Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Moisturizing facial mask containing saussurea involucrata extract and preparation method thereof

A lotus extract and extract technology, applied in the field of moisturizing mask containing lotus extract and its preparation, can solve the problems of facial skin allergy, heavy metal exceeding the standard, etc., achieve less skin irritation, promote skin repair, and relieve dryness skin effect

Inactive Publication Date: 2019-09-17
西双版纳宝翠香莲生物科技有限公司
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are many facial mask products on the market, including whitening facial mask, moisturizing facial mask, moisturizing facial mask, etc. However, many facial masks contain a large amount of chemical substances, causing side effects such as facial skin allergies, and more serious cases involving excessive heavy metals

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing facial mask containing saussurea involucrata extract and preparation method thereof
  • Moisturizing facial mask containing saussurea involucrata extract and preparation method thereof
  • Moisturizing facial mask containing saussurea involucrata extract and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A moisturizing mask containing lotus extract, which is composed of mask essence and mask base, and the mask essence is composed of the following components in weight percentage: 2% of lotus extract, 3% of macroalgae extract, salmon collagen 0.5%, Chinese medicine extract 1%, vitamin E 0.3%, giant salamander polypeptide 0.08%, green tea amide 0.5%, ceramide 0.03%, hyaluronic acid 0.1%, propylene glycol 2%, methyl paraben 4%, glycerin 8%, deionized water 78.49%; wherein the traditional Chinese medicine extract comprises the following raw materials by weight percentage: chrysanthemum extract 25%, poria cocos extract 30%, peppermint extract 25%, lily extract 20%.

[0030] A preparation method of a moisturizing facial mask containing saponin extract, comprising the following steps:

[0031] (1), hyaluronic acid, propylene glycol, methyl p-hydroxybenzoate, and glycerin are stirred evenly by weight percentage to obtain mixed solution A;

[0032] (2), mix lotus extract, macroa...

Embodiment 2

[0036] A moisturizing mask containing lotus extract, which is composed of mask essence and mask base, and the mask essence is composed of the following components in percentage by weight: 4% of lotus extract, 2% of macroalgae extract, salmon collagen 1.5%, Chinese medicine extract 0.3%, vitamin E 0.1%, giant salamander polypeptide 0.1%, green tea amide 0.05%, ceramide 0.05%, hyaluronic acid 0.03%, propylene glycol 6%, methyl paraben 3%, glycerin 5%, deionized water 77.87%; wherein the traditional Chinese medicine extract comprises the following raw materials by weight percentage: chrysanthemum extract 35%, poria cocos extract 30%, peppermint extract 20%, lily extract 15%.

[0037] A preparation method of a moisturizing facial mask containing saponin extract, comprising the following steps:

[0038] (1), stir hyaluronic acid, propylene glycol, methyl p-hydroxybenzoate, and glycerin evenly by weight percentage to obtain mixed solution A;

[0039] (2), mix lotus extract, macroal...

Embodiment 3

[0043] A moisturizing mask containing lotus extract, which is composed of mask essence and mask base, and the mask essence is composed of the following components in weight percentage: 3% of lotus extract, 2% of macroalgae extract, salmon collagen 1%, Chinese medicine extract 0.6%, vitamin E 0.5%, giant salamander polypeptide 0.2%, green tea amide 0.1%, ceramide 0.09%, hyaluronic acid 0.06%, propylene glycol 4%, methyl paraben 5%, glycerin 6%, deionized water 77.45%; wherein the traditional Chinese medicine extract comprises the following raw materials by weight percentage: chrysanthemum extract 40%, poria cocos extract 25%, peppermint extract 25%, lily extract 10%.

[0044] A preparation method of a moisturizing facial mask containing saponin extract, comprising the following steps:

[0045] (1), stir hyaluronic acid, propylene glycol, methyl p-hydroxybenzoate, and glycerin evenly by weight percentage to obtain mixed solution A;

[0046] (2), mix lotus extract, macroalgae extr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of daily chemicals and discloses a moisturizing facial mask containing a saussurea involucrata extract. The moisturizing facial mask consists of facial mask essence and a facial mask substrate, wherein the facial mask essence is prepared from, by weight, 2-4% of a saussurea involucrata extract, 1-3% of a macroalgae extract, 0.5%-2% of salmon collagen, 0.3-1% of traditional Chinese medicine extracting solution, 0.1-1% of vitamin E, 0.08-0.8% of giant salamander polypeptide, 0.05%-0.5% of green tea amide, 0.03-0.3% of ceramide, 0.03-0.1% of hyaluronic acid, 2-6% of propylene glycol, 3-8% of methylparaben, 4-8% of glycerol and the balance deionized water. The moisturizing facial mask does not contain spices, does not irritate the skin, makes the effective ingredients of the moisturizing facial mask quickly permeated to achieve a good moisturizing effect, can prevent skin allergy caused by pollen allergy, and has the effects of resisting inflammation and allergy, relieving itching and allergy and promoting skin repair.

Description

technical field [0001] The invention belongs to the technical field of daily chemicals, and in particular relates to a moisturizing facial mask containing a lotus extract and a preparation method thereof. Background technique [0002] Perfume lotus flower extract is rich in protein, carbohydrates, vitamins, active polypeptides, minerals, cellulose and other nutrients needed by the human body. At the same time, the plant placenta contained in perfume lotus flower plays a key role in balancing the human endocrine system , can provide nutrients and minerals for the skin, long-term use can improve dull skin, make the skin smooth and shiny, and play a significant role in anti-oxidation, anti-wrinkle, moisturizing, whitening, lightening spots, and brightening the skin. [0003] The lack of water in the skin will cause many other skin problems. Skin moisturizing is an important step in skin care. In daily care, facial mask is a skin care product that is very popular among consumers...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/9789A61K8/9711A61K8/65A61K8/64A61K8/9728A61K8/9794A61Q19/00A61Q19/02A61P17/00A61P17/04
CPCA61K8/64A61K8/65A61K8/9711A61K8/9728A61K8/9789A61K8/9794A61P17/00A61P17/04A61Q19/00A61Q19/005A61Q19/02
Inventor 张文丽张文宏
Owner 西双版纳宝翠香莲生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com