Grating ruler cleaning device and method, photolithography machine

Abstract

The invention provides a grating scale cleaning device and method, and a photolithography machine. The grating scale cleaning device includes a main body and a first pipeline and a second pipeline passing through the main body. During cleaning, the sweeping gas flows from the The first exhaust end of the first pipeline reaches the surface of the grating scale along the first direction, and then the particles on the surface of the grating scale are taken away from the second inlet end of the second pipeline along the opposite direction of the second direction. The grating scale cleaning method provided by the present invention adopts the above-mentioned grating scale cleaning device, and the photolithography machine includes the above-mentioned grating scale cleaning device. The grating scale cleaning device and method provided by the present invention, and the lithography machine clean the grating scale by blowing off particles with sweeping gas. pollution on the surface of the ruler; it can meet the requirements of different lithography machines; there is no need to drag the entire workpiece table out of the main body of the lithography machine, and the cleaning method is simple.

Description

technical field [0001] The invention relates to the field of semiconductor equipment, in particular to a grating scale cleaning device and method, and a photolithography machine. Background technique [0002] Photolithography is the process of patterning the surface of a semiconductor substrate (or substrate) using photosensitive photoresist materials and controlled exposure. Lithography is often considered the most critical step in chip manufacturing, requiring sufficient lithography precision to combine with other processes to achieve high yields. [0003] Lithography is often implemented with a lithography machine, and an optical encoder system is widely used in the lithography machine to monitor the movement of a workpiece stage such as a substrate platform or a reticle platform, so as to achieve precise movement control. The grating plate is a part of the optical encoder system, which is used to attach to the substrate platform or the mask plate platform, and cooperate...

AI Technical Summary

Problems solved by technology

[0005] There are currently two methods for cleaning the surface of the grating scale. One method is to drag the entire workpiece table out of the main body of the lithography machine, and use solvent and cloth for manual cleaning. This method has a better cleaning effect, but the disadvantage is that it is easy to cause damage to the surface of the grating scale Scratches; and the operation cycle is longer, generally takes 1 to 3 days

Another method is to use liquid immersion water to automatically rinse the surface of the grating scale. This method has high cleaning efficiency, but the disadvantage is that the scope of application is limited, and it is only suitable for liquid immersion lithography machines, not for non-liquid immersion lithography. machine; the cleaning range is limited, and the entire surface of the grating scale cannot be cleaned; and the liquid immersion water may contain a small amount of photoresist, which will pollute the surface of the grating scale

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