Manufacturing method of full-color micro-led display device based on quantum dot light conversion layer
A technology of light conversion layer and display device, applied in semiconductor devices, electrical solid devices, electrical components, etc., can solve the problems of optical crosstalk, light source array and quantum dot film layers are closely adhered and difficult to separate, etc.
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[0025] Specific implementation mode 1. Combination Figure 1 to Figure 4 Describe this embodiment, the fabrication method of the full-color Micro-LED display device based on the quantum dot light conversion layer, the method is realized by the following steps:
[0026] Step S101: Provide a blue LED epitaxial wafer with a sapphire substrate 17, a Si-based CMOS passive drive backplane, and manufacture a monochrome Micro-LED display device;
[0027] combine figure 2 a, after the GaN-based LED epitaxial wafer 2 on the sapphire substrate 17 and the Si-based CMOS active driving backplane 1 are bonded at the wafer level, after the sapphire substrate 17 is lifted off by laser, a single pixel can be prepared by ICP etching and other technologies Single-color Micro-LED array driven by independent addressing3, figure 2 b is a cross-sectional view of a monochromatic Micro-LED array, figure 2 c is the top view of the monochromatic Micro-LED array.
[0028] The preparation of the mon...
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