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Cr/CrN/CrAlSiN/CrAlTiSiN nano-multilayer gradient film and preparation method thereof

A nano-multi-layer and gradient film technology, which is applied in the coating, metal material coating process, ion implantation plating, etc., can solve the problems of complex device and process processing, coating performance difference, etc., to prolong the service life, Effect of improving wear resistance

Active Publication Date: 2019-02-01
深圳市奥美特纳米科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using the hollow cathode electron beam assisted pulse bias multi-arc ion plating technology, the device and process are very complicated, and the coating has local performance differences

Method used

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  • Cr/CrN/CrAlSiN/CrAlTiSiN nano-multilayer gradient film and preparation method thereof
  • Cr/CrN/CrAlSiN/CrAlTiSiN nano-multilayer gradient film and preparation method thereof

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preparation example Construction

[0035] The present invention also proposes a preparation method for the above-mentioned Cr / CrN / CrAlSiN / CrAlTiSiN nano-multilayer gradient film, which specifically includes the following steps:

[0036] (1) Grind and polish the substrate step by step with sandpaper. Then put the substrate into acetone and ultrasonically clean it for 10 minutes. After cleaning, the substrate is cleaned with alcohol, dried and put into the coating vacuum chamber.

[0037] (2) Deposit Cr / CrN / CrAlSiN / CrAlTiSiN nanometer multi-layer gradient film on the substrate processed by step (1) by a multi-arc ion coating machine located in the coating vacuum chamber and a plurality of targets, the plurality of targets being 3 A single Cr target with a purity of 99.9%, an Al-Ti-Si alloy target, an Al-Ti alloy target and an Al-Si alloy target. The specific process is as follows:

[0038] (2-1) Place all the targets evenly on both sides of the substrate, and the horizontal distance to the substrate is 360mm. T...

Embodiment 1

[0049] Example 1: The coefficient of friction is 0.01, there is more argon, and the sputtering time is long

[0050] (1) Grind and polish the substrate step by step with sandpaper. Then put the substrate into acetone and ultrasonically clean it for 10 minutes. After cleaning, the substrate is cleaned with alcohol, dried and put into the coating vacuum chamber.

[0051] (2) Deposit Cr / CrN / CrAlSiN / CrAlTiSiN nanometer multi-layer gradient film on the substrate processed by step (1) by a multi-arc ion coating machine located in the coating vacuum chamber and a plurality of targets, the plurality of targets being 3 A single Cr target with a purity of 99.9%, an Al-Ti-Si alloy target, an Al-Ti alloy target and an Al-Si alloy target. The specific process is as follows:

[0052] (2-1) Place each target at a distance of 360mm from the substrate, heat the vacuum coating chamber to 400°C, keep it for about 0.5h, and vacuum to ≤4.0×10 -3 Pa.

[0053] (2-2) Depositing Cr as the bottom l...

Embodiment 2

[0064] Embodiment 2: the binding force is greater than 35N

[0065] (1) Grind and polish the substrate step by step with sandpaper. Then put the substrate into acetone and ultrasonically clean it for 10 minutes. After cleaning, the substrate is cleaned with alcohol, dried and put into the coating vacuum chamber.

[0066] (2) Deposit Cr / CrN / CrAlSiN / CrAlTiSiN nanometer multi-layer gradient film on the substrate processed by step (1) by a multi-arc ion coating machine located in the coating vacuum chamber and a plurality of targets, the plurality of targets being 3 A single Cr target with a purity of 99.9%, an Al-Ti-Si alloy target, an Al-Ti alloy target and an Al-Si alloy target. The specific process is as follows:

[0067] (2-1) Place each target at a distance of 360mm from the substrate, heat the vacuum coating chamber to 350°C, keep it for about 0.5h, and vacuum to ≤4.0×10 -3 Pa.

[0068] (2-2) Depositing Cr as the bottom layer: open 3 Cr single-substance targets, and clo...

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Abstract

The invention discloses a Cr / CrN / CrAlSiN / CrAlTiSiN nano-multilayer gradient film and a preparation method thereof, and belongs to the technical field of nitriding films. The Cr / CrN / CrAlSiN / CrAlTiSiN nano-multilayer gradient film is composed of a Cr base layer, a CrN transition layer, a CrAlSiN transition layer and a CrAlTiSiN film layer which are sequentially deposited on a low-alloy steel or mould steel base body by adopting a multi-arc ion plating method; the total thickness of the nano-multilayer gradient film is 1.5 [mu]m-4.2[mu]m; total content ranges of Cr, Al, Ti and Si elements are correspondingly 30at%-34at%, 20at%-28at%, 10at%-14at% and 3at%-5at%; and film base adhesion force of the nano-multilayer gradient film is 35-45N, the friction coefficient is 0.01-0.02, and nano-hardnessis 35-40 Gpa. According to the preparation method, by changing the base body negative bias and deposition time of middle layers and converting targets, the nano-multilayer gradient film with high tenacity, low friction coefficient and good abrasion performance is obtained.

Description

technical field [0001] The invention belongs to the technical field of nitride films, in particular to a Cr / CrN / CrAlSiN / CrAlTiSiN nanometer multilayer gradient film and a preparation method thereof. Background technique [0002] Among the many coating preparation technologies, the coating prepared by multi-arc ion plating technology has the advantages of strong film-base binding force, high deposition rate, dense coating, strong binding force and easy adjustment of process parameters. It is the best choice for preparing hard film. important method. With the improvement of the efficiency of processing equipment, high-speed cutting has become the mainstream of machining. However, under extreme working conditions such as high speed and high load, hard film tools often fail due to severe friction and wear, and it is urgent to further improve the comprehensive mechanical properties and wear resistance of the hard film on the tool surface. [0003] CrN film has high hardness, go...

Claims

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Application Information

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IPC IPC(8): C23C14/32C23C14/16C23C14/06
CPCC23C14/0021C23C14/0641C23C14/16C23C14/325
Inventor 李杨何霞文张尚洲
Owner 深圳市奥美特纳米科技有限公司
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