A kind of black silicon material and preparation method thereof

Abstract

The invention discloses a black silicon material and a preparation method thereof, which solves the shortcomings of the existing selenium-doped black silicon material preparation method. The preparation method comprises: obtaining a clean substrate; A layer of selenium film; under the hydrogen fluoride gas atmosphere, use femtosecond laser scanning ablation; remove silicon oxide on the surface of the material to obtain black silicon material. In the process of femtosecond laser ablation of the substrate material, the present invention introduces fluorine element, and by means of the chemical reaction between fluorine element and substrate silicon material, the black silicon material prepared has a microstructure cone array on the surface, that is, " This black silicon material has a strong light-trapping property, so the absorption wavelength of the black silicon material obtained in this way is expanded, and the absorption rate for visible light and near-infrared bands can be expanded to more than 93%.

Description

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AI Technical Summary

Benefits of technology

In this patented technology, there were two methods described during manufacturing processes involving forming thin films onto surfaces made of silicon or glass. These techniques resulted in stable and evenly dispersed deposits over large areas without damaging them. By controlling the amount of heat applied at specific points along certain directions, tiny pyramidal structures called snowflakes could emerge on top of each area where they act like small domes. A special type of semiconductive mirror used was developed through sputtering. Overall, this technique allows for precise placement of minute convexities on the desired pattern on the wafer's surface while maintaining their regular size distribution across different wavelength ranges.

Problems solved by technology

This patented technical problem addressed by these inventions relates to finding new ways to improve crystal quality while also improving its performance over existing methods like chemical vapor deposition (CVD). Black silicon can be useful because it allows more efficient use of solar energy without losing any greenhouse gases or pollution caused during production processes. Additionally, there may exist applications where certain characteristics of blacksilicon make them better suited compared to older technologies.

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