Three-layer film structure coating layer and fabrication method thereof

A three-layer film and coating technology, which is applied in the coating, metal material coating process, ion implantation plating, etc., can solve the problem of large internal stress of the coating, poor film/substrate bonding force, coating and substrate bonding force Poor and other problems, to achieve good high temperature oxidation resistance, prevent diffusion adhesion wear, good high temperature thermal stability

Active Publication Date: 2018-12-25
SOUTH CHINA UNIV OF TECH
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Problems solved by technology

Depositing α-Al by Traditional Chemical Vapor Deposition (CVD) 2 o 3 , the deposition temperature is as high as 1000 ℃, only cemented carbide can be used as the substrate, and the coating has large internal stress, coarse grains, high brittleness, poor film / substrate bonding force, etc., and there are also problems such as exhaust emissions and environmental pollution.
The deposition of alumina coatings by physical vapor deposition (PVD) has the advantages of low temperature and environmental friendliness, but the deposited coatings contain a large amount of amorphous and γ-Al 2 o 3 Such metastable phases are difficult for practical engineering applications. At present, it is difficult to react and deposit single-phase α-Al on the surface of substrates such as high-speed steel and cemented carbide by PVD method. 2 o 3 In addition, high-speed steel has poor compatibility with oxide coatings, and the coating has poor bonding with the substrate. It often collapses directly from the substrate due to thermal stress during cooling; the tempering temperature of high-speed steel is below 600°C, and the higher temperature deposits α-Al 2 o 3 It will soften the matrix and make it difficult for the matrix to support high hardness α-Al 2 o 3 coating
Low-temperature deposition of α-Al directly on high-speed steel 2 o 3 The coating is difficult to achieve both in terms of the purity of the coating and the bonding force with the substrate, so that there is no α-Al deposited on the surface of high-speed steel. 2 o 3 coating reports

Method used

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  • Three-layer film structure coating layer and fabrication method thereof
  • Three-layer film structure coating layer and fabrication method thereof

Examples

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Embodiment 1

[0024] In this example, a three-layer film structure coating is deposited on the surface of high-speed steel:

[0025] (1) Choose W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, and after conventional quenching + 560°C (3 times) tempering, the hardness of the substrate is HRC60, grind and polish the coating surface, and place it in anhydrous alcohol solution Ultrasonic cleaning for 15 minutes to remove oil, dried and placed on the sample stage, adjust the distance between the sample and the target to 80mm;

[0026] (2) Select CrAl (50wt.%) and Al+α-Al 2 o 3 (15wt.%) as a sputtering target, respectively installed in the corresponding target stations of DC and RF magnetron sputtering;

[0027] (3) After pre-pumping the background vacuum to 10-20Pa, turn on the vacuum heating and baking system, set the baking temperature at 150°C, and then pump to the background vacuum of 6×10 -4 Pa, fill the vacuum chamber with Ar gas and adjust the throttle valve unti...

Embodiment 2

[0035] In this embodiment, a three-layer film structure coating is deposited on 3Cr2W8V hot work die steel:

[0036] (1) Choose 3Cr2W8V hot work die steel as the substrate, cut it into Φ10×5mm size, and temper it through conventional quenching + 600°C (3 times), the hardness of the substrate is HRC52, grind and polish the coating surface, and place it in anhydrous Ultrasonic cleaning in alcohol solution for 15 minutes to remove oil, after drying, place it on the sample stage, and adjust the distance between the sample and the target to 80mm;

[0037] (2) Select CrAl (40wt.%) and Al+α-Al 2 o 3 (12wt.%) as a sputtering target, respectively installed in the corresponding target stations of DC and RF magnetron sputtering;

[0038] (3) After pre-pumping the background vacuum to 10-20Pa, turn on the vacuum heating and baking system, set the baking temperature at 150°C, and then pump to the background vacuum of 6×10 -4 Pa, fill the vacuum chamber with Ar gas and adjust the throttl...

Embodiment 3

[0045] In this embodiment, a three-layer film structure coating is deposited on the surface of the GH2036 superalloy:

[0046] (1) Choose GH2036 high-temperature alloy as the substrate, cut it into Φ10×5mm size, and after solid solution +670℃ aging, the hardness of the substrate is HRC40, grind and polish the coating surface, and put it in anhydrous alcohol solution for ultrasonic cleaning for 15min Remove the oil, put it on the sample stage after drying, and adjust the distance between the sample and the target to 60mm;

[0047] (2) Select CrAl (35wt.%) and Al+α-Al 2 o 3 (10wt.%) as a sputtering target, respectively installed in the corresponding target stations of DC and RF magnetron sputtering;

[0048] (3) After pre-pumping the background vacuum to 10-20Pa, turn on the vacuum heating and baking system, set the baking temperature at 150°C, and then pump to the background vacuum of 6×10 -4 Pa, fill the vacuum chamber with Ar gas and adjust the throttle valve until the vac...

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Abstract

The invention belongs to the technical field of fabrication of a metal coating layer, and discloses a three-layer film structure coating layer and a fabrication method thereof. The three-layer film structure coating layer comprises a dual-phase Cr+Alpha-(Al, Cr)2O3 matrix pasting layer, a single phase Alpha-(Al, Cr)2O3 support layer and a single-phase nanometer Alpha-Al2O3 surface layer. The fabrication method comprises the steps of sequentially depositing the Cr+Alpha-(Al, Cr)2O3 matrix pasting layer and the Alpha-(Al, Cr)2O3 support layer by DC magnetron sputtering and by a CrAl alloy target; and obtaining the single-phase nanometer Alpha-Al2O3 surface layer by radio-frequency magnetron sputtering by an Al+Alpha-Al2O3 compost target. The surface working layer of the obtained coating layer is of a single-phase nanometer Alpha-Al2O3 structure, the coating layer is high in hardness, good in toughness, high in high-temperature thermal stability, low in friction coefficient during friction with a metal matrix and is firmly combined with a matrix such as high-speed steel, a hot work die steel and high-temperature alloy.

Description

technical field [0001] The invention belongs to the technical field of metal coating preparation, and in particular relates to a three-layer film structure coating and a preparation method thereof. Background technique [0002] Modern processing tends to be high-speed, precise and automatic, which puts forward higher performance requirements for processing turning tools, drills and milling cutters. The cutting edge temperature of high-speed machining tools can be as high as 700-1000°C. Traditional tools are coated with carbides (such as high-speed steel, hard alloys, etc.) and nitrides (titanium nitride, titanium carbonitride) to increase the hardness of the tool. , Even the sintered alumina knives are still mixed with 30% TiC to improve the toughness of the tool, and the carbon content is also very high. At high temperature, the diffusion activity of carbon and nitrogen is very high. The high temperature generated during high-speed machining makes carbon and nitrogen eleme...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/08
CPCC23C14/0036C23C14/0688C23C14/08C23C14/081C23C14/352
Inventor 邱万奇杨宇王耀辉程奕天焦东玲刘仲武钟喜春
Owner SOUTH CHINA UNIV OF TECH
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