Solvent-type polyurethane resin, preparation method and fluorine-free clothing with lotus leaf effect
A polyurethane resin and solvent-based technology, which is applied in the field of polyurethane resin, can solve the problems that fluoride cannot be used, and achieve good hydrolysis resistance, low surface energy, and water-resistant effects
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Embodiment 1
[0039] For the solvent-based polyurethane resin provided in this embodiment, the composition of the raw material formula used is shown in Table 1, wherein,
[0040] The number average molecular weight of polycarbonate polyol is 2000, purchased from Japan Ube Company.
[0041] The number-average molecular weight of polytetrahydrofuran ether glycol is 2000, purchased from BASF, Germany.
[0042] The isocyanate is 4,4-diphenylmethane diisocyanate.
[0043] The auxiliary agent is antioxidant, specifically CHINOX 1010 with double bond chemistry.
[0044] The catalyst is bismuth carboxylate.
[0045] The number average molecular weight of polyethylene glycol is 2000.
[0046] The reactive silicone is X-22-176DX from Shin-Etsu Japan.
[0047] The fumed silica is DM-10 from Tokusei Co., Ltd., Japan.
[0048] The solvent-based polyurethane resin is prepared by the following method:
[0049] In the reactor, add 25% N,N-dimethylformamide of formula quantity, the polytetrahydrofuran...
Embodiment 2
[0051] For the solvent-based polyurethane resin provided in this example, the composition of raw materials used is shown in Table 1, and the others are the same as in Example 1.
[0052] In this example, the reactive silicone is made up of X-22-176DX and X-22-176F from Shin-Etsu Japan in a mass ratio of 1:1; the fumed silica is DM-20S and DM- 10 according to the mass ratio of 1:1 composition.
Embodiment 3
[0054] For the solvent-based polyurethane resin provided in this example, the composition of raw materials used is shown in Table 1, and the others are the same as in Example 1.
[0055] In this example, the reactive silicone is X-22-176F from Shin-Etsu Japan; the fumed silica is DM-20S from Tokusei Corporation.
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