High-power pulse plasma reinforced composite magnetron sputtering deposition device and application method thereof
Patent Information
- Authority / Receiving Office
- CN Β· China
- Current Assignee / Owner
- GUANGDONG UNIV OF TECH
- Publication Date
- 2014-03-26
Smart Images
Figure 1 Figure 2
Abstract
Description
technical field
[0001] The invention relates to the technical field of thin film materials, in particular to a high-power pulsed plasma-enhanced composite magnetron sputtering deposition device and its application method. Background technique
[0002] With the development of modern manufacturing industry, the high-speed and high-efficiency cutting of difficult-to-machine materials has put forward higher and higher requirements for tool materials. Coated cutting tools are coated with several microns of high hardness, high wear resistance nitride, oxide or boride coating on the surface of high-strength cemented carbide or high-speed steel (HSS) substrate by vapor deposition method, so that it has High surface hardness, good wear resistance, stable chemical properties, heat resistance and oxidation resistance, small friction coefficient and low thermal conductivity, etc. When cutting, it can increase the tool life by more than 3~5 times compared with uncoated tools, and increas...