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Method for preparing CrN coating on surface of intaglio printing plate based on GIS and HIPIMS technologies

A printing plate technology, which is applied in the field of CrN coating preparation on the surface of gravure printing plate, can solve the problems of serious pollution in the electroplating process, rough coating surface, poor bonding force of the film base, etc., and achieve good brightness and compactness of the film layer , Small grains on the surface, strong film-base binding force

Pending Publication Date: 2021-05-11
北京丹普表面技术有限公司
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The electroplating process is seriously polluted and the coating surface is uneven
In recent years, the use of physical vapor deposition PVD technology to prepare coatings has been widely used. At present, the relatively mature micro-DC magnetron sputtering technology and arc ion plating technology, but the bonding force between the film and substrate of ordinary magnetron sputtering technology is poor, and the coating is easy to Peeling failure, arc ion plating technology has the advantages of high metal ionization rate and strong film-base binding force, but a large number of macroscopic particles are easy to accumulate during the deposition process, resulting in rough surface of the coating, and the internal stress of the coating is high. Low printing rate

Method used

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  • Method for preparing CrN coating on surface of intaglio printing plate based on GIS and HIPIMS technologies
  • Method for preparing CrN coating on surface of intaglio printing plate based on GIS and HIPIMS technologies
  • Method for preparing CrN coating on surface of intaglio printing plate based on GIS and HIPIMS technologies

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preparation example Construction

[0017] A method for preparing a CrN coating on the surface of a gravure printing plate based on GIS and HIPIMS technology, characterized in that the specific steps are as follows: using a nickel plate as a base, cleaning and drying the surface of the nickel plate, and then fixing it on the turntable of a coating machine, After the coating machine is evacuated, a certain temperature and bias voltage are set, a certain amount of argon and hydrogen gas is introduced, and the gas ion source etching and cleaning technology (Gas Ion Source Etching, GISETCH) is used to make the Ar atoms and H atoms The Ar ions and H ions are ionized under the lower pressure, and the Ar ions and H ions bombard and activate the nickel plate under the action of the bias voltage to complete the etching and cleaning of the surface of the nickel plate, and then complete the preparation of the Cr+CrN composite coating under the coating process.

[0018] As a preferred technical solution of the present invent...

Embodiment 1

[0024] figure 1 The coating was rubbed with a ball pit instrument, and the multilayer coating morphology of the coating was observed under a microscope after rubbing. It can be seen that each layer is distinct, and the ring structure is basically a concentric ring, which is consistent with figure 2 Compared with the traditional coating preparation method, this process can prepare more layers of coatings, uniform layer thickness, and better interlayer bonding.

[0025] image 3 They are ARC CrN and (H+B)CrN respectively. The curves fluctuating up and down on the baseline in the figure are acoustic emission signal curves, and the trend line above the baseline is the friction coefficient curve. The sudden interval of the friction coefficient curve indicates that the diamond indenter scratches from the coating to the substrate. As shown in the figure, the critical load of ARC CrN is 33.5N, and the critical load of (H+B)CrN is 72.2N ​​on the curve. The coating deposited by this...

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Abstract

The invention discloses a method for preparing a CrN coating on the surface of an intaglio printing plate based on GIS and HIPIMS technologies. According to the method, a high-quality Cr+CrN coating is plated on the surface of the intaglio printing plate by adopting a Gas Ion Source Etching (GISETCH) technology and a High Power Impulse Magnetron Sputtering (HIPIMS) technology, and an original water electroplating technology is replaced; after the performance of the coating in all aspects is analyzed through a ball pit test, a roughness test, a scratch test, a hardness test, surface topography observation and the like, it is found that the Cr+CrN coating prepared through the GISETCH technology and the HIPIMS technology is higher in film-substrate binding force, smaller in surface crystal grain, few in defect and compact in section structure; and through an actual printing test, the printing resistance rate exceeds the water electroplating level.

Description

technical field [0001] The invention belongs to the technical field of functional coatings, and in particular relates to a method for preparing a CrN coating on the surface of a gravure printing plate based on GIS and HIPIMS technology. Background technique [0002] Gravure printing uses the pits engraved according to the original manuscript to carry ink. The thickness of the lines and the thickness of the ink can be controlled arbitrarily during the engraving, and it is not easy to be imitated and forged. It is more and more widely used. Traditional gravure printing plate coatings use metal layers such as electroplated copper or chromium to increase life. The electroplating process is seriously polluted and the coating surface is uneven. In recent years, the use of physical vapor deposition PVD technology to prepare coatings has been widely used. At present, the relatively mature micro-DC magnetron sputtering technology and arc ion plating technology, but the bonding force...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/06C23C14/16C23C14/35
CPCC23C14/022C23C14/025C23C14/165C23C14/0641C23C14/35C23C14/3485
Inventor 杜建董骐田俊瑞胡中军
Owner 北京丹普表面技术有限公司
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