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A method for preparing ultra-thick Ti-Al-C ternary coatings by two-step PVD technology

A ti-al-c, coating technology, applied in coating, metal material coating process, vacuum evaporation plating, etc., can solve the inconvenience of long-term use and other problems, and achieve high-temperature oxidation resistance and film-base bonding force Excellent, good effect of impurity content control

Active Publication Date: 2021-06-08
NUCLEAR POWER INSTITUTE OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The technical problem to be solved by the present invention is that the existing technology for preparing ultra-thick Ti-Al-C ternary surface protective coating on materials cannot be well adapted to the high-temperature and high-pressure environment in the nuclear field, and the existing technology cannot obtain At the same time as a thicker coating, it has better oxidation resistance and corrosion resistance, which is not convenient for long-term use. The purpose is to provide a method for preparing ultra-thick Ti-Al-C ternary coatings by two-step PVD technology to solve the problem. Preparation of Ultra-Thick Ti-Al-C Ternary Surface Protective Coating

Method used

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  • A method for preparing ultra-thick Ti-Al-C ternary coatings by two-step PVD technology
  • A method for preparing ultra-thick Ti-Al-C ternary coatings by two-step PVD technology

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Embodiment 1

[0034] Such as figure 1 Shown, a kind of two-step method PVD technique of the present invention prepares the method for ultra-thick Ti-Al-C ternary coating, comprises the following steps:

[0035] Pre-preparation of Ti-Al-C ternary coating

[0036] Step (1) Pretreatment: Ultrasonic surface cleaning is performed on the zirconium substrate with acetone and deionized water respectively. After drying in a vacuum drying chamber, the sample is mounted on a three-dimensional turret in the vacuum chamber. The distance between the target and the base is kept at 200 mm. After the furnace door is finished, a high vacuum is drawn, and the vacuum degree reaches 3.5×10 -3 After that, start to heat slowly;

[0037] Step (2) Ion cleaning: After reaching the coating temperature of 350°C, fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning on the substrate sample, or use an electron gun to heat, clean and etch the substrate sample to further surface cleaning. The A...

Embodiment 2

[0045] Step 1: Pre-preparation of Ti-Al-C ternary coating

[0046] Step (1) Pretreatment: Ultrasonic surface cleaning is performed on the zirconium substrate with acetone and deionized water respectively. After drying in a vacuum drying chamber, the sample is mounted on a three-dimensional turret in the vacuum chamber. The distance between the target and the base is kept at 200 mm. After the furnace door is finished, a high vacuum is drawn, and the vacuum degree reaches 3.5×10 -3 After that, start to heat slowly;

[0047] Step (2) Ion cleaning: After reaching the coating temperature of 350°C, fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning on the substrate sample, or use an electron gun to heat, clean and etch the substrate sample to further surface cleaning. The Ar pressure is 2.0Pa, the bias voltage is -150V, the duty cycle is 70%, the buncher coil current is 11A, the electron gun power supply voltage is 45V, the current is 90A, and the cleani...

Embodiment 3

[0055] Step (1) Pretreatment: Ultrasonic surface cleaning is performed on the zirconium substrate with acetone and deionized water respectively. After drying in a vacuum drying chamber, the sample is mounted on a three-dimensional turret in the vacuum chamber. The distance between the target and the base is kept at 200 mm. After the furnace door is finished, a high vacuum is drawn, and the vacuum degree reaches 3.5×10 -3 After that, start to heat slowly;

[0056] Step (2) Ion cleaning: After reaching the coating temperature of 350°C, fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning on the substrate sample, or use an electron gun to heat, clean and etch the substrate sample to further surface cleaning. The Ar pressure is 2.0Pa, the bias voltage is -150V, the duty cycle is 70%, the buncher coil current is 11A, the electron gun power supply voltage is 45V, the current is 90A, and the cleaning time is 30 minutes.

[0057] Step (3) Generate the base c...

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Abstract

The invention discloses a method for preparing an ultra-thick Ti-Al-C ternary coating by two-step PVD technology. The surface of the zirconium cladding matrix sample is cleaned, and the sample is dried by cold wind and then clamped in a vacuum chamber. on the three-dimensional turret, and heat the substrate sample; fill in Ar gas, apply high bias voltage, and perform glow sputtering cleaning or electron gun heating, cleaning and etching on the substrate sample; use the arc needle to turn on the Ti x Al arc target, high bias sputtering to clean Ti x Al target, while generating a base layer on the surface of the substrate; low bias deposition of Ti x Al coating to form a transition coating; adjust the appropriate arc current and bias voltage, turn on the medium-frequency magnetron graphite target, deposit Ti-Al-C ultra-thick coating; perform high-temperature annealing. The material obtained under the preparation process of the present invention is more suitable for the nuclear field, is safer to use, and has better performance of the obtained material.

Description

technical field [0001] The invention relates to the coating field, in particular to a method for preparing an ultra-thick Ti-Al-C ternary coating by a two-step PVD technique. Background technique [0002] MAX phase materials combine some excellent properties of metals and ceramics, with ceramic properties such as low density, low thermal expansion coefficient, high elastic modulus and high strength, and metals such as good thermal conductivity, easy processing, thermal shock resistance and damage performance. These excellent properties make the MAX phase material of great value in surface coating applications, and it is a promising candidate material for surface wear resistance and high temperature oxidation resistance coatings. Ti-Al-C ternary compound (Ti 2 AlC or Ti 3 AlC 2 ) has excellent high temperature oxidation resistance, and a layer of dense and continuous Al is formed after the surface Al is oxidized at high temperature 2 o 3 The protective film effectively ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/32C23C14/35C23C14/58
CPCC23C14/0036C23C14/0635C23C14/325C23C14/35C23C14/5806C23C14/5853
Inventor 杨红艳张瑞谦韦天国闫萌陈乐邱绍宇彭小明
Owner NUCLEAR POWER INSTITUTE OF CHINA
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