Highly stable polarization maintaining beam combining device and method

A polarization maintaining and polarization state technology, applied in the coupling of optical waveguides, instruments, optics, etc., can solve the problems that are not conducive to ensuring the stability of the coupling efficiency of single-mode polarization-maintaining fibers, and the difficulty of stably clamping and transmitting the plane dichroic mirror. Problems such as beam transmission direction deviation, to achieve the effect of improving coaxiality and position stability, reducing fluctuations, and avoiding beam position

Active Publication Date: 2021-06-18
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0005] In the prior art, planar dichroic mirrors are used to combine beams of different wavelengths, which are mainly used in the fields of medical treatment and projection display. The requirements for the polarization state and coaxiality of the beams are not high, and the planar dichroic mirrors are not easy to be stably clamped. However, there are problems such as deviation in the transmission direction of the transmitted beam, which is not easy to adjust the position of the beam, and is not conducive to ensuring the stability of the coupling efficiency of the single-mode polarization-maintaining fiber.

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  • Highly stable polarization maintaining beam combining device and method
  • Highly stable polarization maintaining beam combining device and method
  • Highly stable polarization maintaining beam combining device and method

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[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0044] The invention discloses a highly stable polarization-maintaining beam combination device and method, which can synthesize multiple beams of linearly polarized light with different wavelengths into one coaxial output beam with different wavelengths, and keep the polarization states of the multiple wavelength beams highly consistent. The integrated beam combining prism solves the problem of position stability when the traditional dichroic lens is fixed, and there will be no large deflection problem caused by the transmission of the beam through the dichroic lens, avoiding a large adjustment of the beam position, thus effectively It is beneficial to ensure the coaxiality of the beam and the position stability of the be...

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Abstract

A polarization maintaining beam combining device, the beam combining device includes several light sources, N single-mode polarization-maintaining optical fibers, N fiber collimators, fiber couplers and beam combining prisms; wherein, several light sources respectively emit linearly polarized beams of different wavelengths The light is coupled into N single-mode polarization-maintaining fibers for transmission, and after passing through N fiber collimators, it outputs linearly polarized collimated beams of different wavelengths and enters the beam combining prism. After being combined by the beam combining prism, it is coupled through the fiber The filter is coupled into the single-mode polarization-maintaining fiber, and then a beam of polarized collimated light with different wavelengths is output after passing through the fiber collimator. The highly stable polarization-maintaining beam combining device and method of the present invention can combine multiple beams of linearly polarized light with different wavelengths into one coaxial output beam with different wavelengths, and the polarization states of multiple wavelength beams remain highly consistent.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a highly stable polarization-maintaining beam combining device and method. Background technique [0002] The development trend of information technology follows Moore's Law, Moore's Law and Metcalf's Law. The continuous improvement of integrated circuit integration is closely related to the continuous development of photolithography technology. In a sense, the birth of a new generation of integrated circuits represented the most advanced lithography technology at that time. Integrated circuit fabrication requires extensive photolithography steps, which typically account for about 30 percent of production costs. In the main process of lithography, alignment and exposure are the most important process links in the manufacture of integrated circuits. Improving the fineness of exposure patterns and the alignment accuracy between patterns is the key to the m...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/26
CPCG02B6/262G02B6/264
Inventor 卢增雄李璟齐月静折昌美杨光华齐威苏佳妮马敬
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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