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Substrate structure and its manufacturing method and conductive bump

A conductive bump and substrate technology, applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of copper pillars 14 falling, over-etching, and easy residual copper material 12a, etc., and achieve the effect of avoiding the falling of conductive pillars

Active Publication Date: 2021-04-30
SILICONWARE PRECISION IND CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, in the existing manufacturing method of the conductive bump 1a, during the process of chemically etching the copper layer 12, the copper material 12a (such as Figure 1C shown), so when the chemical etching is continued to remove the copper material 12a, it is easy to cause over etching of the copper layer 12 and the titanium layer 11 at the bottom of the copper pillar 14, causing the copper pillar 14' to fall off (peeling) ,like Figure 1D shown

Method used

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  • Substrate structure and its manufacturing method and conductive bump
  • Substrate structure and its manufacturing method and conductive bump
  • Substrate structure and its manufacturing method and conductive bump

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Embodiment Construction

[0042] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

[0043] It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. Limiting conditions, so there is no technical substantive meaning, any modification of structure, change of proportional relationship or adjustment of size, without affecting the effect and purpose of the present invention, should still fall within the scope of the present invention. The disclosed technical content must be within the scope covered. At the same time, terms such as "above", "first", "second" and ...

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Abstract

The invention relates to a substrate structure, a manufacturing method thereof and a conductive bump. A manufacturing method of a substrate structure, forming a metal layer and a plurality of conductive pillars on a substrate body, and then removing the metal layer not covered by the conductive pillars by etching with an electrolytic solution, so that no residue remains between the two conductive pillars. metal material, without increasing the etching time to remove the residual metal material, avoiding the problem of excessive etching at the bottom of the conductive pillar.

Description

technical field [0001] The invention relates to a substrate structure, in particular to a substrate structure with conductive bumps and a manufacturing method thereof. Background technique [0002] With the vigorous development of the electronic industry, electronic products are gradually moving towards the trend of multi-function and high performance. At present, semiconductor chip packaging forms include wire bonding (Wire Bonding) packaging or flip chip (Flip Chip) packaging. Through conductive bumps instead of ordinary bonding wires, the conductive bumps provide electrical input / output (I / O) and mechanical connections between the semiconductor chip and the packaging substrate. This packaging structure can greatly reduce the volume , At the same time, it also subtracts the design of the existing bonding wires, which can reduce the impedance and improve the electrical properties, so as to avoid the degradation of the signal during the transmission process, so it has becom...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/488H01L21/48
CPCH01L24/11H01L24/13H01L2224/11H01L2224/13599
Inventor 万国辉沈绍平
Owner SILICONWARE PRECISION IND CO LTD