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Leveling device for proximity lithography machine

A technology of leveling device and lithography machine, which is applied in photoplate-making process exposure devices, optomechanical equipment, microlithography exposure equipment, etc., can solve the problems of complicated operation, long leveling time, large error, etc. rate, fast leveling, and the effect of ensuring exposure quality

Active Publication Date: 2022-02-18
深圳市大族半导体装备科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Aiming at the deficiencies in the above-mentioned prior art, the present invention provides a leveling device for a proximity lithography machine, which solves the technical problems of complicated traditional mechanical leveling operations, long leveling time and large errors

Method used

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  • Leveling device for proximity lithography machine
  • Leveling device for proximity lithography machine
  • Leveling device for proximity lithography machine

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Embodiment Construction

[0020] In order to describe the technical content, structural features, achieved goals and effects of the present invention in detail, the following will be described in detail in conjunction with the embodiments and accompanying drawings.

[0021] see Figure 1 to Figure 5 , figure 1 It is the front view of the leveling device of the proximity lithography machine of the present invention, figure 2 It is a structural schematic diagram of the contact leveling mechanism of the present invention, image 3 It is a cross-sectional view of the carrier of the present invention, Figure 4 It is a structural schematic diagram of the locking mechanism of the present invention, Figure 5 It is a structural schematic diagram of the second cylinder and ejector pin of the present invention.

[0022] Such as figure 1 As shown, a leveling device for a proximity lithography machine includes a mask plate 1, a carrier platform 2 provided with a through hole, a carrier platform 3 arranged b...

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Abstract

The invention discloses a leveling device of a proximity photolithography machine, which comprises a mask plate, a bearing platform provided with through holes, a bearing platform arranged under the bearing platform, a fixing plate of the bearing platform and a supporting bearing piece The carrier of the table fixing plate also includes: a contact leveling mechanism, which is arranged in the inner cavity of the carrier platform; a linear driver, whose output end is fixedly connected with the carrier; wherein, the contact leveling mechanism includes a contact ball, which is linearly When the driver drives the wafer table to rise, the contact ball protrudes from the inner cavity of the wafer table, and is sandwiched between the lower surface of the mask plate and the upper surface of the wafer table under the push of the wafer table to adjust the contact ball. Lift the wafer stage to a position parallel to the mask plate. The invention realizes the fast leveling of the proximity photolithography machine, ensures the exposure quality and improves the qualified rate of products.

Description

technical field [0001] The invention relates to a special equipment for photolithography, in particular to a leveling device of a proximity photolithography machine. Background technique [0002] In the field of proximity lithography, in order to improve the exposure quality, it is necessary to ensure the parallelism between the mask plate and the film carrier, and a leveling device is required. The operation of the traditional mechanical leveling structure is complicated, the leveling time is long, the leveling error is large, and leveling needs to be repeated repeatedly. Therefore, it is necessary to improve the structure of the traditional leveling device. Contents of the invention [0003] In view of the deficiencies in the above-mentioned prior art, the present invention provides a leveling device for a proximity photolithography machine, which solves the technical problems of complicated traditional mechanical leveling operations, long leveling time and large errors....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70716G03F7/20G03F9/00
Inventor 肖自雄张晓辉霍荣标裴强胜江彪尹建刚高云峰
Owner 深圳市大族半导体装备科技有限公司
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