Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-path gas protection device of high-power laser machining head

A technology of gas protection device and laser processing head, which is applied in the direction of metal processing equipment, laser welding equipment, manufacturing tools, etc., can solve the problems of not restricting the reflow of powder and welding slag, loss of protective lens of laser processing head, etc., to achieve Save time for replacing protective lenses, improve efficiency, and save production costs

Pending Publication Date: 2019-12-27
江苏珠峰光电科技有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The technical problem solved by the present invention is: the problem to be solved is that when the laser processing head is working, the reflow of powder and welding slag is not well restricted, resulting in a large loss of the protective lens of the laser processing head

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-path gas protection device of high-power laser machining head
  • Double-path gas protection device of high-power laser machining head
  • Double-path gas protection device of high-power laser machining head

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0020] according to Figure 1-Figure 5 As shown, the present invention provides a technical solution, a two-way gas protection device for a high-efficiency laser processing head, including an installation base 5, an air knife component 1 and an air knife component 2, and the installation base 5 includes two side plates 51 and the base plate 52 fixedly connected between the two side plates 51, the base plate 52 is provided with a processing through hole 53, the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of laser machining head protection devices, specifically to a double-path gas protection device of a high-power laser machining head. The double-path gas protection device of the high-power laser machining head comprises a mounting base, an air knife I component and an air knife II component; the mounting base comprises two side plates and a bottom plate fixedly connected between the two side plates; a machining through hole is formed in the bottom plate; the lower end of the air knife II component is fixedly connected between the two side plates; the air knife I component is arranged between the two side plates and positioned at the lower end of the air knife II component; and a shunting device used for separating blown gas into two parts, which are correspondingly blown to the air knife I component and the air knife II component, is mounted on one side of the air knife I component and one side of the air knife II component. According to the double-path gas protection device of the high-power laser machining head, the problem that a lot of loss of a laser machining head protecting lens is caused by not very well limiting back flow of powder and welding slag during working of the laser machining head is solved. The double-path gas protection device of the high-power laser machining head has the advantages that the structure is simple, the possibility that the protecting lens is damaged is greatly reduced, and therefore, the production cost.

Description

technical field [0001] The invention relates to the technical field of protection devices for laser processing heads, in particular to a dual-channel gas protection device for high-power laser processing heads. Background technique [0002] The laser processing head protection device plays a role in protecting the laser processing head during laser processing. It uses the protective gas to pass through the laser processing head protection device to limit the reflow of powder and welding slag during laser processing to protect laser processing. The effect of head protection lens damage. However, the gas protection devices currently on the market are all single-channel protection. When the laser processing head is working, the reflow of powder and welding slag is not well restricted, resulting in a large loss of the protective lens of the laser processing head, which makes the laser processing cost a lot. Increase. Contents of the invention [0003] The technical problem t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/142B23K26/70
CPCB23K26/142B23K26/702
Inventor 葛伟伟马俊胡一鸣景琳施飞贺峰
Owner 江苏珠峰光电科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com