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Ceramic plate washing device

A technology for cleaning equipment and ceramic discs, which is applied to lighting and heating equipment, cleaning methods and utensils, cleaning methods using tools, etc., can solve the problems of large manpower consumption, secondary pollution, poor cleaning effect, etc., and meet the needs of modernization High-speed production, reduced labor intensity, and high cleaning efficiency

Pending Publication Date: 2020-01-21
拓思精工科技(苏州)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to improve the flatness of the surface of the ceramic disc, it is usually necessary to clean the ceramic disc. The traditional cleaning method is manual cleaning, that is, the operator fixes the ceramic disc and then scrubs the ceramic disc. This cleaning method requires a lot of manpower , the cleaning effect is poor, it is easy to cause damage to the ceramic plate, and it is easy to cause secondary pollution during the manual handling process, and the manual cleaning method is inefficient and difficult to meet the needs of modern high-speed production

Method used

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  • Ceramic plate washing device
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Embodiment Construction

[0025] The present invention will now be further described in detail in conjunction with the accompanying drawings and embodiments. These drawings are all simplified schematic diagrams, only illustrating the basic structure of the present invention in a schematic manner, so it only shows the composition related to the present invention.

[0026] In this embodiment, three groups of cleaning components 31 are used, one group of cleaning components 31 close to the loading station 2 does not have a brushing structure 314 , and the other two groups of cleaning components 31 have a brushing structure 314 .

[0027] Such as Figure 1 to Figure 5 As shown, a cleaning device for ceramic discs, the cleaning device includes a frame 1 and a loading station 2, a cleaning station 3, and an unloading station 4 arranged sequentially along the length direction of the frame 1; wherein: the frame 1 is set There is a material shifting assembly 5, which can make the ceramic disk move between the l...

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Abstract

The invention discloses a ceramic plate washing device. The ceramic plate washing device comprises a machine frame, and further comprises a loading station, a washing station and an unloading stationwhich are sequentially arranged in the length direction of the machine frame, wherein a material transfer assembly is arranged on the machine frame, the material transfer assembly can enable a ceramicplate to move among the loading station, the washing station and the unloading station, the loading station comprises a lifting material frame, a first conveying assembly located directly below the lifting material frame and a second conveying assembly abutted against the first conveying assembly, the washing station comprises at last one group of washing assembly, each washing assembly comprisesa rotatable positioning jig and a rotatable pipeline group located above the rotatable positioning jig, and the unloading station comprises a third conveying assembly and a forth conveying assembly abutted against the third conveying assembly. The ceramic plate washing device is good in washing effect, high in washing efficiency, and capable of meeting demands of modernized high speed production.

Description

technical field [0001] The invention belongs to the technical field of cleaning ceramic discs, and in particular relates to a cleaning device for ceramic discs. Background technique [0002] At present, with the rapid development of the electronics industry, the processing accuracy of products needs to be gradually improved, and the processing process is becoming more and more refined, and the quality requirements are also getting higher and higher. [0003] For sapphire wafers, the flatness of the wafer surface is an extremely important quality parameter. During the SMT operation of sapphire wafers, the flatness of the SMT will directly affect the flatness of the sapphire wafers, so it is used for The flatness limit of the ceramic disc surface of the patch is particularly important. [0004] In order to improve the flatness of the surface of the ceramic disc, it is usually necessary to clean the ceramic disc. The traditional cleaning method is manual cleaning, that is, the...

Claims

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Application Information

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IPC IPC(8): B08B3/02B08B3/08B08B1/04B08B1/00B08B13/00F26B21/00
CPCB08B3/02B08B3/08B08B13/00F26B21/001B08B1/32B08B1/12
Inventor 魏莹莹杨杰蒋君孔玉朋宋昌万
Owner 拓思精工科技(苏州)有限公司