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Micro-nano three-dimensional printing method and device based on laser chemical vapor deposition

A technology of chemical vapor deposition and three-dimensional printing, which is applied in gaseous chemical plating, metal material coating process, coating, etc.

Active Publication Date: 2021-08-24
橙河微系统科技(上海)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, no matter what the principle is, the main factor that determines the resolution of the processed pattern is the diameter of the laser beam spot. At present, the resolution of the LCVD printed pattern is only on the order of tens of microns, which cannot meet the demand for higher precision.

Method used

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  • Micro-nano three-dimensional printing method and device based on laser chemical vapor deposition
  • Micro-nano three-dimensional printing method and device based on laser chemical vapor deposition
  • Micro-nano three-dimensional printing method and device based on laser chemical vapor deposition

Examples

Experimental program
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Effect test

specific Embodiment 1

[0064] Specific embodiment one, see figure 1 : the microtube 10 is perpendicular to the surface of the sample 14 and the converging light beam 13 is irradiated on the lower part of the tip of the microtube 10 from the side with a large incident angle; specific embodiment two, see figure 2 : the converging light beam 13 irradiates the surface of the sample 14 vertically and the microtube 10 is nearly parallel to the surface of the sample 14 . In actual system design, the angle between the sample, the microtube and the converging beam can also be adjusted as required.

[0065] The working principle of its micro-nano 3D printing technology based on laser chemical vapor deposition is as follows: the laser beam emitted by the laser converges to the micro-area on the surface of the sample to be processed after passing through the optical element group; the gas cavity is connected to the micro-tube through the adapter; The second flow regulating valve and the buffer gas are mixed a...

Embodiment 1

[0092] This example introduces the deposition of Si along the X direction of the sample based on the laser pyrolysis effect 3 N 4 Nanowires, illustrating one application of the invention.

[0093] test according to Figure 4 configuration, that is, the laser is irradiated perpendicularly to the sample surface. Using CO 2 Laser, the sample is a silicon wafer, and the microtube is a quartz capillary drawn by a needle-pulling instrument, and its tip diameter is about 1 μm. The reaction gas is SiH 4 and NH 3 The mixed gas, the initial volume ratio of the two reaction gases is 1000:1, the specific ratio can be adjusted during work; the buffer gas is argon. The reaction formula of laser chemical vapor deposition is: 3SiH 4 +4NH 3 → Si 3 N 4 +12H 2 ↑

[0094] During the test, the workflow of chemical vapor deposition micro-nano 3D printing in a closed environment was followed. The temperature of the hot stage was controlled at 300-700°C, and the specific temperature value...

Embodiment 2

[0096] This example introduces the deposition of tungsten nanowires along the direction perpendicular to the sample surface based on the laser photolysis effect, and illustrates an application of the present invention.

[0097] test according to image 3 Configuration, that is, the laser convergent beam is incident on the sample surface at a large angle. An ArF laser (wavelength 193nm) is used, the sample is a silicon wafer, and the microtube is a quartz capillary drawn by a needle-pulling instrument, with a tip diameter of about 1 μm. Reactive gas is WF 6 ; The buffer gas is hydrogen; the mixing ratio of the two gases can be adjusted in the test. The reaction formula of laser chemical vapor deposition is: WF 6 +3H 2 →W+6HF↑

[0098] During the test, the workflow of chemical vapor deposition micro-nano 3D printing in a closed environment was followed. When adjusting the laser beam spot, it should be ensured that the laser beam spot is always irradiated at the lower part of...

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Abstract

The present invention provides a micro-nano three-dimensional printing method based on laser chemical vapor deposition, which combines laser chemical deposition with localized gas injection technology based on microtubes, realizes micro-nano 3D printing of a wide range of material systems, and improves printing accuracy. The laser beam emitted by the laser is converged to the micro area on the surface of the sample to be processed through the optical element group; the reaction gas and buffer gas are mixed and injected into the gas cavity; the gas cavity is connected to the microtube through the adapter; the reaction gas and buffer gas The mixed gas is sprayed to the micro-area on the surface of the sample to be processed through the tip of the microtube, and irradiated by the focused laser beam; under the effect of laser pyrolysis and / or photolysis, the reaction gas dissociates, and the decomposition products are deposited on the surface of the sample The coating is formed, in which the tip of the microtube has a nanometer or micrometer-sized inner diameter. According to the preset pattern, the movement of the electronically controlled translation stage is coordinated to realize the three-dimensional relative movement of the microtube and the surface of the sample, thereby generating a three-dimensional micro-nano scale pattern.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition, specifically a micro-nano three-dimensional printing method based on laser chemical vapor deposition, and the invention also provides a device using the method. Background technique [0002] Chemical vapor deposition (CVD) forms a thin film by chemical reaction on the surface of the sample. Usually, it must be carried out at high temperature, and it is difficult to achieve selective film formation. The laser chemical vapor deposition (LCVD) process developed in recent years has the advantages of low deposition temperature, localized film formation, and mask-free pattern printing, and is widely used in microelectronics and other fields. The working principle of LCVD mainly includes two types: (1) pyrolysis effect: the local temperature of the sample surface increases under the irradiation of the focused laser beam, the reaction gas molecules at the local position are thermally d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/48C23C16/455B33Y10/00B33Y30/00
CPCB33Y10/00B33Y30/00C23C16/455C23C16/483
Inventor 朱国栋龚大卫蒋玉龙
Owner 橙河微系统科技(上海)有限公司
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