Detection method for two-dimensional layered material heterojunction stacking sequence, and spectral measurement system

A two-dimensional layered and sequential detection technology, applied in the field of materials, can solve problems such as high sample requirements and complex processes, and achieve the effect of simple detection methods and reduced requirements.

Active Publication Date: 2019-08-02
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
View PDF3 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method has high requirements for the sample, and the sample n...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Detection method for two-dimensional layered material heterojunction stacking sequence, and spectral measurement system
  • Detection method for two-dimensional layered material heterojunction stacking sequence, and spectral measurement system
  • Detection method for two-dimensional layered material heterojunction stacking sequence, and spectral measurement system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are the Some, but not all, embodiments are invented. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0020] With the excellent optoelectronic properties of two-dimensional layered materials attracting more and more attention, there is an increasing demand for the application of this nanoscale ultrathin material in integrated optoelectronic devices. However, the optoelectronic properties of a single layered material are limited by its own electronic structure. People te...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Embodiments of the invention provide a detection method for a two-dimensional layered material heterojunction stacking sequence, and a spectral measurement system. The method comprises the steps of acquiring secondary harmonic spectrums corresponding to a single-layer-shaped material region and a heterojunction region in a to-be-detected heterojunction at different rotation angles; extracting secondary harmonic signal peaks corresponding to the single-layer-shaped material region and the heterojunction region in the secondary harmonic spectrums at different rotation angles; acquiring a first polar coordinate distribution diagram and a second polar coordinate distribution diagram according to the secondary harmonic signal peaks; comparing the secondary harmonic signal intensities in the first polar coordinate distribution diagram and the second polar coordinate distribution diagram to obtain a stacking sequence detection result of the heterojunction. According to the method, a characteristic that secondary harmonic signals are zero when layered materials are stacked to form a central symmetric structure is used, and an optical means is adopted as a probe, so that the requirements for a heterojunction sample are reduced, and the sample does not need to be transferred to a target carrier net; the detection method is simple and convenient; and rapid nondestructive testing is realized.

Description

technical field [0001] Embodiments of the present invention relate to the field of material technology, and more specifically, to a detection method and a spectral measurement system for a heterojunction stacking sequence of a two-dimensional layered material. Background technique [0002] The preparation methods of two-dimensional layered materials include chemical vapor deposition and mechanical exfoliation. Usually, the sample size of mechanical exfoliation is about several microns, while the chemical vapor deposition method can synthesize samples with a size of hundreds of microns. Two single-layer layered materials are stacked together by the transfer method. However, since the crystal axis orientation of the material cannot be distinguished by the naked eye, the stacking sequence of the heterojunction is relatively random. Therefore, in order to determine the stacking sequence of the heterojunction, a high-definition transmission electron microscope is usually used in ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01N21/25
CPCG01N21/25
Inventor 时佳杜文娜刘新风
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap