Wafer surface flatness detection and incomplete exposure unit flatness detection compensation method
A technology of surface flatness and exposure unit, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as inaccurate flatness, wrong flatness information, defocusing, etc., and achieve the goal of reducing defocusing and ensuring image quality Effect
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[0036] The technical solutions in the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0037] In an embodiment of the present invention, a method for detecting the flatness of a wafer surface is provided. The method for detecting the flatness of a wafer surface in an embodiment of the present invention includes: S1: providing a wafer, and exposing the wafer according to an exposure program To form a plurality of exposure units; S2: Determine the complete exposure unit and the incomplete exposure unit on the wafer, and calculate the number B of detection sensors in the incomplete exposure unit, the ca...
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