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Self-driving micro-area positioning ion intercalation layer, and patterning method

A self-driven, patterned technology, applied in chemical instruments and methods, molybdenum sulfide, inorganic chemistry, etc., can solve expensive, time-consuming, complex methods and other problems

Active Publication Date: 2019-11-19
JINAN UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the electrochemical method needs to first fabricate microelectrodes on the material through microfabrication processes, supplemented by reference electrodes, external bias settings, and ion-conducting liquid / solid electrolytes, which is complex, expensive, and time-consuming.
If ion intercalation is further applied to the fabrication of complex semiconductor heterostructure devices and device integration, positioning intercalation and patterning will be essential processes, and none of the above methods can achieve this requirement

Method used

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  • Self-driving micro-area positioning ion intercalation layer, and patterning method
  • Self-driving micro-area positioning ion intercalation layer, and patterning method
  • Self-driving micro-area positioning ion intercalation layer, and patterning method

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Embodiment 1

[0048] This embodiment discloses a process for patterning molybdenum oxide nanosheets intercalated with Co ions, including the following steps:

[0049] S1. Preparation of MoO 3 Nanosheets and single crystals:

[0050] Weigh 0.3g of molybdenum oxide powder into a crucible and place it in a tube furnace, and place the substrate about 12cm away from the powder source. Under the atmospheric environment, raise the temperature of the tube furnace to 750-780°C, preferably 780°C, the heating rate is 50°C / min, keep the temperature constant for 60-120min, cool down naturally, and the molybdenum oxide single crystal is deposited on the tube wall Moreover, molybdenum oxide nanosheets with a width of 10-20 μm can be found on the substrate.

[0051] S2. Electrochemical etching of zinc wire:

[0052] Measure 10ml of HCl solution with a concentration of 37%, add 40ml of deionized water to dilute, select a zinc wire with a diameter of 300μm, as shown in Figure 1(a), connect one end of the ...

Embodiment 2

[0059] This embodiment discloses a process for patterning molybdenum oxide nanosheets intercalated with Cu ions, including the following steps:

[0060] S1. Preparation of MoO 3 Nanosheets and single crystals;

[0061] S2, electrochemical etching zinc wire;

[0062] The specific implementation process of steps S1 and S2 is the same as that of Embodiment 1;

[0063] S3. Preparation of copper nitrate solution: take 0.01 g of copper nitrate powder and add 60 ml of deionized water, ultrasonically oscillate for 5-10 min, and drop the solution on the surface of the substrate.

[0064] S4. Realize positioning intercalation:

[0065] The specific implementation process of step S4 is the same as the first embodiment.

Embodiment 3

[0067] This embodiment discloses a Co ion-localized intercalation MoS 2 The process of patterning nanosheets includes the following steps:

[0068] S1. Preparation of MoS 2 Nanosheets:

[0069] Growth of MoS by dual-source heating 2 For nanosheets, weigh 0.3g of molybdenum oxide powder in a crucible and place it in a tube furnace, place 0.1g of sulfur powder at a distance of 15cm from the powder source, and place a substrate at a distance of 12cm from the other end of the powder source. Pass 100sccm argon gas, heat up the sulfur powder source by 150°C, raise the temperature of the molybdenum oxide source by 760°C, heat up at a rate of 50°C / min, keep it warm for 1 hour, and cool down naturally. MoS with a width of 10-30μm can be found on the substrate 2 Nanosheets.

[0070] S2, electrochemical etching zinc wire;

[0071] S3, prepare metal salt solution;

[0072] S4. Implement positioning intercalation.

[0073] The specific implementation process of steps S1 and S2 is th...

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Abstract

The invention discloses a self-driving micro-area positioning ion intercalation layer, and a patterning method. The method comprises following steps: high purity metal wire with negative electrochemical potential is selected, electrochemical etching is adopted to obtain a tip with a certain radius of curvature, a metal salt solution of a certain concentration is prepared, and is added onto the surface of a two-dimensional material drop by drop, the etched metal wire is fixedly arranged on a three-dimensional control platform with high precision, the metal wire is moved through controlling on the movement of the platform, at the same time, an optical microscope is adopted to realize surface contact of the metal wire tip with the material surface, intercalation reaction is carried out at thecontact part. The intercalation reaction is capable of realizing material performance optimization including response spectrum range widening and realization of local functionalization; at the same time, the metal wire is controlled to move on the material surface based on set patterns, so that positioning intercalation patterns can be obtained, wherein the effect is impossible to achieve using the conventional intercalation technology. The method possesses obvious effect in regulating and controlling two dimensional material properties and obtaining of high resolution patterning at nanometerscale.

Description

technical field [0001] The invention relates to the technical field of semiconductor optoelectronic materials, in particular to a self-driven method for positioning, intercalating and patterning ion micro-regions. Background technique [0002] Ion intercalation is a powerful technical approach to control the physical and chemical properties of two-dimensional materials. At present, ion intercalation can be achieved by introducing gas phase or molten ions during the growth of two-dimensional materials. This method can produce materials in large quantities, but it is difficult to precisely control intercalation, especially in situ intercalation in materials. . Another intercalation method is chemical post-intercalation with zero-valent metals. This method can achieve reversible and lossless intercalation, but the metastable precursor used for intercalation is unstable, which severely limits the types and scalability of intercalation. Electrochemical intercalation is a metho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B19/00C01G39/02C01G39/06C01G41/00C30B31/04
CPCC01G39/02C01G39/06C01G41/00C01B19/007C30B31/04C01P2002/82C01P2004/04Y02P70/50
Inventor 谢伟广赖浩杰王思媛陈楠陈科球刘彭义
Owner JINAN UNIVERSITY