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Total field/scattered field planar wave source generation method in plasma sheath 3D-FDTD modeling

A 3D-FDTD and plasma technology, applied in design optimization/simulation, etc., can solve problems such as simple, inaccurate simulation of plane wave propagation, difficulty in meeting plasma sheath communication, etc.

Active Publication Date: 2020-02-25
XIDIAN UNIV
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Problems solved by technology

[0005] To sum up, the problems existing in the existing technology are: the current plasma 2D layered model and the two-dimensional TF / SF boundary conditions are too simple to accurately simulate the propagation of plane waves in the three-dimensional plasma sheath, and it is difficult to meet the requirements for Analysis of Communication Problems Caused by Plasma Sheaths

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  • Total field/scattered field planar wave source generation method in plasma sheath 3D-FDTD modeling
  • Total field/scattered field planar wave source generation method in plasma sheath 3D-FDTD modeling
  • Total field/scattered field planar wave source generation method in plasma sheath 3D-FDTD modeling

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Embodiment Construction

[0127] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0128] Aiming at the problems existing in the prior art, the present invention provides a method for generating a total field / scattering field plane wave source in 3D-FDTD modeling of a plasma sheath. The present invention will be described in detail below with reference to the accompanying drawings.

[0129] Such as figure 1 As shown, the method for generating the total field / scattered field plane wave source in the plasma sheath 3D-FDTD modeling provided by the embodiment of the present invention includes the following steps:

[0130] S101: Establish a three-dimensional total field / scattering (TF / SF) geometric model of t...

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Abstract

The invention belongs to the technical field of electromagnetic field numerical calculation, and discloses a total field / scattered field planar wave source generation method in plasma sheath 3D-FDTD modeling, which comprises the following steps: establishing a layered plasma sheath three-dimensional total field / scattering (TF / SF) geometric model; constructing a 2-D auxiliary propagation operator,deducing an FDTD formula of the 2-D auxiliary propagation operator and a UPML-FDTD formula of the 2-D auxiliary propagation operator, and analyzing the stability and dispersivity of the 2-D auxiliarypropagation operator; and calculating a plane wave field value at the TF / SF boundary, and correcting the plane wave field value at the TF / SF boundary. According to the method, a 2-D auxiliary propagation operator on a three-dimensional TF / SF boundary is constructed, a plane wave field value at the TF / SF boundary is calculated, a plane wave is introduced into a simulation area, propagation of the plane wave in a plasma sheath layer is simulated, and the scattering effect of a plasma non-uniform structure on the plane wave is researched.

Description

technical field [0001] The invention belongs to the technical field of electromagnetic field numerical calculation, and in particular relates to a method for generating a total field / scattering field plane wave source in 3D-FDTD modeling of a plasma sheath. Background technique [0002] At present, the closest existing technology: when a hypersonic vehicle flies at a hypersonic speed or re-enters the earth's atmosphere, the surrounding air molecules and some aircraft insulation materials are melted and ionized due to the extreme high temperature and high pressure generated by the shock wave, A hypersonic vehicle is surrounded by a layer of plasma. The plasma layer (also known as the plasma sheath) can absorb, scatter and reflect electromagnetic (EM) waves, creating a metal-like shielding effect. This effect leads to significant attenuation of EM signals and even loss of communication. The extremely high temperature produces a considerable number of ablated metal particles,...

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Application Information

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IPC IPC(8): G06F30/20
Inventor 石磊刘彦明魏海亮李小平姚博
Owner XIDIAN UNIV
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