Plasma plant mutagenesis device and plasma plant mutagenesis method
A plasma and cold plasma technology, applied in the field of plasma technology processing equipment, can solve the problems of low energy of active particles, reduce operation time, reduce the usage of working gas, etc., achieve stable mutagenesis, efficient mutagenesis breeding, improve Efficiency and safety effects
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Embodiment 1
[0122] The plasma plant mutagenesis device was started and started to run, and the helium gas with a purity of 99.999% and a gas volume of 15 slm was introduced, and the temperature of the cooling water in the cooling module was controlled to be 10°C. After the plasma generator of the plasma device emits the jet for 5 minutes, use a thermometer to measure at 2mm below the plasma emitter according to Figure 5 In the manner shown, the temperature of the plasma jet is detected at 36 points, corresponding to the temperatures of the points from top to bottom and from left to right in the figure, which are shown in Table 1 below.
[0123] Figure 5 The plasma generator shown has a length of 79mm and a width of 58mm according to Figure 5 The way shown divides the generator into 36 areas, and measures the temperature of its central point respectively.
[0124] Table 1
[0125]
[0126]
[0127] The average temperature of 36 detection points is taken, the average value is 39...
Embodiment 2
[0134] In Example 2, using figure 2 The plasma mutagenesis breeding setup shown processes Arabidopsis seeds.
[0135] Specific steps are as follows:
[0136] (1) select Arabidopsis thaliana seeds, and utilize 10% sodium hypochlorite to carry out surface sterilization treatment to it;
[0137] (2) Arabidopsis seeds are divided into 5 parts (200 seeds per part, repeated 3 times), start the plasma plant mutagenesis device, and 50 seeds of each part are placed on the working plane of the slide table, 5 parts Seed treatment conditions were as follows: ① CK group was the control group without treatment; ② the power of radio frequency power supply was 200W, and the treatment time was 5min (200W, 5min group); ③ the power of radiofrequency power supply was 300W, and the treatment time was 5min (300W, 5min group). group); ④ the power of the RF power supply is 400W, and the processing time is 5min (400W, 5min group); ⑤ The power of the RF power supply is 400W, and the processing time ...
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