Multifunctional fully-automatic ion-plating machine for deposition of cutting tool coating and using method of multifunctional fully-automatic ion-plating machine

Abstract

The invention relates to the technical field of thin film materials, in particular to a multifunctional fully-automatic ion-plating machine for the deposition of a cutting tool coating. The machine comprises a vacuum chamber, bipolar pulse magnetron sputtering targets, a rectangular anode layer gas ion source, a high-power pulse magnetron sputtering source, a bias power supply, cathode arc sources, a workpiece rack and a support, wherein the bipolar pulse magnetron sputtering targets, the anode layer gas ion source, the high-power pulse magnetron sputtering source, the bias power supply and the cathode arc sources are controlled through five groups of independent switches respectively. Due to the adoption of the structure, pure metal, alloy and reaction film layers can be prepared, and multi-element and multilayer nanometer composite coatings and oxygen-containing coatings can also be prepared to meet the requirements of metal cutting tools with different shapes and sizes on high-speed machining.

Description

technical field [0001] The invention relates to the technical field of thin film materials, in particular to a multi-functional fully automatic ion coating machine for tool coating deposition and a usage method thereof. Background technique [0002] Surface coating technology has become a key technology in the field of cutting tools, which plays a vital role in the improvement of tool performance and the progress of processing technology. The deposition methods of tool surface coating mainly include chemical vapor deposition (CVD) and physical vapor deposition (PVD). The temperature of coating growth by CVD technology is relatively high, and this method pollutes the environment. In general, CVD technology requires a temperature exceeding 800°C to promote the growth of nanocrystalline grains, but excessively high deposition temperatures will cause deformation and cracking of the substrate, crystal grain growth, and reduced dimensional accuracy. PVD technology mainly include...

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Problems solved by technology

The deposition temperature of magnetron sputtering is low, and the surface of the prepared coating is smooth. Compared with the coating grown by CVD, it can prevent the propagation of transverse cracks more effectively and reduce the friction coefficient at the same time. However, the magnetron sputtering technology has gas ionization rate and target The problem of low utilization

Multi-arc ion plating can obtain an ionization rate close to 90% and a faster deposition rate, the incident particle energy is high, the quality of the deposited film and the bonding force of the film machine are good, and it can evaporate refractory materials with high melting point; but arc discharge will Splashing of micron-sized droplets leads to an increase in the roughness of the film layer

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