Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ti/TiN/TiAlSiN/TiAlCrSiN nanometer multi-layer gradient film and preparation method thereof

A nano-multilayer, gradient film technology, applied in nanotechnology, coating, metal material coating technology and other directions, can solve the problems of low hardness, difference in coating performance, complicated device and process processing, etc., to improve wear resistance. performance and prolong service life

Active Publication Date: 2019-01-15
TSINGHUA UNIV
View PDF7 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The composite coating prepared by using the hollow cathode magnetron sputtering technology has a high film-substrate bonding force, but low hardness, and its equipment and process are very complicated, and the coating has local performance differences.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ti/TiN/TiAlSiN/TiAlCrSiN nanometer multi-layer gradient film and preparation method thereof
  • Ti/TiN/TiAlSiN/TiAlCrSiN nanometer multi-layer gradient film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0035] The present invention also proposes a preparation method for the above-mentioned Ti / TiN / TiAlSiN / TiAlCrSiN nano-multilayer gradient film, which specifically includes the following steps:

[0036] (1) Grind and polish the substrate step by step with sandpaper. Then put the substrate into acetone and ultrasonically clean it for 10 minutes. After cleaning, the substrate is cleaned with alcohol, dried and put into the coating vacuum chamber.

[0037] (2) Deposit Ti / TiN / TiAlSiN / TiAlCrSiN nanometer multi-layer gradient film on the substrate treated in step (1) by a multi-arc ion coating machine located in the coating vacuum chamber and a plurality of targets, the plurality of targets being 3 A Ti elemental target with a purity of 99.9%, an Al-Ti-Si alloy target, an Al-Ti alloy target and an Al-Si alloy target. The specific process is as follows:

[0038] (2-1) Place all the targets evenly on both sides of the substrate, and the horizontal distance to the substrate is 360mm. ...

Embodiment 1

[0048] Example 1: The coefficient of friction is 0.02, there is more argon, and the sputtering time is long

[0049] (1) Grind and polish the substrate step by step with sandpaper. Then put the substrate into acetone and ultrasonically clean it for 10 minutes. After cleaning, the substrate is cleaned with alcohol, dried and put into the coating vacuum chamber.

[0050] (2) Deposit Ti / TiN / TiAlSiN / TiAlCrSiN nanometer multi-layer gradient film on the substrate treated in step (1) by a multi-arc ion coating machine located in the coating vacuum chamber and a plurality of targets, the plurality of targets being 3 A Ti elemental target with a purity of 99.9%, an Al-Ti-Si alloy target, an Al-Ti alloy target and an Al-Si alloy target. The specific process is as follows:

[0051] (2-1) Place each target at a distance of 360mm from the substrate, heat the vacuum coating chamber to 400°C, keep it for about 0.5h, and vacuum to ≤4.0×10 -3 Pa.

[0052] (2-2) Deposit Ti as the bottom lay...

Embodiment 2

[0063] Embodiment 2: The binding force is greater than 36N

[0064](1) Grind and polish the substrate step by step with sandpaper. Then put the substrate into acetone and ultrasonically clean it for 10 minutes. After cleaning, the substrate is cleaned with alcohol, dried and put into the coating vacuum chamber.

[0065] (2) Deposit Ti / TiN / TiAlSiN / TiAlCrSiN nanometer multi-layer gradient film on the substrate treated in step (1) by a multi-arc ion coating machine located in the coating vacuum chamber and a plurality of targets, the plurality of targets being 3 A Ti elemental target with a purity of 99.9%, an Al-Ti-Si alloy target, an Al-Ti alloy target and an Al-Si alloy target. The specific process is as follows:

[0066] (2-1) Place each target at a distance of 360mm from the substrate, heat the vacuum coating chamber to 350°C, keep it for about 0.5h, and vacuum to ≤4.0×10 -3 Pa.

[0067] (2-2) Deposit Ti as the bottom layer: open 3 Ti single-substance targets, and close ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a Ti / TiN / TiAlSiN / TiAlCrSiN nanometer multi-layer gradient film and a preparation method thereof, and belongs to the technical field of nitriding films. The nanometer multi-layergradient film is composed of a Ti priming coat, a TiN transition layer, a TiAlSiN transition layer and a TiAlCrSiN film layer which are sequentially deposited on a low-alloy steel or mold steel matrix through a multi-arc ion plating method. The total thickness of the nanometer multi-layer gradient film is 1.8-3.6 micrometers; the total content ranges of Ti, Al, Cr and Si elements are 30-34 at%, 20-24 at%, 5-10 at% and 3-5 at% separately; and the film-matrix combination force of the nanometer multi-layer gradient film is 36-48 N, the friction coefficient is 0.02-0.03, and the nanometer hardness is 32-36 Gpa. The method obtains the nanometer multi-layer gradient film which is high in toughness, low in friction coefficient and good in abrasion resistance by changing the negative bias voltageof the matrix, the depositing time of each middle layer and target switching.

Description

technical field [0001] The invention belongs to the technical field of nitride films, in particular to a Ti / TiN / TiAlSiN / TiAlCrSiN nanometer multilayer gradient film and a preparation method thereof. Background technique [0002] Among the many coating preparation technologies, the coating prepared by multi-arc ion plating technology has the advantages of strong film-base binding force, high deposition rate, dense coating, strong binding force and easy adjustment of process parameters. It is the best choice for preparing hard film. important method. With the improvement of the efficiency of processing equipment, high-speed cutting has become the mainstream of machining. However, under extreme working conditions such as high speed and high load, hard film tools often fail due to severe friction and wear, and it is urgent to further improve the comprehensive mechanical properties and wear resistance of the hard film on the tool surface. [0003] TiN film has high hardness, go...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/32C23C14/16C23C14/06B82Y40/00
CPCB82Y40/00C23C14/0021C23C14/06C23C14/0641C23C14/16C23C14/325
Inventor 何永勇李杨张敏怡
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com