Metal film-coupled nano-island surface-enhanced Raman scattering substrate and preparation method thereof
A surface-enhanced Raman and metal film technology, applied in Raman scattering, metal material coating technology, sputtering plating, etc. ability, improve collection efficiency, and enhance the effect of Raman scattered light
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Embodiment 1
[0030] The invention provides a surface-enhanced Raman scattering substrate coupled with a silver film nano-island, which includes a substrate substrate, and the substrate substrate is successively composed of an aluminum thin film layer, a silver thin film layer, an aluminum oxide layer and a metallic silver nano-island layer, and the substrate substrate is a silicon dioxide substrate.
[0031] The preparation method of the substrate provided in this embodiment comprises the following steps:
[0032] (1) By the method of magnetron sputtering deposition, aluminum thin film layer and silver thin film layer are deposited successively from bottom to top on the silicon dioxide substrate that thickness is 300nm, the thickness of the deposited aluminum thin film layer is 15nm, the silver thin film layer of deposition The thickness is 150nm, and the substrate I is obtained;
[0033] (2) Place the substrate I obtained in step (1) in an ultra-low oxygen environment for annealing treat...
Embodiment 2
[0040] The invention provides a surface-enhanced Raman scattering substrate coupled with copper film nano-islands, including a substrate substrate, on which there are successively an aluminum film layer, a copper film layer, an aluminum oxide layer and metallic silver nano-islands from bottom to top. layer, the substrate substrate is a silicon dioxide substrate.
[0041] The preparation method of the substrate provided in this embodiment comprises the following steps:
[0042] (1) By the method of magnetron sputtering deposition, aluminum thin film layer and copper thin film layer are deposited successively from bottom to top on the silicon dioxide substrate that thickness is 500nm, the thickness of the deposited aluminum thin film layer is 20nm, the copper thin film layer of deposition The thickness is 100nm, and the substrate I is obtained;
[0043] (2) Substrate I obtained in step (1) is placed in an ultra-low oxygen environment for annealing treatment, so that part of the...
Embodiment 3
[0049] The invention provides a surface-enhanced Raman scattering substrate coupled with a silver film nano-island, which includes a substrate substrate, and the substrate substrate is successively composed of an aluminum thin film layer, a silver thin film layer, an aluminum oxide layer and a metallic silver nano-island layer, the substrate substrate is a silicon dioxide substrate.
[0050] The preparation method of the substrate provided in this embodiment comprises the following steps:
[0051] (1) By the method of magnetron sputtering deposition, aluminum thin film layer and silver thin film layer are deposited successively from bottom to top on the silicon dioxide substrate that thickness is 300nm, the thickness of the deposited aluminum thin film layer is 15nm, the silver thin film layer of deposition The thickness is 100nm, and the substrate I is obtained;
[0052] (2) Place the substrate I obtained in step (1) under an ultra-low oxygen environment for annealing treatm...
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Abstract
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