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Preparation method of matrix surface nano compound Me-Si-N superhard coating

A nano-composite, me-si-n technology, applied in the field of preparation of nano-composite Me-Si-N superhard coating on the surface of the substrate, can solve the problems of rough film surface, low film hardness and low metal ionization rate

Active Publication Date: 2013-11-06
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Magnetron sputtering technology has many advantages such as low-temperature deposition, smooth surface, and no particle defects, but most of the sputtered metals exist in the atomic state, and the metal ionization rate is low (~1%), resulting in low film hardness (less than 25GPa)
Arc ion plating technology has the advantages of high metal ionization rate and strong film-base binding force, but it is easy to produce a large number of macroscopic particles during the deposition process, resulting in rough surface of the film (roughness Ra greater than 30nm)
It can be seen that these two preparation technologies inevitably have some shortcomings, and become the key technical bottleneck in their further industrial application.

Method used

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  • Preparation method of matrix surface nano compound Me-Si-N superhard coating
  • Preparation method of matrix surface nano compound Me-Si-N superhard coating
  • Preparation method of matrix surface nano compound Me-Si-N superhard coating

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Experimental program
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Effect test

Embodiment 1

[0032] In this embodiment, the high-speed steel is used as the substrate, and the TiSiN nanocomposite coating is deposited on the surface of the substrate by using high-power pulsed magnetron sputtering technology. The specific preparation process is as follows.

[0033] (1) Put the cleaned and dried substrate into the vacuum chamber until the air pressure in the chamber is 3×10 -3 At Pa, argon gas was introduced into the vacuum chamber so that the chamber pressure was 8.0mTorr, the substrate pulse negative bias was -400V, and the substrate was etched for 20 minutes by glow discharge;

[0034] (2) After the etching is completed, Ar is introduced into the cavity, so that the cavity pressure is 2mTorr, the high-power pulse magnetron sputtering source is turned on, and the alloy target TiSi target is deposited by high-power pulse magnetron sputtering to deposit the TiSi transition layer , the substrate negative bias voltage is -300V, the sputtering DC current is 2A, the pulse con...

Embodiment 2

[0040] In this embodiment, the substrate is exactly the same as that in Embodiment 1, and a TiSiN nanocomposite coating is deposited on the surface of the substrate by high-power pulse magnetron sputtering technology, and the specific preparation process is as follows.

[0041] (1) Exactly the same as step (1) in Example 1;

[0042] (2) It is basically the same as step (2) in Example 1, the difference is: when using the high-power pulse magnetron sputtering alloy target TiSi target to deposit the TiSi transition layer, the negative bias of the substrate is -300V, and the sputtering The DC current is 1A, the pulse constant voltage is 450V, the pulse frequency is 40Hz, and the pulse width is 80 microseconds;

[0043] (3) It is basically the same as step (2) in Example 1, the difference is: use high-power pulse magnetron sputtering alloy target TiSi target to deposit TiSiN nanocomposite coating; substrate negative bias is -100V, sputtering The pulse constant current is 1A, the p...

Embodiment 3

[0048] In this embodiment, the high-speed steel is used as the substrate, and the CrSiN nano-composite coating is deposited on the surface of the substrate by high-power pulsed magnetron sputtering technology, and the specific process is as follows.

[0049] (1) Put the cleaned and dried substrate into the vacuum chamber until the air pressure in the chamber is 3×10 -3 At Pa, argon gas was introduced into the vacuum chamber so that the chamber pressure was 8.0mtorr, the substrate pulse negative bias was -400V, and the substrate was etched for 20 minutes by glow discharge;

[0050] (2) After the etching is completed, Ar is introduced into the cavity, so that the cavity pressure is 2mTorr, the high-power pulse magnetron sputtering source is turned on, and the CrSi transition layer is deposited by using the high-power pulse magnetron sputtering metal target CrSi target, The substrate negative bias is -300V, the sputtering pulse constant current is 2A, the pulse constant voltage i...

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Abstract

The invention provides a preparation method of matrix surface nano compound Me-Si-N (Me=Ti, Cr, Zr, W or the like) superhard coating. The preparation method utilizes the high-power pulse magnetron sputtering (HIPIMS) technology, through optimizing technology parameters, to prepare the Me-Si-N nano compound superhard coating by magnetron sputtering reactions. Compared to the prior art, the technology can obtain a superhard Me-Si-N nano compound coating with low surface roughness, and the preparation method is a preparation technology with a good application prospect.

Description

technical field [0001] The invention belongs to the technical field of substrate surface treatment, in particular to a method for preparing a nanocomposite Me-Si-N superhard coating on the surface of a substrate. Background technique [0002] With the advancement of modern industry, the cutting technology is developing rapidly, so cutting tools have higher and higher performance requirements to adapt to the increasing processing of difficult-to-cut materials and harsh processing conditions, such as high-speed cutting, dry cutting, etc. . [0003] Coating the surface of the cutting tool with a hard coating can not only realize the processing of difficult-to-cut materials, such as aerospace titanium alloys, high-silicon aluminum alloys, carbon fiber composite materials and other difficult-to-cut materials, but also improve the cutting accuracy and give full play to The film has the advantages of superhardness, toughness, wear resistance and self-lubrication, so it is consider...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/06
Inventor 汪爱英王振玉张栋柯培玲
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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