135 results about "High-power impulse magnetron sputtering" patented technology

An embodiment method includes depositing, in a processing chamber of a high-power impulse magnetron sputtering system, a metal containing layer over a substrate. The depositing includes applying a cyclic plurality of pulses. Each cycle includes applying a primary negative pulse on a target electrode to dislodge target atoms from the target electrode and a secondary positive pulse to accelerate the dislodged target atoms towards the substrate. The secondary positive pulse in one of the cycles is different from the secondary positive pulse in another one of the cycles.

The invention provides a high-entropy nano composite film with self-supporting performance and a preparation method. The preparation method comprises the following steps that a high-power pulse magnetron sputtering method is adopted, metal strips of four elements of Fe, Co, Ni and Cr are spliced together to serve as a sputtering target material, high-purity Ar and a carbon-containing gas source serve as working gas, negative bias voltage is applied to a substrate subjected to surface cleaning treatment, target voltage is applied to the metal splicing target, and high-entropy nano composite film deposition is conducted; and after deposition of the high-entropy nano-composite film is completed, cooling the high-entropy nano-composite film to 80 DEG C or below in a vacuum environment, deflating, opening the cavity and discharging the high-entropy nano-composite film out of the furnace, so that the high-entropy nano-composite film with the self-supporting performance is obtained on the surface of the substrate. The thin film comprises the following components in atomic percent: 5-35 at.% of Fe, 5-35 at.% of Co, 5-35 at.% of Ni, 5-35 at.% of Cr and 10-40 at.% of carbon atoms, and the sum of the atomic percent of the components is 100%. Through component design and process innovation, collaborative optimization of high hardness, high toughness, corrosion resistance and self-supporting performance is achieved.

Methods and systems are disclosed for depositing aluminum nitride thin films by reactive sputtering using a sequence of negative-polarity voltage pulses applied to an aluminum target, followed by a positive-polarity voltage pulse. HiPIMS-type waveforms may be used to implement the negative-polarity and / or positive-polarity pulses. A substrate is provided in a sputtering chamber, a process gas comprising an inert gas and a nitrogen-containing gas is introduced, and the chamber is maintained at a reduced pressure. A sequence of negative-polarity voltage pulses is applied to an aluminum target, followed by application of a positive-polarity voltage pulse to the target. The disclosed methods and systems can produce aluminum nitride thin films exhibiting improved crystallinity, thermal conductivity, and surface quality at reduced deposition temperatures (e.g., below 200° C.) and with deposition rates of at least about 50 nm / min suitable for industrial applications.

The present invention relates to a method for obtaining a multi-layer lubricant coating by magnetron sputtering, wherein the deposition of each layer of steps b) and c) is performed using the High-Power Impulse Magnetron Sputtering (HIPIMS) technique. Additionally, the present invention relates to a multi-layer lubricant coating formed on a substrate obtainable by said method. Finally, the present invention is directed to the use of the multi-layer lubricant coating obtainable by the method of the present invention in automotive, aeronautical, space, metal-mechanic and cryogenic sectors.

The present invention discloses a composite co-deposition method of high-power pulse magnetron sputtering and modulated pulse magnetron sputtering, and belongs to the technical field of material surface modification. Aiming at the problem that existing methods such as single-target high-power pulse magnetron sputtering (modulated pulse magnetron sputtering), DC-high-power pulse magnetron co-sputtering, and homogeneous multi-target modulated pulse magnetron sputtering composite co-deposition are difficult to achieve systematic regulation of the composition and microstructure of multi-element alloy coatings, the present invention combines the plasma and pulse discharge characteristics of high-power pulse magnetron sputtering and modulated pulse magnetron sputtering, and achieves regulation of the coating composition and microstructure by controlling parameters such as sputtering power, sputtering frequency, duty cycle, pulse time interval, peak current, and bias amplitude.

The invention mainly provides a gradient CrN / Cr composite coating structure for a nuclear fuel cladding and a preparation method. The preparation method comprises the following steps: providing a zirconium alloy substrate; forming a ZrN diffusion barrier layer on the surface of the zirconium alloy substrate; a Cr gradient transition layer is formed on the ZrN layer; and CrN / Cr multilayer structures are alternately deposited on the gradient transition layer. According to the technical scheme, Zr-Cr mutual diffusion can be effectively inhibited, generation of a brittle ZrCr2 phase at a substrate / coating interface is avoided, meanwhile, the CrN transition layer further strengthens the diffusion barrier effect through chemical stability, and the structural integrity of the coating in a high-temperature environment is improved; the design of periodically introducing the CrN layer is adopted, and a new interface is introduced to break continuous growth of thick columnar crystals of the Cr layer, so that a compact structure is formed; and the wear resistance and the cracking resistance of the coating are improved through the high hardness characteristic of CrN. Meanwhile, the high-power pulse magnetron sputtering technology is combined with automatic control, so that the thickness and the structure of the coating can be accurately regulated and controlled, and the process repeatability is ensured.

The invention relates to the technical field of hard alloy coating preparation, and discloses a preparation method of a HiPIMS coating adaptive to multi-grain-size hard alloy and a hard alloy cutting tool thereof. The preparation method of the HiPIMS coating adaptive to the multi-grain-size hard alloy comprises the main steps of vacuumizing, heating and heat preservation, argon glow discharge plasma etching and cleaning, arc electron source auxiliary cleaning and activation, and metal nitride coating deposition on the surface of a base material through the high-power pulse magnetron sputtering technology. According to the preparation method disclosed by the invention, the preparation of the metal nitride coatings on the hard alloy substrates with different grain sizes is realized, and the prepared metal nitride coatings have relatively high hardness and adhesive force, so that the problem that process parameters of hard alloys with different grain sizes need to be independently optimized in the prior art is solved; and the production efficiency is improved.

A method for forming a coating on a substrate formed from zinc sulfide (ZnS) is provided. A ZnS film is grown on the substrate with a radio frequency sputtering process and metal dopants are sputtered on the substrate with a high-power impulse magnetron sputtering process. The metal dopants can be molybdenum or tungsten and simultaneously sputtered while growing the ZnS film. The sputtering ionizes the coating where the coating has a sheet resistance that is less than 50 ohm / square and the metal dopants form n-type dopants in the ZnS film. The metal dopants can be formed at a concentration that varies with a thickness of the ZnS film. At a first thickness, the concentration is at a first concentration and at a second thickness greater than the first thickness, the concentration is at a second concentration less than the first concentration.

The invention relates to the technical field of solid oxide fuel cells, in particular to a preparation method of a manganese-cobalt spinel coating for a solid oxide fuel cell (SOFC) connector and the coating. The method comprises the following steps: treating a substrate, cleaning a target material, depositing a MnCo alloy coating by high-power pulse magnetron sputtering, and performing thermal conversion to form the (Mn, Co) 3O4 spinel coating. By optimizing process parameters, the uniformity, compactness and high-temperature oxidation resistance of the coating are remarkably improved, and the problems of shadow effect and coating defects existing in traditional direct-current magnetron sputtering are solved. The thickness of the obtained coating ranges from 4.8 micrometers to 5.3 micrometers, the surface roughness is lower than 1 micrometer, external diffusion of the Cr element can still be effectively restrained after the coating serves for 840 hours for a long time at the temperature of 800 DEG C, and the ASR value is lower than 30 m omega.cm. The preparation process is simple, is suitable for industrial production, and has high practical value and popularization prospect.

The invention provides a TiNbCrZr high-entropy film and a preparation method and application thereof.According to the preparation method, a high-power pulse magnetron sputtering technology is adopted, Ti blocks, Nb blocks, Cr blocks and Zr blocks with the specific mass ratio and the purity larger than or equal to 99.9% are periodically arranged to form a composite target material, and technological parameters such as the target-substrate distance of 50-70 mm, the working pressure of 0.3-0.5 Pa, the pulse width of 100 microseconds and the trigger voltage of 700-900 V are matched for regulation and control, so that the TiNbCrZr high-entropy film is obtained. The ionization rate of the target material can be improved to solve the problem of low ionization rate, and the structure and components of the thin film can be optimized by adjusting the alloy proportion of the target material and the peak power of the HPPMS; compared with a traditional magnetron sputtering product, the TiNbCrZr high-entropy film prepared through the method is higher in binding force, more compact in structure and more excellent in quality, a high-quality high-entropy coating with high wear resistance can be obtained finally, and precise optimization of film components and performance is achieved.

The invention provides a metal nitride-based composite coating and a preparation method thereof, and relates to the technical field of solid lubricating coatings, the metal nitride-based composite coating is composed of MoN metal nitride as a basic phase, high-entropy alloy (Cr-Al-Ti-Nb-V) doped as a reinforcing phase of MoN, and MoS2 and Ag as a lubricating phase. The preparation method comprises the following steps: depositing the MoN-based composite coating of Cr-Al-Ti-Nb-V compounded MoS2 and Ag on the surface of the substrate by adopting a high-power pulse magnetron sputtering technology. The preparation method has the beneficial effects that the defects that the MoS2-based thin film material is poor in lubricating performance in a high-temperature environment and the MoN coating is high in friction coefficient are overcome.

The invention provides a wear-resistant Cr / CrN nano coating and a preparation method and application thereof.The preparation method of the wear-resistant Cr / CrN nano coating comprises the steps that firstly, a Cr binding force layer is deposited on the surface of a base material through high-power pulse magnetron sputtering, and then the Cr binding force layer is compositely deposited through high-power pulse magnetron sputtering and pulse direct current sputtering; and a CrN layer is compositely deposited on the surface of the Cr binding force layer by adopting high-power pulse magnetron sputtering and pulse direct current sputtering. The nano coating is high in bonding strength with a base material and high in mechanical strength, the preparation method adopts a mode of combining high-power pulse magnetron sputtering and pulse direct-current magnetron sputtering, pulse parameters, deposition conditions and bias voltage are accurately regulated and controlled, the performance of the coating can be accurately controlled, the deposition rate is high, operation is easy and convenient, cost is low, and the method is suitable for batch production.

The invention discloses a method for depositing a TiAlSiN nano composite hard film through high-power pulse magnetron sputtering. An advanced combination technology of an arc enhanced glow discharge technology and a high-power pulse magnetron sputtering technology is adopted, and the TiAlSiN thin film which is well combined with a base body and is high in hardness, good in toughness and high in abrasion resistance is obtained. The method comprises the following steps: firstly, carrying out ion cleaning and etching on the surface of a workpiece matrix by utilizing argon ions generated by arc enhanced glow discharge, then optimizing key process parameters by adopting a high-power pulse magnetron sputtering technology under constant deposition temperature, gas pressure and reaction gas proportion, and depositing a TiAlSiN hard film on the surface of a hard alloy, stainless steel or high-speed steel, so as to obtain the TiAlSiN hard film on the surface of the hard alloy, stainless steel or high-speed steel. The thickness and the density of the film are easy to control, meanwhile, the binding force and the coating uniformity of the TiAlSiN film are remarkably improved, and excellent wear resistance and corrosion resistance are obtained. The method is easy to operate, high in repeatability, wide in applicability and wide in application prospect in the field of surface strengthening of advanced cutting tools and precision forming dies.

The present invention belongs to the technical field of mechanical processing tools, and specifically relates to a high-temperature wear-resistant coating tool and a preparation method thereof. The high-temperature wear-resistant coating tool prepared by a high-power pulsed magnetron sputtering process includes, from the substrate to the outside, an M bonding layer, an MN transition layer deposited on the surface of the M bonding layer, an NbN / CrB2 functional layer deposited on the surface of the MN transition layer, and a NbN coating deposited on the surface of the NbN / CrB2 functional layer; wherein the face-centered cubic structure MN in the high-temperature wear-resistant coating has excellent bonding strength to NbN, and in addition, the thickness of the NbN / CrB2 coating in the NbN / CrB2 functional layer presents a gradient trend, which can achieve the effect of reducing internal stress and preventing peeling. The coating prepared by the present invention not only has high-temperature stability and wear resistance, but also has high bonding strength and anti-stickiness, thereby solving the problem of easy wear and built-up edge when PVD coated tools cut high-temperature alloy materials, and the composite coating tool preparation process is simple, easy to operate, and suitable for industrial production.

The invention provides a wear-resistant coating for the inner wall of a slender pipe and a preparation method of the wear-resistant coating, and belongs to the technical field of wear-resistant coatings for pipelines. The method comprises the following steps: firstly, cleaning a slender tube, then placing an ion source in the center of the slender tube, placing a target material in the slender tube, sealing two ends of the slender tube, and arranging a vacuumizing loop and a gas loop to obtain the tubular magnetron sputtering device; and then the tubular magnetron sputtering device is sequentially subjected to ion cleaning, a binding force layer and a nano coating are prepared, the wear-resistant coating is obtained, and the binding force layer and the nano coating are prepared through a high-power pulse magnetron sputtering technology or a deep oscillation magnetron sputtering technology. According to the prepared wear-resistant coating, the nano hardness is 15-45 GPa, the H / E * is larger than or equal to 0.1, the uniformity is larger than or equal to 96%, the H3 / E * 2 is larger than or equal to 0.3, the Rockwell indentation binding force is larger than or equal to HF1, the fracture toughness KIC is larger than or equal to 3 MPa.m < 1 / 2 >, and the friction coefficient is smaller than or equal to 0.3.

The invention discloses a nickel-titanium alloy material and a preparation method and application thereof. The nickel-titanium alloy material comprises a nickel-titanium alloy body and a TiN-containing coating arranged on the surface of the body, wherein the coating is prepared by adopting a high-power pulse magnetron sputtering technology. The TiN-containing coating in the nickel-titanium alloy material is prepared through the HiPIMS technology, the obtained coating material has the remarkable characteristic of high compactness, and when the coating material is used for an implant material, the nickel element precipitation prevention effect is good. Meanwhile, the nickel-titanium alloy material has the advantages of high corrosion resistance, high binding force, low stress and the like, can be used in (non) implantable medical devices with high corrosion resistance and high compact protection requirements, and is good in application prospect.

The invention relates to the technical field of coatings, in particular to a PVD (Physical Vapor Deposition) coating process method applied to a galvanized sheet stamping die, which comprises the following steps of: pretreating the die, cleaning the surface of the die by a wet process, placing the die in a vacuum deposition cavity, vacuumizing, and heating to a preset temperature in an inert gas environment; plasma pretreatment is conducted on the surface of the mold, a high-power pulse magnetron sputtering cathode of a chromium target is selected to discharge in the argon working environment to generate plasma rich in chromium ions, and negative bias voltage is applied to the mold; starting at least one unbalanced magnetron sputtering cathode, gradually increasing the target current by the unbalanced magnetron sputtering cathode in a current ramp-up mode so as to improve the target voltage, and synchronously introducing nitrogen as a reaction gas, so that a nitride transition layer is deposited on the surface of the mold; and a high-power pulse magnetron sputtering cathode and an unbalanced magnetron sputtering cathode synchronously work on the transition layer to carry out multi-source reactive sputtering deposition, so that a multi-layer hard coating formed by alternating titanium aluminum vanadium and chromium nitride is formed. By combining the high-power pulse magnetron sputtering technology and the unbalanced magnetron sputtering technology, the problems that in the prior art, a coating is poor in adhesive force and insufficient in high temperature resistance are solved.

The invention provides a preparation method of a high-entropy nitride anti-erosion coating, which comprises the following steps: (1) polishing, cleaning and drying a sample in sequence, placing the sample in a vacuum coating chamber, introducing argon Ar, adjusting the flow of the argon Ar, and carrying out ion bombardment cleaning on the surface of the sample; (2) acquiring the optical emission intensity of the plasma after argon Ar is introduced and the optical emission intensity of the plasma after nitrogen N2 is introduced; (3) depositing a high-entropy alloy transition layer on the surface of the sample; (4) depositing a high-entropy nitride anti-erosion coating on the surface of the sample; and (5) taking out the sample to complete preparation of the coating on the surface of the sample. The preparation of the high-entropy nitride anti-erosion coating is completed by adopting a bipolar high-power pulse magnetron sputtering technology and an ion source to jointly construct a high-density plasma film forming environment, so that the nitridation reaction on the surface of the target material can be effectively inhibited, and the characteristic peak intensity of the plasma is kept unchanged; and the stability of plasma components in the film forming process is ensured.

The invention discloses an ABS plastic part low-temperature metallization vacuum coating process and equipment. The equipment comprises a machine body, a coating tank is embedded in the machine body, a side plate is fixedly installed at the upper end of the machine body, a storage rack is movably installed in the coating tank, an operation ring is movably installed in the coating tank, and the side face of the operation ring is movably connected with a threaded rod through threads. The stable coating equipment is arranged, a plastic part is placed in a storage rack in the vacuum coating equipment, a plasma cleaning opening in the upper end of an operation ring is used for cleaning the surface of the plastic part and removing grease and impurities on the surface, and a temperature controller is installed in the equipment and used for controlling the internal temperature; when the temperature is too high, the liquid nitrogen cooling system is used for cooling, the high-power pulse magnetron sputtering device mounted at the upper end of the operation ring is used for coating a plastic part and depositing a metal layer, finally, ultraviolet curing treatment is performed, and meanwhile, the high-power pulse magnetron sputtering technology is adopted, so that the pollution to the environment is reduced, and the coating precision is improved.

The high-flux preparation device comprises a reaction cavity, a vacuum control system and a gas path control system are arranged on the reaction cavity, a bias voltage power supply is arranged on the reaction cavity, an extraction opening and a working gas input opening are formed in the reaction cavity, and the vacuum control system, the gas path control system, the bias voltage power supply, the extraction opening and the working gas input opening are arranged on the reaction cavity. The four-target closed field unbalanced magnetron sputtering system comprises a cylindrical vacuum chamber, two groups of carbon target materials are arranged on the side wall of the cylindrical vacuum chamber, the carbon target materials form a closed field unbalanced system, the input end of the first group of carbon target materials is connected with the output end of a pulse direct current magnetron sputtering power supply, and the input end of the second group of carbon target materials is connected with the output end of a pulse direct current magnetron sputtering power supply. And the input end of the second group of carbon target materials is connected with the output end of the high-power pulse magnetron sputtering power supply. According to the method, the performance of the coating can be accurately controlled by regulating and controlling the parameters of the micropulses, the deposition rate is high, operation is easy and convenient, cost is low, and in addition, flammable and explosive acetylene gas is not adopted, so that the method is safer and more reliable.

The present invention discloses a coupled ion beam preparation device and method for an antigen-antigen oxygen polymer composite film. The device comprises a winding and unwinding system, a Hall ion source etching system, a MEVVA ion implantation system, a magnetically filtered cathode vacuum arc deposition system, and a high-power pulsed magnetron sputtering deposition system. The systems are connected via oxygen-free copper O-rings. The polymer film substrate is transported within the device, and the prepared composite film layer structure is shown in Figure 1. The composite film prepared using this technology exhibits excellent interfacial adhesion strength and film-substrate cooperative deformation capability, effectively alleviating AO erosion and degradation induced by cracking of the protective film caused by space debris collisions and thermal cycling, significantly improving the service life of polymer components.

The invention discloses a heat treatment process for improving the hardness, toughness and wear resistance of a Zr-B-N / ZrO2 multi-layer composite coating, and belongs to the technical field of coatings. According to the process, a vacuum tube furnace is adopted for carrying out heat treatment on a Zr-B-N / ZrO2 multilayer composite coating deposited through a high-power pulse magnetron sputtering and pulse direct-current magnetron sputtering composite technology, the process comprises a heating stage, a heat preservation stage and a cooling stage which are sequentially carried out, the heating rate of the heating stage is 5-15 DEG C / min, the temperature T of the heat preservation stage is 500-800 DEG C, and the temperature T of the cooling stage is 20-30 DEG C; the cooling rate of the cooling stage is 3-6 DEG C / min. The heat treatment process of the multi-layer composite coating is simple, and industrial production is easy to realize. The Zr-B-N / ZrO2 multilayer composite coating prepared by the invention has good hardness, toughness and wear resistance, and can significantly enhance the wear resistance and heat resistance of a matrix.

A preparation method for a gradient near-equiaxed crystal Cr coating on the surface of a zirconium alloy cladding is described. According to the present invention, a high-power impulse magnetron sputtering technology is adopted, and by self-modification of HiPIMS equipment, argon gas is introduced into a zirconium alloy cladding tube, the flow rate of the argon gas in the tube is controlled to regulate and control the tube wall temperature, parameters such as bias voltage, target-substrate distance, sputtering pressure and the like are comprehensively controlled to obtain a pure Cr near-equiaxed crystal coating on the surface of the zirconium alloy with three-layer gradient structure grains. The coating has good toughness and can improve the high-temperature oxidation resistance of the zirconium alloy cladding, significantly enhancing the ability of the cladding to resist serious accidents of the reactor.

The invention provides a TiCN composite coating and a preparation method thereof, and relates to the technical field of coating lubrication, the TiCN composite coating comprises three layers, the bottom layer is a Ti coating, the middle layer is a TiN coating, the surface layer is a TiCN coating, the TiCN composite coating comprises 20-30 at.% of N, 15-30 at.% of Ti and 40-65 at.% of C, the thickness is 710-1030 nm, a high-power pulse magnetron sputtering technology is adopted, Ti transition layers are sequentially deposited on the surface of a base body, and a TiCN transition layer is formed on the surface of the base body. The coating comprises a TiN coating and a TiCN coating. The TiCN coating has the advantages that the friction coefficient of the TiCN coating is improved, the hardness of the coating and the bonding strength of the coating and a matrix are improved, the frictional wear of a cutting tool is reduced, the working stability is improved, and the service life is prolonged.

The application provides a cutter coating and a preparation method and application thereof, and belongs to the technical field of numerical control cutters. After the cutter is etched and cleaned by a gas ion source method, a metal primer layer, a diamond-like layer, a bonding layer and an oxide heat insulation layer are sequentially deposited on the surface of the cutter by a high-power pulsed magnetron sputtering technology. The high-pulse magnetron sputtering technology is used for preparing the cutter coating, and the high-pulse magnetron sputtering technology has the characteristics of high atomic ionization rate and less liquid droplet agglomeration, so that the coating formed by film forming has few defects, high compactness and high hardness; after the oxide layer on the surface of the cutter is removed by the gas ion source, the metal primer layer is used as a transition layer, and the adhesion between the cutter and the coating can be improved. The oxide heat insulation layer is used for protecting the diamond-like layer from graphitization and failure in the milling process, and the high-temperature resistance is excellent.

The invention provides an amorphous-nanocrystalline composite structure high-entropy nitride film and a preparation method thereof, and relates to the technical field of film materials. A multi-arc ion plating technology and a high-power pulse magnetron sputtering technology are adopted, and the (Ti / TiN...) / (nc-HEAN / a-Si3N4) multi-layer nano composite structure high-entropy film is prepared by regulating and controlling the composition proportion and the structure. The nano-multilayer structure has the advantages that the crack deflects at an interface, the tip of the crack at the interface is passivated, and microcrack initiation and propagation caused by stress concentration are prevented. The nanocrystalline nc-HEAN high-entropy nitride is embedded in the amorphous a-Si3N4, so that a nanocrystalline / amorphous multiphase composite structure is formed. By means of a nano multilayer structure and a nanocrystalline / amorphous multiphase composite structure, the multilayer nano composite high-entropy nitride film with high hardness / high toughness is prepared so as to meet the high-performance application requirements of the modern industrial technology on cutters and grinding tools.

The invention discloses a high-hardness and low-friction multi-layer composite cutter coating and a preparation method thereof.The high-hardness and low-friction multi-layer composite cutter coating is prepared through a multi-arc ion plating and high-power pulse magnetron sputtering co-deposition technology and structurally comprises a Ti base layer, a TiN transition layer, a TiSiN hard supporting layer and a TiSi-DLC anti-friction layer, and the TiSiN hard supporting layer and the TiSi-DLC anti-friction layer are alternately deposited. According to the high-hardness and low-friction multi-layer composite cutter coating and the preparation method thereof, through the alternate deposition design of the coating, the internal stress between layers is effectively balanced, the binding force between the coating and a base body is improved, the surface modification requirement of an industrial cutting tool is met, meanwhile, the comprehensive mechanical property of the coating is further improved by changing the modulation period, and the service life of the coating is prolonged. The popularization value is realized.

The invention relates to a lamellar TiAlN hard wear-resistant coating and a preparation method thereof, and relates to the technical field of material surface modification. Comprising the following steps: adopting a Ti-Al target, carrying out reactive magnetron sputtering in a mixed atmosphere of Ar and N2, and obtaining a lamellar TiAlN hard wear-resistant coating on a substrate, the reaction magnetron sputtering comprises high-power pulse magnetron sputtering; the coating is prepared by adopting high-power pulse magnetron sputtering, the process is simple, the cost is low, the process is easy to control, and by changing the process parameters of the high-power pulse magnetron sputtering, the coating can have a lamellar structure, the hardness reaches 38 GPa, and the friction coefficient is low.

The invention provides a device and a method for preparing a high-purity astatine-211 composite target material in batches, and relates to the technical field of medical radioisotope production and thin targets. The device comprises a vacuum chamber; the sputtering cathode is arranged in the vacuum chamber and is connected with a high-power pulse magnetron sputtering power supply; the polyhedral sample support is arranged in the vacuum chamber, the polyhedral sample support and the vacuum chamber are rotatably arranged, the polyhedral sample support is arranged above the sputtering cathode, each side face of the polyhedral sample support is provided with a plurality of installation positions used for installing target substrates, and the polyhedral sample support is connected with a radio frequency bias power supply; and the rotary driving unit is used for driving the polyhedral sample holder to rotate. According to the astatine-211 target material and the preparation method thereof, on the premise of ensuring that the performance of the target material meets high-power beam irradiation and subsequent process requirements, the material utilization rate and the production efficiency are remarkably improved, and large-scale and economical preparation and application of the astatine-211 target material are promoted.

The invention relates to a semiconductor nitride film material and a preparation method thereof, and belongs to the technical field of semiconductor film materials. The semiconductor nitride thin film material comprises the following components: a compound with a chemical formula of Al < 1-x > Si < x > N < 1-y > O < y >, the compound is a hexagonal system, and the crystal space group is P63mc. The preparation method of the semiconductor nitride thin film material comprises the following steps: cleaning a substrate; according to the method, Al or Al and Si are used as a target material, the target material is sputtered in a high-power pulse magnetron sputtering mode in an argon and nitrogen mixed gas environment, and the semiconductor nitride thin film material is deposited on a substrate. The semiconductor nitride film material has excellent insulativity, thermal stability, wear resistance and hydrophobicity at the same time, and can meet application requirements in various complex environments.