A kind of preparation method of high emissivity ablation-resistant heat-insulating microsphere filler
A high-emissivity, microsphere filler technology, applied in ceramic products, other household utensils, household utensils, etc., can solve problems such as catastrophic damage, thermal shock failure, etc., and achieve the effect of large specific surface area
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Embodiment 1
[0031] The present embodiment realizes the above performance through the following technical solutions:
[0032] (1) Preparation and mixing of powder: Using isopropanol or ethanol as the grinding medium, the UHTC component, the high emissivity self-healing component and the sintering aid are prepared by mass ratio of 50:50:5 by high-energy ball milling. Ball milling and mixing, the ball milling time is 36h, and the ball milling rate is 2000r / min. After the ball milling is completed, the obtained slurry is dried for 24h to a constant weight, and the mixed powder is obtained by grinding and sieving. The primary particle size of the powder after ball milling should not be greater than 200nm. ;
[0033] (2) Preparation of precursor slurry: the powder obtained in step (1) is placed in an organic solvent with a mass ratio of 3:9, fully stirred and dispersed, and then placed in an ultrasonic pulverizer for ultrasonic dispersion for 30 minutes to eliminate nano-powder The physical ag...
Embodiment 2
[0050] The present invention realizes above-mentioned performance through following technical scheme:
[0051](1) Preparation and mixing of powder: Using isopropanol or ethanol as the grinding medium, the UHTCs component, the high emissivity self-healing component and the sintering aid were prepared by high-energy ball milling in a mass ratio of 20:80:10. Ball milling and mixing, the ball milling time is 24h, and the ball milling rate is 1000r / min. After the ball milling is completed, the obtained slurry is dried for 24h to a constant weight, and the mixed powder is obtained by grinding and sieving. The primary particle size of the powder after ball milling should not be greater than 200nm. ;
[0052] (2) Preparation of precursor slurry: the powder obtained in step (1) is placed in an organic solvent with a mass ratio of 1:7, fully stirred and dispersed, and then placed in an ultrasonic pulverizer for ultrasonic dispersion for 10 minutes to eliminate nano-powder The physical ...
Embodiment 3
[0066] The present invention realizes above-mentioned performance through following technical scheme:
[0067] (1) Preparation and mixing of powder: Using isopropanol or ethanol as the grinding medium, the UHTCs component, the high emissivity self-healing component and the sintering aid were prepared by high-energy ball milling in a mass ratio of 80:80:7 Ball milling and mixing, the ball milling time is 48h, and the ball milling rate is 4000r / min. After the ball milling is completed, the obtained slurry is dried for 24h to constant weight, and the mixed powder is obtained by grinding and sieving. The primary particle size of the powder after ball milling should not be greater than 200nm. ;
[0068] (2) Preparation of precursor slurry: the powder obtained in step (1) is placed in an organic solvent with a mass ratio of 6:7, fully stirred and dispersed, and then placed in an ultrasonic pulverizer for ultrasonic dispersion for 60 minutes to eliminate nano-powder The physical agg...
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