed in the Background section is only to enhance the understanding of the background of the technology described herein, therefore, the Background may contain certain information whi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/78H01L21/3065B23K10/00B23K26/38
Inventor 王文罗军许静
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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