Anti-shifting coating device for semiconductor production

Abstract

The invention discloses an anti-shifting coating device for semiconductor production. The anti-shifting coating device for semiconductor production comprises a device main body, a vertical screw rod,a connecting sleeve, a first rotating shaft, a clamping groove, a second coating device, a second rotating shaft, a second gear, a first screw rod, a first bearing, a rotating turntable, a to-be-processed semiconductor and fan blades, wherein a first motor is arranged at the upper end of the device main body. A fixing device is arranged in the anti-shifting coating device for semiconductor production, a second screw rod is rotated by manually rotating a knob on the fixing device, and the second screw rod is in threaded connection with a first clamping block, so that the first clamping block moves on the horizontal plane, a sliding block is driven to move on a sliding rail, and the position of the first clamping block is convenient to adjust. The distance between the first clamping block and a second clamping block is conveniently adjusted by adjusting the position of the first clamping block, so that the to-be-processed semiconductor is clamped, and the to-be-processed semiconductor isprevented from being shifted.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a coating device for semiconductor production that prevents offset. Background technique [0002] Semiconductor is a conductive material between conductors and insulators. Semiconductors are used in a wide range of fields. For example, household appliances need to use semiconductor materials. Generally, semiconductors need to be coated in the production process of semiconductors. [0003] Coating devices are commonly used equipment for semiconductor production. In some semiconductor production processing workshops, coating devices for semiconductor production are required. The coatings for semiconductor production mostly use the spin coating method to coat semiconductors. This coating device for semiconductor production There are many types on the market, but the current semiconductor production coating devices on the market are prone to misalignment during use, which is t...

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to provide a coating device for semiconductor production that prevents offset, so as to solve the troublesome problem that semiconductors are prone to offset when using the coating device for semiconductor production that is currently on the market.

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