Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask device

A mask and mask plate technology, which is applied in the direction of vacuum evaporation plating, coating, and electric solid devices, can solve the problems of mask plate wrinkles, affect evaporation yield, and mask plate is easy to sag, etc. Wrinkle and sagging amount, effect of deposition yield improvement

Active Publication Date: 2021-02-26
BOE TECH GRP CO LTD +1
View PDF18 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of stretching the net, since the mask plate needs to be stretched by clamping and clamping, the stress on the clamped part is inconsistent with that of the unreinforced part, so the mask plate is prone to wrinkles; in addition, the mask plate is under the action of its own gravity The bottom is easy to sag, which will seriously affect the evaporation yield

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask device
  • Mask device
  • Mask device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0075] Such as figure 1As shown, the shrink sheet can be arranged on the side of the second surface 21 of the mask 2 facing away from the first surface 20 , that is to say, the shrink sheet can be connected to the second surface 21 of the mask 2 . However, since the aforementioned second surface 21 can be a glass contact surface, when the shrink sheet is connected to the second surface 21 of the mask plate 2, the thickness of the shrink sheet may cause the mask plate 2 and the evaporated screen to be separated. The distance between the bodies increases, which may cause shadows during evaporation. In order to solve this problem, the working area of ​​the mask plate 2 in this embodiment not only includes the aforementioned evaporation area, but also includes A plurality of grooved areas arranged at intervals in the first direction X, the grooved areas include image 3 The area defined by the dotted line C and the dotted line D and the area defined by the dotted line E and the d...

Embodiment 2

[0085] Compared with Embodiment 1, the main differences of this embodiment are as follows: figure 1 As shown, one end of the second shrink sheet 3 b is installed in the installation groove 210 of one of the adjacent mask plates 2 , and the other end is installed in the installation groove 210 of the other of the adjacent mask plates 2 . That is to say, adjacent mask plates 2 can share the same shrink sheet. Other structures may be the same as those in Embodiment 1, and will not be repeated here.

Embodiment 3

[0087] Compared with Embodiment 1 and Embodiment 2, the main differences of this embodiment are: Figure 15 As shown, the shrink sheet is disposed on the side of the first surface 20 away from the second surface 21 ; that is, the shrink sheet can be connected to the first surface 20 of the mask plate 2 . However, when assembling the mask device, the frame structure is assembled first, and then the first surface 20 of the mask plate 2 is connected to the frame structure, such as Figure 13 shown; therefore, in order to facilitate the connection of the shrink sheet with the mask plate 2 and the frame body 10, as Figure 17 As shown, the vertical shielding sheet 12 in this embodiment can be provided with an assembly opening 120; Figure 13 and Figure 14 As shown, the assembly opening 120 can expose the parts on the frame body 10 and the mask plate 2 that need to be connected with the shrink sheet, so that the shrink sheet can be connected with the mask plate 2 and the frame bo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present application relates to the field of display technology, in particular, to a mask device, which includes a frame structure, at least one mask plate and at least one shrink sheet, the mask plate is connected to the frame structure; the shrink sheet is connected to The mask plate is connected to the frame structure, and / or the shrink sheet is adjacent to the mask plate; wherein, the shrink sheet can apply a pulling force to the mask plate during the shrinking process, thereby reducing The amount of wrinkles and sags of the mask plate to improve the evaporation yield.

Description

technical field [0001] The present application relates to the field of display technology, in particular, to a mask device. Background technique [0002] Currently, OLEDs (Organic Light-Emitting Diodes, Organic Light-Emitting Diodes) are usually deposited by a vacuum evaporation process, and a mask device needs to be used during the process. The mask device includes a frame structure and a mask plate, and the mask plate needs to be tensioned by a netting device before being fixed on the frame structure. However, in the process of stretching the net, since the mask plate needs to be stretched by clamping and clamping, the stress on the clamped part is inconsistent with that of the unreinforced part, so the mask plate is prone to wrinkles; in addition, the mask plate is under the action of its own gravity The bottom is easy to sag, which will seriously affect the evaporation yield. [0003] It should be noted that the information disclosed in the above background technology ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/12C23C14/24H01L51/56
CPCC23C14/042C23C14/24C23C14/12H10K71/164H10K71/166
Inventor 曾佳陈奎宋育准曹东旭
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products