Photomask, array substrate and manufacturing method thereof

Abstract

The invention provides a photomask comprising a main pattern region, wherein the main pattern region comprises a first sub-line pattern at one end thereof, a second sub-line pattern at the opposite end; a first virtual line pattern adjacent to the first sub-line pattern; and a second virtual line pattern adjacent to the second sub-line pattern, wherein the first virtual line pattern and the secondvirtual line pattern are located outside the main pattern region; the first virtual line pattern and the first sub-line pattern have the same aspect ratio and equal area, and the second virtual linepattern and the second sub-line pattern have the same aspect ratio and equal area. The photomask has the beneficial effects of improving the uniformity of the gate drive in the production process, reducing the GOA process gate drive channel difference in size and achieving the technical effect of improving product quality by adding virtual circuit patterns of the same density and shape next to thegate drive circuit pattern for yellow light process in the new product photomask production.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a photomask, an array substrate and a manufacturing method thereof. Background technique [0002] In recent years, the industry's LCD panel GOA (Gate Driver on Array, Chinese abbreviation: Gate Driver on Array Substrate) design can reduce the cost of LCD panel driving consumables, and is widely used in large-size LCD panels. With the increase in the size of LCD panels With the increasing demand and the improvement of resolution, the density and thickness of the metal lines of the gate driver in the array substrate manufacturing process increase, which makes it more difficult to control the uniformity of the gate driver in the production process. [0003] Due to the density and thickness of the metal lines of the product, the arrangement of the product process on the glass substrate, and the load difference of the GOA device during the manufacturing process, the size of the chann...

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Problems solved by technology

[0005] Embodiments of the present invention provide a photomask, an array substrate, and a manufacturing method thereof, which are used to solve the problem of increased difficulty in controlling the uniformity of the gate drive in the production process due to the increase in the density and thickness of metal lines in the prior art, resulting in The size of the channel on the left and right sides of the device is different, which affects the voltage charged to the pixel, resulting in a difference in gate-level drive of the product, and a technical problem that affects product quality.

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