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Uranium abundance monitoring system improving monitoring accuracy

A monitoring system and accuracy technology, applied in the field of nuclear chemical industry, can solve the problems that affect the accuracy of uranium abundance, the background is not fixed, and rise, so as to improve the accuracy of uranium abundance, facilitate disassembly and maintenance, and ensure the effect of cleanliness

Inactive Publication Date: 2019-09-20
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Deposited in the solid U on the inner surface of the container 235 U will also emit characteristic gamma rays to form counts, which is the background S of the uranium abundance online monitor B , when measuring UF 6 It needs to be deducted when the gas uranium abundance is measured. With the long-term operation of the monitor, the UF deposited on the inner surface of the container 6 The solids will continue to increase, which will cause the background to be unstable and will gradually increase. Using the existing method of measuring the background, the measured uranium abundance value has a certain deviation due to the background growth rate is fast and not fixed, so Affect the accuracy of the uranium abundance online monitor to measure the uranium abundance

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  • Uranium abundance monitoring system improving monitoring accuracy
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Embodiment Construction

[0031] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0032] Such as figure 1 As shown, the present invention discloses a uranium abundance monitoring system that improves monitoring accuracy, including a uranium abundance monitor 1 and a filter device 2; The instrument 1 is connected in parallel with the pressure booster 4, and the filter device 2 is arranged upstream of the uranium abundance monitor 1. The uranium abundance monitoring system for improving monitoring accuracy of the present invention can filter out UF 6 Large particles of impurities in the gas, thereby reducing the adsorption on the inner wall of the container, slowing down the growth rate of the background, and achieving the purpose of improving the accuracy of measuring the uranium abundance of the gas.

[0033] In view of the demand for continuous monitoring, the structure of the filter device 2 is as follows: figure 2 As shown, ...

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Abstract

The invention discloses a uranium abundance monitoring system improving the monitoring accuracy. The monitoring system comprises a uranium abundance monitor and a filtering device; a main technical pipe is provided with a pressure supplementing device in parallel connection with the uranium abundance monitor, and the filtering device is arranged in the upstream of the uranium abundance monitor. The system has the following steps that the gas filtering device is mounted in the upstream of the uranium abundance monitor to remove large-particle impurities from UF6 gas by filtering and reduce adsorption in the inner wall of a container, the background growth speed is slow, and the gas uranium abundance precision is improved.

Description

technical field [0001] The invention relates to the field of nuclear chemical industry, in particular to a uranium abundance monitoring system for improving monitoring accuracy. Background technique [0002] At present, the uranium abundance on-line monitor has been practically applied in domestic uranium centrifugal enrichment plants for on-line measurement of UF 6 The uranium abundance of the gas has the functions of remote monitoring and unattended operation. [0003] Measurement of UF in process pipeline of enrichment plant by online uranium abundance monitor 6 product 235 The basic principle of U abundance is to use the NaI(T1) detector to measure the gaseous UF in the container 6 middle 235 The characteristic gamma rays emitted by U are measured to obtain 235 The amount of U, use the sensor to measure the temperature and pressure of the gas, and then get UF according to the ideal gas state equation 6 The total amount of U in the gas, their ratio is 235 The abund...

Claims

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Application Information

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IPC IPC(8): G01N23/20008G01M3/02B01D46/00
CPCG01N23/20008G01M3/02B01D46/00B01D46/56
Inventor 刘国荣梁庆雷李井怀鹿捷
Owner CHINA INSTITUTE OF ATOMIC ENERGY