Cutting tool comprising a multiple-ply pvd coating

A multi-layer coating and tool technology, which is applied in the direction of metal material coating process, coating, superimposed layer plating, etc., can solve problems such as insufficient adhesion, and achieve the effect of improving service life and long service life

Pending Publication Date: 2017-08-18
WALTER AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The object of the present invention is to provide a tool with a wear-resistant protective coating and a method for its production, which have the advantages of known layer systems, in particular of the layers deposited in the HIPIMS process, and at the same time overcome the problems known from the prior art. disadvantages, especially insufficient adhesion

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Substrate:

[0053] Hard metal: WC (fine grain) - 10 wt% Co

[0054] Vickers hardness: 2000HV

[0055] E modulus: 500Gpa

[0056] Bonding layer (multi-layer):

[0057] Process: Arc PVD

[0058] Target: (1) TiAl (50:59), 100mm diameter, reactor position 2

[0059] (2) TiAl (33:67), 100mm diameter, reactor position 5 (relative)

[0060] deposition parameters

[0061] Evaporator current: 140A

[0062] Center magnet polarity north

[0063] Total pressure: Gradient from 4PA to 10PA N 2 , after 3 minutes

[0064] Bias potential: DC, gradient from 40V to 60V over 3 minutes

[0065] Wear protection layer (single layer):

[0066] Process: HIPIMS

[0067] Target: TiAlN (33:67), 1800×200mm, reactor positions 3 and 6 (opposite)

[0068] deposition parameters

[0069] Average power: 12kW( / target)

[0070] Bias potential: DC, 100V

[0071] Peak power: 130kW

[0072] Peak current: 160A

[0073] Frequency: 110Hz

[0074] Pulse number: 60

[0075] The values ​​giv...

Embodiment 2

[0079] In this example, the same substrate as in Example 1 was used. For a multilayer tie layer, first, Ti with a thickness of about 50 nm 0.5 al 0.5 The N layer is deposited in a first step 1 at a bias potential of 70 V and then in a second step 2, consisting of about 6 Ti 0.5 al 0.5 N and Ti 0.33 al 0.67 A layer sequence consisting of TiAlN monolayers of N (monolayer thickness about 33 nm) with a thickness of about 0.2 μm was deposited at a bias potential of 100 V.

[0080] Bonding layer (multi-layer):

[0081] Process: Arc PVD

[0082] step 1

[0083] Target: TiAl (50:50), 100mm diameter, reactor position 2

[0084] deposition parameters

[0085] Evaporator current: 150A

[0086] Center magnet polarity north

[0087] Total pressure: 4,5Pa N 2

[0088] Bias potential: DC, 70V

[0089] step 2

[0090] Target: (1) TiAl(33:67), 100mm diameter, reactor position 5

[0091] (2) TiAl (50:50), 100mm diameter, reactor position 2 (opposite)

[0092] deposition p...

Embodiment 3

[0115] In this example, the same substrate as in Example 1 was used. As in Example 2, multiple tie layers were deposited.

[0116] For a multilayer wear protection layer, first deposit Ti with a thickness of about 10 nm in the first step 1 0.4 al 0.6 N layers, in a second step 2, are deposited with about 8 Ti 0.33 al 0.67 N and Ti 0.4 al 0.6 A TiAlN monolayer of N (monolayer thickness about 20 nm) and a layer sequence with a thickness of about 0.16 μm, and in a third step 3, deposits with about 24 layers with alternately different compositions Ti 0.33 al 0.67 N and Ti 0.4 al 0.6 Individual layers of TiAlN of N (individual layer thickness about 80 nm) and a layer sequence with a thickness of about 1.9 μm. Finally, a decorative layer with a thickness of 80 nm is applied in the HIPIMS process.

[0117] Wear protection layer (multi-layer):

[0118] Process: HIPIMS

[0119] step 1

[0120] Target: TiAlN (40:60), 1800×200mm, reactor position 6

[0121] deposition p...

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Abstract

The invention relates to a tool comprising a substrate that consists of hard metal, cermet, ceramic, steel or high speed steel, and a multiple-ply coating that is applied using the PVD method and has a total thickness of 1 (mu)m to 20 (mu)m, said multiple-ply coating comprising a connecting layer and a wear-resistant layer deposited directly onto said connecting layer, characterised in that the connecting layer has a multiple-ply design and is deposited by means of cathodic vacuum arc vapour deposition (arc PVD), plies of said connecting layer which lie one immediately over the other having different compositions, and each of the multiple plies of said connecting layer being formed from carbides, nitrides, oxides, carbonitrides, oxycarbides, carboxy nitrides of at least two different metals selected from Ti, V, Cr, Zr, Nb, Mo, Ru, Hf, Ta, W, Al, Si, Y, Li and B, and solid solutions thereof; and said wear-resistant layer having a single or multiple-ply design and being deposited by means of high-power impulse magnetron sputtering (HIPIMS), each of said one or more plies of the wear-resistant layer being formed from carbides, nitrides, oxides, carbonitrides, oxycarbides, carboxy nitrides of at least two different metals selected from Ti, V, Cr, Zr, Nb, Mo, Ru, Hf, Ta, W, Al, Si, Y, Li and B and solid solutions thereof.

Description

technical field [0001] The invention relates to a tool comprising a substrate of hard cermet, ceramic, steel or high speed steel and a multilayer coating applied thereto in a PVD process with a total thickness of 1 μm to 20 μm, wherein the multilayer coating Comprising a bonding layer deposited by cathodic vacuum arc evaporation (arc PVD) and an abrasion resistant protective layer deposited thereon by high power pulsed magnetron sputtering (HIPIMS). The invention also relates to a method for producing said tool. Background technique [0002] Cutting tools such as those used, for example, in chip removal metalworking usually consist of a base material (matrix) of hard metal, cermet, steel or high-speed steel, and have (Physical Vapor Deposition) A wear-resistant single-layer or multi-layer coating of a layer of metallic hard material deposited thereon. Within the PVD process, different variants are distinguished, such as cathodic sputtering (sputter deposition), cathodic va...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/04C23C14/32C23C14/35C23C14/06
CPCC23C14/06C23C14/325C23C14/3492C23C14/35C23C28/042C23C28/044C23C14/024C23C14/0641C23C14/3485C23C28/42C23C28/44C23C28/048
Inventor 法伊特·席尔
Owner WALTER AG
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