Regeneration method of acidic etching solution
A technology for acidic etching liquid and acidic etching waste liquid, which is applied in the field of acidic etching waste liquid regeneration, can solve the problems of acidic etching liquid being easily destroyed, low economic benefit, and large energy consumption demand, so as to avoid the destruction of original components, economic High efficiency and simple operation
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Embodiment 1
[0043] A method for regenerating acidic etching waste liquid, comprising the steps of:
[0044] Oxidation steps: the concentration of copper ions in the acidic etching waste liquid is 120g / L, adding oxidant oxygen to the acidic etching waste liquid to convert the cuprous ions in the acidic etching waste liquid into copper ions; after adding the oxidant, use the ORP online detector Detect ORP value, control ORP value 550-580mv;
[0045] The step of decompression evaporation: the oxidized acidic etching waste liquid is subjected to decompression evaporation, the conditions of the decompression evaporation are: the pressure is controlled at 0.01MPa, and the evaporation temperature is controlled at 50°C; the acidic etching waste liquid is urged to evaporate water to form Copper chloride crystals;
[0046] Steps to continue evaporating the residual temperature: When the waste water forms crystals, stop heating and let the residual temperature continue to evaporate. After the tempe...
Embodiment 2
[0049] A method for regenerating acidic etching waste liquid, comprising the steps of:
[0050] Oxidation steps: the concentration of copper ions in the acidic etching waste liquid is 140g / L. Add the oxidant sodium chlorate to the acidic etching waste liquid to convert the cuprous ions in the acidic etching waste liquid into copper ions; after adding the oxidant, use the ORP online The detector detects the ORP value and controls the ORP value to 585-735mv;
[0051] The step of decompression evaporation: the oxidized acidic etching waste liquid is subjected to decompression evaporation, the conditions of the decompression evaporation are: the pressure is controlled at 0.02MPa, and the evaporation temperature is controlled at 60°C; the acidic etching waste liquid is urged to evaporate water to form Copper chloride crystals;
[0052] Steps for continuing to evaporate the residual temperature: When the waste water forms crystals, stop heating and let the residual temperature cont...
Embodiment 3
[0055] A method for regenerating acidic etching waste liquid, comprising the steps of:
[0056] Oxidation step: the copper ion concentration of acidic etching waste liquid is 160g / L, adds oxidizing agent in acidic etching waste liquid, and described oxidizing agent is a kind of in oxygen, sodium chlorate, ozone, the cuprous in acidic etching waste liquid The ions are converted into copper ions; after adding the oxidant, use the ORP online detector to detect the ORP value, and control the ORP value to 590-784mv;
[0057] The step of decompression evaporation: the oxidized acidic etching waste liquid is subjected to decompression evaporation, the conditions of the decompression evaporation are: the pressure is controlled at 0.03MPa, and the evaporation temperature is controlled at 70°C; the acidic etching waste liquid is urged to evaporate water to form Copper chloride crystals;
[0058] Steps for continuing to evaporate the residual temperature: When the waste water forms crys...
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