bi 2 o 2 Se interface modified perovskite solar cell and preparation method
A technology for solar cells and interface modification, applied in semiconductor/solid-state device manufacturing, circuits, photovoltaic power generation, etc., can solve the problems of poor stability, decomposition of perovskite films, low electron transfer rate, etc., to improve stability and charge separation, high conductivity effect
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Embodiment 1
[0030] A Bi of this embodiment 2 o 2 Se interface modified SnO 2 The perovskite solar cell device structure of the electron transport layer is: ITO / SnO 2 / Bi 2 o 2 Se / MAPbI 3 / Spiro-OMeTAD / MoO x / Ag. The specific preparation process is as follows:
[0031] (1) The ITO substrate was ultrasonically cleaned with detergent, deionized water, acetone, absolute ethanol, and isopropanol in sequence for 20 minutes, and then dried in a vacuum oven at 80°C. The surface of the cleaned and dried ITO substrate is subjected to plasma surface treatment for 10 minutes. This treatment method utilizes the strong oxidizing properties of ozone generated under microwaves to clean the residual organic matter on the ITO surface, while improving the work function of the ITO surface.
[0032] (2) Spin-coat electron transport layer SnO on the ITO surface treated in step (1) 2 , the interface modification layer is Bi 2 o 2 Se. SnO 2 SnO purchased for alfa 2 Aqueous colloid, diluted 5 times ...
Embodiment 2
[0042] A Bi of this embodiment 2 o 2 Se interface modified SnO 2 The perovskite solar cell device structure of the electron transport layer is: ITO / SnO 2 / Bi 2 o 2 Se / MAPbI 3 / Spiro-OMeTAD / MoO x / Ag. The specific preparation process is as follows:
[0043] (1) The ITO substrate was ultrasonically cleaned with detergent, deionized water, acetone, absolute ethanol, and isopropanol in sequence for 20 minutes, and then dried in a vacuum oven at 80°C. The surface of the cleaned and dried ITO substrate is subjected to plasma surface treatment for 10 minutes. This treatment method utilizes the strong oxidizing properties of ozone generated under microwaves to clean the residual organic matter on the ITO surface, while improving the work function of the ITO surface.
[0044] (2) Spin-coat electron transport layer SnO on the ITO surface treated in step (1) 2 , the interface modification layer is Bi 2 o 2 Se. SnO 2 SnO purchased for alfa 2 Aqueous colloid, diluted 5 times ...
Embodiment 3
[0048] A Bi of this embodiment 2 o 2 Se interface modified SnO 2 The perovskite solar cell device structure of the electron transport layer is: ITO / SnO 2 / Bi 2 o 2 Se / MAPbI 3 / Spiro-OMeTAD / MoO x / Ag. The specific preparation process is as follows:
[0049] (1) The ITO substrate was ultrasonically cleaned with detergent, deionized water, acetone, absolute ethanol, and isopropanol in sequence for 20 minutes, and then dried in a vacuum oven at 80°C. The surface of the cleaned and dried ITO substrate is subjected to plasma surface treatment for 10 minutes. This treatment method utilizes the strong oxidizing properties of ozone generated under microwaves to clean the residual organic matter on the ITO surface, while improving the work function of the ITO surface.
[0050] (2) Spin-coat electron transport layer SnO on the ITO surface treated in step (1) 2 , the interface modification layer is Bi 2 o 2 Se: SnO 2 SnO purchased for alfa 2 Aqueous colloid, diluted 5 times w...
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