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Temperature control device, temperature control method and dry etching machine

A temperature control device, dry etching technology, applied in the direction of temperature control, control/regulation system, non-electric variable control, etc. The effect of optimizing and stabilizing the etch process, reducing the risk of etch stops

Active Publication Date: 2021-04-02
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

These temperature data failed to truly and accurately reflect the temperature in the process

Method used

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  • Temperature control device, temperature control method and dry etching machine
  • Temperature control device, temperature control method and dry etching machine

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Embodiment Construction

[0020] The specific implementation of a temperature control device, temperature control method and dry etching machine of the present invention is given below in conjunction with the accompanying drawings, but it should be pointed out that the specific implementation is not intended to limit the specific implementation of the present invention. All similar structures and similar changes using the present invention should be included in the protection scope of the present invention. The following description of the embodiments refers to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the embodiments, such as "up", "down", "front", "rear", "left", "right", "top", "bottom", etc., are only for reference to the accompanying drawings direction. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

[0021] In ...

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Abstract

The invention discloses a temperature control device, a temperature control method and a dry etching machine using the temperature control device. The temperature control device comprises a sensing unit, a calculation unit, a setting unit and a control unit. According to the dry etching machine, temperature data of all parts of the dry etching machine are detected and collected, and a process temperature value is obtained through multiple ports, so that the real-time actual condition of a chamber of the dry etching machine can be accurately reflected, each process can be optimized convenientlyby an engineer, and the risk of etching stop caused by temperature can be lowered.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a temperature control device, a temperature control method and a dry etching machine. Background technique [0002] With the development of semiconductor technology, the requirements for semiconductor manufacturing are getting higher and higher, and dry etching technology plays an indispensable role in it. However, due to its own characteristics, the dry etching process will undergo endothermic or exothermic reactions during the process. If the process continues, the temperature of the process chamber will continue to rise or fall; changes in temperature will have a great impact on process production , especially those that are sensitive to process temperature. [0003] At present, it mainly relies on the sensors in the machine wall and the sensors at the inlet and outlet of the temperature cooler for temperature monitoring, and then controls the temperature of the chambe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05D23/20H01J37/32
CPCG05D23/20H01J37/32522H01J2237/334
Inventor 董磊磊
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD