Preparation method of CrAlN coating based on HIPIMS technology

Abstract

The invention discloses a preparation method of a CrAlN coating based on a HIPIMS technology. The high-power pulse magnetron sputtering technology (High Power Impulse Magnetron Sputtering, HIPIMS) is adopted, a method for co-sputtering by using a high-power pulse target (High pulse power cathode) and a bipolar pulse target (Bipolar pulsed sputtering cathodes) is used, and a (H+B) CrAlN coating is deposited; and meanwhile, an ARC CrAlN coating is deposited by adopting a fourth-generation arc ion plating technology (ARC evaporators). The performance of all aspects of the coating is analyzed through a scratch test, an X-ray diffraction, a microscopic morphology observation, an electrochemical corrosion test and the like, and the binding force of a (H+B) CrAlN coating film is stronger, and the maximum critical load can reach 62.4N; the surface crystal grains are smaller, the defects are few, and the section tissues are compact; meanwhile the high-temperature oxidation resistance of the CrAlN coating prepared by the (H+B) method is optimal; and the coating prepared by co-sputtering in the aspect of coating corrosion resistance is more corrosion-resistant than the coating prepared by electric arc ion plating.

Description

technical field [0001] The invention belongs to the technical field of coating materials, and in particular relates to a method for preparing a CrAlN coating based on HIPIMS technology. Background technique [0002] Since the 21st century, the application of high-performance materials and difficult-to-machine materials has become more and more extensive, and the requirements for the tools used to process these materials have also become higher and higher. The improvement of the quality and performance of cutting tools, molds and various mechanical parts has gradually become a The focus of attention in the machining industry. A more economical and effective way to improve the performance of cutting tools and molds is to modify their surfaces. In terms of the development history of cemented carbide coating materials, the research hotspots have developed from TiN in the 1980s, TiAlN in the 1990s, and CrN coatings in the early 21st century to CrAlN coatings in recent years. In...

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Problems solved by technology

In recent years, Bobzin et al. used HIPIMS technology to deposit TiAlSiN nanocomposite coatings, which nearly doubled the cutting life of coating tools. Hovsepian et al. combined HIPIMS technology with traditional DC magnetron sputtering technology to deposit CrAlYN / CrN nano Superlattice coating, the obtained coating structure is dense, which greatly improves the bonding force of the coating; in China, the traditional multi-arc ion plating and DC magnetron sputtering methods are mostly used to deposit hard alloy films, but the bonding between the film base The coating force is poor, and the coating is easy to peel off and fail. The arc ion plating technology has the advantages of high metal ionization rate and strong film-base binding force, but a large number of macroscopic particles are easy to accumulate during the deposition process, resulting in rough coating surface and coating The internal stress of the layer is high

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