279results about How to "Avoid excessive oxidation" patented technology

The present invention provides a method for removing charged defects from a material stack including a high k gate dielectric and a metal contact such that the final gate stack, which is useful in forming a pFET device, has a threshold voltage substantially within the silicon band gap and good carrier mobility. Specifically, the present invention provides a re-oxidation procedure that will restore the high k dielectric of a pFET device to its initial, low-defect state. It was unexpectedly determined that by exposing a material stack including a high k gate dielectric and a metal to dilute oxygen at low temperatures will substantially eliminate oxygen vacancies, resorting the device threshold to its proper value. Furthermore, it was determined that if dilute oxygen is used, it is possible to avoid undue oxidation of the underlying semiconductor substrate which would have a deleterious effect on the capacitance of the final metal-containing gate stack. The present invention also provides a semiconductor structure that includes at least one gate stack that has a threshold voltage within a control range and has good carrier mobility.

The invention discloses a continuous and quantitative granule filling mechanism and belongs to the field of material filling equipment. The continuous and quantitative granule filling mechanism is characterized in that a filling support is vertically and fixedly arranged in the middle of one side of a fixed support, a guide-tank bearing plate is horizontally and fixedly arranged on the fixed support on the lower side of the filling support, a rotary disk is vertically and rotatably connected with the filling support, two bearing barrels are symmetrically and radially arranged on two sides of the rotary disk respectively along the rotary disk, a positioning disk is coaxially arranged with the rotary disk, a rotating positioning lever is arranged on the fixed support on the upper side of thepositioning disk, two ends of one side of the guide-tank bearing plate are respectively an into-tank clamp groove and an out-of-tank clamp groove, an into-tank mechanism is horizontally arranged in the into-tank clamp groove, an out-of-tank mechanism is horizontally arranged in the out-of-tank clamp groove, and a tank pushing mechanism is horizontally arranged on the guide-tank bearing plate between the into-tank mechanism and the out-of-tank mechanism. The continuous and quantitative granule filling mechanism is reasonable in structure, granules can be filled continuously, efficiently and accurately, filling quantity of the granules can be adjusted as required, and needs of production and use are met.