48results about How to "Strong membrane binding" patented technology

The invention discloses a preparation method of a MoS2 composite thin film with high hardness and loss abrasion on a surface of a substrate. The method comprises the following step: sequentially depositing a metal Ti priming coat, a TiN transitional layer and a Ti/MoS2 composite thin film on the surface of the substrate by using a high power pulse magnetron sputtering technology combined with optimized process conditions to obtain the MoS2 composite thin film which is strong in film binding force and high hardness and has low frictional coefficient and wear rate in various frictional environments. The nano hardness of the composite thin film is over 11GPa, the critical load value is over 60N, and the frictional coefficients in room-temperature air with relative humidity of 30%, 50% and 70%, an N2 atmosphere and a hydraulic oil environment are below 0.055. Therefore, the substrate is effectively protected in frictional reduction, and the composite thin film has a good application prospect.

The invention discloses a Cr/CrN/CrAlSiN/CrAlTiSiN nano-multilayer gradient film and a preparation method thereof, and belongs to the technical field of nitriding films. The Cr/CrN/CrAlSiN/CrAlTiSiN nano-multilayer gradient film is composed of a Cr base layer, a CrN transition layer, a CrAlSiN transition layer and a CrAlTiSiN film layer which are sequentially deposited on a low-alloy steel or mould steel base body by adopting a multi-arc ion plating method; the total thickness of the nano-multilayer gradient film is 1.5 [mu]m-4.2[mu]m; total content ranges of Cr, Al, Ti and Si elements are correspondingly 30at%-34at%, 20at%-28at%, 10at%-14at% and 3at%-5at%; and film base adhesion force of the nano-multilayer gradient film is 35-45N, the friction coefficient is 0.01-0.02, and nano-hardnessis 35-40 Gpa. According to the preparation method, by changing the base body negative bias and deposition time of middle layers and converting targets, the nano-multilayer gradient film with high tenacity, low friction coefficient and good abrasion performance is obtained.

The invention provides a preparation method for a composite coating of a cutter. The preparation method for the composite coating of the cutter specifically comprises the steps that (A) the cleaned cutter is clamped on a workpiece rack of a high-power pulsed magnetron sputtering instrument, after vacuumizing, an electric heater is started, and then the electric heater is adjusted; (B) inertia gas is fed into a cavity of the high-power pulsed magnetron sputtering instrument, a bias power supply is started, and then glow cleaning is conducted on the cutter; (C) after glow cleaning is ended, the vacuum degree of the cavity of the high-power pulsed magnetron sputtering instrument is adjusted, and a titanium target is started for depositing a Ti layer; and (D) after bombarding is completed, a nitrogen flowmeter valve is opened, a TiN layer and a TiSiN layer are deposited, and the coating of the cutter is obtained after cooling. According to the preparation method for the composite coating of the cutter, the TiSiN nanometer composite coating is prepared through a high-power pulsed magnetron sputtering technology, and the preparation technology of the TiSiN-based coating of the cutter is stable, reliable and high in repeatability and has important application value for high-speed machining of materials difficult to machine, the improvement of the performance of various mechanical part products and the development of the equipment manufacturing industry.

The invention provides a Ti/TiN/TiAlSiN/TiAlCrSiN nanometer multi-layer gradient film and a preparation method thereof, and belongs to the technical field of nitriding films. The nanometer multi-layergradient film is composed of a Ti priming coat, a TiN transition layer, a TiAlSiN transition layer and a TiAlCrSiN film layer which are sequentially deposited on a low-alloy steel or mold steel matrix through a multi-arc ion plating method. The total thickness of the nanometer multi-layer gradient film is 1.8-3.6 micrometers; the total content ranges of Ti, Al, Cr and Si elements are 30-34 at%, 20-24 at%, 5-10 at% and 3-5 at% separately; and the film-matrix combination force of the nanometer multi-layer gradient film is 36-48 N, the friction coefficient is 0.02-0.03, and the nanometer hardness is 32-36 Gpa. The method obtains the nanometer multi-layer gradient film which is high in toughness, low in friction coefficient and good in abrasion resistance by changing the negative bias voltageof the matrix, the depositing time of each middle layer and target switching.

The invention relates to a high-performance silicon carbide nano-fiber membrane and a preparation method thereof. The preparation method comprises the following steps: adding a certain amount of silicon carbide nano-fibers into de-ionized water; stirring and carrying out ultrasonic mixing to prepare a uniform and stable membrane preparation solution; uniformly spraying the membrane preparation solution on a porous ceramic matrix by adopting a spray coating method; after drying at constant temperature, immersing the porous ceramic matrix into metal oxide sol; then carrying out negative-pressuresuction to enable a pore channel of the matrix to be fully filled with a sol solution; drying the porous ceramic matrix adsorbed with the sol again at constant temperature; finally, raising the temperature through a program and sintering to obtain the silicon carbide nano-fiber membrane. The silicon carbide nano-fiber membrane prepared by the preparation method can be effectively embedded into the surface-layer pore channel of the matrix; the binding force between the nano-fiber membrane and the porous ceramic matrix is strong. The separation membrane provided by the invention has the advantages of good thermal shock resistance, great gas flux and the like, can be used for purification treatment of industrial tail gas and has a wide application prospect in clean production of fields including cement, glass, metallurgy, energy sources and the like.

The invention discloses a preparation method of a CrAlN coating based on a HIPIMS technology. The high-power pulse magnetron sputtering technology (High Power Impulse Magnetron Sputtering, HIPIMS) is adopted, a method for co-sputtering by using a high-power pulse target (High pulse power cathode) and a bipolar pulse target (Bipolar pulsed sputtering cathodes) is used, and a (H+B) CrAlN coating is deposited; and meanwhile, an ARC CrAlN coating is deposited by adopting a fourth-generation arc ion plating technology (ARC evaporators). The performance of all aspects of the coating is analyzed through a scratch test, an X-ray diffraction, a microscopic morphology observation, an electrochemical corrosion test and the like, and the binding force of a (H+B) CrAlN coating film is stronger, and the maximum critical load can reach 62.4N; the surface crystal grains are smaller, the defects are few, and the section tissues are compact; meanwhile the high-temperature oxidation resistance of the CrAlN coating prepared by the (H+B) method is optimal; and the coating prepared by co-sputtering in the aspect of coating corrosion resistance is more corrosion-resistant than the coating prepared by electric arc ion plating.

The invention belongs to the field of film material preparation, and in particular relates to a method for preparing a nanocomposite superhard film. The method first deposits MeN on a substrate by means of magnetic filter arc ion plating to form a 50-nanometer-thick MeN film as a transition layer, and then continues MeN is deposited by magnetic filtered arc ion plating, and Si3N4 is co-deposited on the substrate by ion beam sputtering. During the co-deposition process, a negative DC bias of -100V is applied to the substrate to obtain nanocrystalline MeN/amorphous Si3N4 Nanocomposite superhard film. The invention combines magnetic filter arc ion plating with ion beam sputtering, utilizes the characteristics of similar working pressures of the two to make up for each other's deficiencies, and obtains nanocrystalline MeN/amorphous Si3N4 nanocomposite superhard films with good film base binding force.

The invention relates to a transition metal nitride coating with a nano multilayer structure as well as a preparation method and application thereof. The transition metal nitride coating with the nano multilayer structure comprises a nitride bonding layer deposited on the surface of a hobbing cutter base body, wherein a nano multilayer nitride functional layer is deposited on the surface of the nitride bonding layer; the nano multilayer nitride functional layer comprises a TiAlN modulation layer and a Cr (Al) N modulation layer, and is prepared by alternately stacking and depositing the TiAlN modulation layer and the Cr (Al) N modulation layer. Through the microstructure design of a coating material, different modulation layers of the transition metal nitride coating with the nano multilayer structure form a coherent or semi-coherent interface, the hardness, toughness, film-substrate binding force, wear resistance, friction reduction and high-temperature performance of the coating are all improved, and the coating is mainly used for the field of gear milling machining of bimetal band saw blades.

The invention discloses a micro-drill for copper alloy processing and a preparation method thereof. The micro-drill comprises a micro-drill base body and a thin film deposited on the surface of the micro-drill base body; and the thin layer consists of three film layers; a transitional metal element film layer, a transitional metal carbide film layer and a diamond-like carbon film layer are arranged on the surface of the micro-drill base body in sequence from inside to outside. The preparation method comprises the step that: after the tip of the micro-drill base body is shielded by metal wires, the deposition of three film layers is carried out on the micro-drill base body by a linear ion source or/and a magnetic control sputtering source. The invention takes the shielding measures with metal wires on the tip of the high-speed steel micro-drill, and then carries out deposition of a plurality of layers of films, thus greatly improving the wear resistance and anti-adhesion performance, service life and processing quality of the micro-drill for copper alloy processing.

The invention provides a component structure double-gradient functional coating for a cutting tool and a preparation method of the component structure double-gradient functional coating. The coating is formed by alternately depositing two performance variation layers, namely a Ti<1-x-y>Al<x>Me'<y>N layer and a Ti <1-x-y>Al<x>Me"<y>N layer, on the surface of a tool base body in thickness progressive decreasing and processing increasing trends. The preparation method comprises the following steps that the tool base body is prepared; the tool base body is pretreated; and the Ti<1-x-y>Al<x>Me'<y>Nlayer and the Ti <1-x-y>Al<x>Me"<y>N layer are alternatively deposited on the tool base body in the different progressively decreasing and progressively increasing trends by adopting a cathodic arc ion plating technology to obtain the component structure double-gradient functional coating for cutting. Compared with a common-structure multi-element coating, the component structure double-gradientfunctional coating for the cutting tool has the advantages that the multi-element composite effect is maximized, the gradient structure design is optimized, the stress of the coating is reduced, the good film-base and film-film binding force is guaranteed, meanwhile, the wear resistance, the impact resistance and the thermal stability of the coating are further improved, the machining life of a correspondingly coated tool is also greatly prolonged, and the service reliability of the corresponding coated tool is also greatly improved.

The invention discloses a preparation method of multilayer nano-composite-class diamond films on the surface of a camshaft. Due to the adoption of a high-frequency and high-power impulse magnetron sputtering technology, the multilayer nano-composite-class diamond films are deposited on the surface of the camshaft. The thicknesses of the composite films are 0.2-0.5 micrometer, the thickness of a bearing layer of the composite films is 1-3 micrometers, and the surface thickness of the composite films is 1-3 micrometers. The surface binding force of the composite film camshaft is up to 60N.

The invention discloses a neodymium iron boron magnetic material with a composite coating layer. A vacuum aluminum nitride plated thin film and a vacuum silicon carbide plated thin film are attached to the surface of the neodymium iron boron magnetic material in sequence from inside to outside; the vacuum aluminum nitride plated thin film is 100-500nm thick, and the vacuum silicon carbide plated thin film is 200-500nm thick. The surface of the neodymium iron boron magnetic material is provided with aluminum nitride and silicon carbide in vacuum plating manner; after the aluminum nitride is arranged in the vacuum plating manner, the roughness of the plated layer is changed, and the internal stress of the plated film layer is reduced; then the silicon carbide is arranged in the vacuum plating manner, so that a film base is high in bonding force. The corrosion resistance and the acid-alkali resistance of the neodymium iron boron magnetic material are obviously improved; the service life is prolonged, and the conventional market requirement is met.

The invention discloses a small deep hole inner wall ultrasonic vibration machining cutter and a preparation method thereof, and belongs to the technical field of small deep hole inner wall machining. The tool and the method solve the technical problem that in the small deep hole inner wall high-frequency ultrasonic vibration machining process, a cutter is prone to abrasion due to the fact that heat is generated by friction and the cooling effect is poor. A cutter handle and a cutter base are integrated cylindrical connectors with different diameters, the cutter base is coated with a CVD diamond coating, a spiral groove is formed in the CVD diamond coating, and the cutter handle and the cutter base are both made of SiC. The CVD diamond coating on the surface of the cutter has higher abrasive particle density and does not contain any binding agent, so that the cutter has higher hardness and better wear resistance; and the spiral groove increases a chip containing space and can effectively improve the grinding performance and the chip removal and heat removal capacity, the machining stability of the cutter is improved, the service life of the cutter is prolonged, and high-efficiency, high-precision and high-quality ultrasonic vibration machining of the inner wall of a micro hole is achieved.

The invention discloses a Cr-Me multilayer film based on Zr as a substrate and a preparation method thereof and belongs to the field of plating of physical vapor deposition. By taking a Zr-4 alloy (prepared from 1.20-1.70% of Sn, 0.18-0.24% of Fe, 0.07-0.13% of Cr and 0.03-0.08% of Ni) as the substrate, the Cr-Me multilayer film is coated to the surface of Zr by means of a magnetron sputtering method. The modulation ratio of the Cr-Me multilayer film (Zr, Al, Mg and Nb) is 1: (0.1-10). The total number of layers of the Cr-Me multilayer film based on Zr as the substrate is 2-100 and the thickness is 0.5-50 [mu]m. The plated Cr-Me multilayer film can improve high-temperature water vapor corrosion resistance and oxidizing performance of a zirconium alloy tubular product, so that the service life of a zirconium alloy pressure pipe is prolonged, the nuclear leakage accident is reduced, and the economical benefit and the safety guarantee of nuclear industry are further improved.

The invention relates to a method for preparing a surface-enhanced Raman substrate by improving film-substrate bonding force. The method comprises the following steps of firstly, growing a flat transition layer on a substrate; growing a silver nanorod array thin film on the transition layer; uniformly covering the surface of silver with an ultrathin oxide film; heating the composite nanometer structure, so as to obtain the surface-enhanced Raman substrate with excellent film-substrate bonding force. The method has the advantages that the mismatching factor between the noble metal thin film andthe substrate is relieved by the transition layer, and the stress distribution and atom bonding in the whole film-substrate range are regulated; the good SERS (surface enhanced Raman scattering) sensitivity and thermal stability of the substrate are ensured by the ultrathin oxide layer at the surface of the silver nanorod; the substrate can be further heated, the atom diffusion between the thin film and the substrate can be promoted, the porosity at the interface is reduced, and the adhesion force is increased. The surface-enhanced Raman substrate with excellent film-substrate bonding force has the advantages that the easiness in falling is avoided, the stability is good, the transportation, storage and use are convenient, and the practicality of surface-enhanced Raman technique is enhanced.